专利检索 ap:("SWEENEY JOSEPH D" OR "YEDAVE SHARAD N" OR "BYL OLEG" OR "KAIM ROBERT" OR "ELDRIDGE DAVID" OR "SERGI STEVEN" OR "FENG LIN" OR "BISHOP STEVEN E" OR "OLANDER KARL W" OR "TANG YING" OR "ADVANCED TECH MATERIALS") AND inv:"FENG LIN" 第 1 页

1.

发明公开
ION SOURCE CLEANING IN SEMICONDUCTOR PROCESSING SYSTEMS 有权
标题翻译：清洁离子源半导体处理系统

公开(公告)号：EP2248153A4

公开(公告)日：2012-01-18

申请号：EP09709805

申请日：2009-02-11

申请人： SWEENEY JOSEPH D , YEDAVE SHARAD N , BYL OLEG , KAIM ROBERT , ELDRIDGE DAVID , SERGI STEVEN , FENG LIN , BISHOP STEVEN E , OLANDER KARL W , TANG YING , ADVANCED TECH MATERIALS

发明人： SWEENEY JOSEPH D , YEDAVE SHARAD N , BYL OLEG , KAIM ROBERT , ELDRIDGE DAVID , SERGI STEVEN , FENG LIN , BISHOP STEVEN E , OLANDER KARL W , TANG YING

IPC分类号： H01L21/265 , C23C16/44 , C23G5/00 , H01J37/08 , H01J37/16 , H01J37/18 , H01J37/317

CPC分类号： H01J37/3171 , C23C14/48 , C23C14/54 , C23C14/564 , H01J37/08 , H01J37/16 , H01J37/18 , H01J2237/082 , H01J2237/22