Metal plating process
    2.
    发明公开
    Metal plating process 失效
    Verfahren zur Metallplattierung。

    公开(公告)号:EP0261424A2

    公开(公告)日:1988-03-30

    申请号:EP87112337.8

    申请日:1987-08-25

    Abstract: A process for the formation of a plated through-hole printed circuit board comprising treating a circuit board base material as follows:

    1. condition with an oxidant solution;
    2 (A). contact with a copper etchant that etches copper and neutralizes oxidant residues on the surface to be plated; and
    2 (B). contact with a conditioner that conditions the board surface for enhanced catalyst adsorption; or
    2 (A). contact with a neutralizer for oxidant residues that neutralizes said residues and conditions the board surface for enhance catalyst asdorption; and
    2 (B). contact with a copper etchant; and
    3. catalyze the board; and
    4. plate electroless metal onto catalyzed surfaces from a plating solution containing a source of halide ions in a concentration of at least 0.1 moles per liter of solution.
    The process is characterized by the absence of a step of acceleration and contains fewer processing steps than prior art processes.

    Abstract translation: 一种用于形成电镀通孔印刷电路板的方法,包括如下处理电路板基材:1.用氧化剂溶液的状态; 2(A)。 与蚀刻铜并消除待镀表面上的氧化剂残留物的铜蚀刻剂接触; 和2(B)。 与调节板表面的调理剂接触以增强催化剂吸附; 或2(A)。 与用于中和所述残留物的氧化剂残余物的中和剂接触,并且调节板表面以增强催化剂的吸收; 和2(B)。 与铜蚀刻剂接触; 和3.催化董事会; 和4.从含有浓度为每升溶液至少0.1摩尔的卤离子源的电镀溶液将催化表面上的无电金属镀到板上。 该方法的特征在于不存在加速步骤,并且比现有技术方法包含较少的加工步骤。

    Metal plating process
    3.
    发明公开
    Metal plating process 失效
    金属镀层工艺

    公开(公告)号:EP0261424A3

    公开(公告)日:1988-09-28

    申请号:EP87112337

    申请日:1987-08-25

    Abstract: A process for the formation of a plated through-hole printed circuit board comprising treating a circuit board base material as follows:
    1. condition with an oxidant solution; 2 (A). contact with a copper etchant that etches copper and neutralizes oxidant residues on the surface to be plated; and 2 (B). contact with a conditioner that conditions the board surface for enhanced catalyst adsorption; or 2 (A). contact with a neutralizer for oxidant residues that neutralizes said residues and conditions the board surface for enhance catalyst asdorption; and 2 (B). contact with a copper etchant; and 3. catalyze the board; and 4. plate electroless metal onto catalyzed surfaces from a plating solution containing a source of halide ions in a concentration of at least 0.1 moles per liter of solution. The process is characterized by the absence of a step of acceleration and contains fewer processing steps than prior art processes.

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