摘要:
@ An electron accelerator unit comprises a source (2) of an electron beam (8) and means (20) for finally directing at least a portion of the beam (8) to a therapy site. The directing means (20) is mechanically independent of, and electrically insulated from, the source (2) of the electron beam (8). In particular, the directing means (20) comprises an electron applicator which is removeably attached to a secondary collimator which takes the form of a support plate (22) having a centrally located hole (24). The support plate (22) is connected to an adjustable support (28) which may be attached to a rail of a patient treatment couch. The accelerator also comprises a means (32, 34, 36, 38) for aligning the electron source (2) with the electron applicator (20). The aligning means is preferably formed by light emitters for projecting intersecting beams of light (32A, 32B, 34A, 34B, 36A, 36B, 38A, 38B) from the region of the electron source (2) towards the electron applicator (20), and by a target area (22) located on the electron applicator (20). When the source (2) and the applicator (20) are properly aligned, the intersecting beams from a predetermined light pattern on the target area (22).
摘要:
@ An electron accelerator unit comprises a source (2) of an electron beam (8) and means (20) for finally directing at least a portion of the beam (8) to a therapy site. The directing means (20) is mechanically independent of, and electrically insulated from, the source (2) of the electron beam (8). In particular, the directing means (20) comprises an electron applicator which is removeably attached to a secondary collimator which takes the form of a support plate (22) having a centrally located hole (24). The support plate (22) is connected to an adjustable support (28) which may be attached to a rail of a patient treatment couch. The accelerator also comprises a means (32, 34, 36, 38) for aligning the electron source (2) with the electron applicator (20). The aligning means is preferably formed by light emitters for projecting intersecting beams of light (32A, 32B, 34A, 34B, 36A, 36B, 38A, 38B) from the region of the electron source (2) towards the electron applicator (20), and by a target area (22) located on the electron applicator (20). When the source (2) and the applicator (20) are properly aligned, the intersecting beams from a predetermined light pattern on the target area (22).
摘要:
An electron accelerator which comprises a gantry (10) an electron beam defining system (16) mounted at the gantry (10) and means for mounting the gantry (10) between a floor (24) and a ceiling (26) of a treatment room.