摘要:
A process for purifying octafluoropropane according to the present invention comprises the step of contacting a crude octafluoropropane containing impurities with an impurity decomposing agent under elevated temperature and then with an adsorbent to substantially remove the impurities from the crude octafluoropropane. According to the pruification process or preparation process of octafluoropropane of the present invention, the impurities such as chlorine compounds can be substantially removed and a high-purity octafluoropropane can be easily obtained. The octafluoropropane obtained by the purification process of the present invention is substantially free of impurities and therefore, can be used as an etching or cleaning gas for use in the production process of a semiconductor device and the like.
摘要:
A process for purifying octafluorocyclobutane according to the present invention is characterized by contacting a crude octafluorocyclobutane containing impurities with an impurity decomposing agent under elevated temperature and then with an adsorbent to substantially remove the impurities from the crude octafluorocyclobutane. According to the purification process or preparation process of octafluorocyclobutane of the present invention, the impurities such as fluorocarbon can be substantially removed and a high-purity octafluorocyclobutane can be easily obtained. The octafluorocyclobutane obtained by the purification process of the present invention is substantially free of impurities and therefore, can be used as an etching or cleaning gas for use in the production process of a semiconductor device or the like.