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    STAGE DEVICE, CHARGED PARTICLE BEAM DEVICE, AND VACUUM DEVICE
    1.
    发明公开
    STAGE DEVICE, CHARGED PARTICLE BEAM DEVICE, AND VACUUM DEVICE 审中-实审

    公开(公告)号：EP4404249A1

    公开(公告)日：2024-07-24

    申请号：EP22869736.3

    申请日：2022-08-12

    Applicant: Hitachi, Ltd.

    Inventor： TAKAHASHI, Motohiro

    IPC: H01L21/68 ,  H01J37/18 ,  H01J37/20

    CPC classification number: H01J37/18 ,  H01J37/20 ,  H01L21/68

    Abstract: Provided is a stage device capable of appropriately positioning an object. Thus, a stage device (10) is provided with: a fixed unit (20) including a top plate (22) including a magnetic material, a bottom plate (26) opposing the top plate (22), and a plurality of coils (28) provided on an upper surface of the bottom plate (26); and a movable unit (100) comprising a support portion (101) for supporting an object (160) to be positioned, a plurality of first magnets (141) mounted to the upper surface of the support portion (101) and opposed to the top plate (22) to generate a first propulsion force (FA) against the top plate (22), and a plurality of second magnets (105) provided on a lower surface of the support portion (101) and opposed to the coil (28) to generate a second propulsion force (FB) between the coil (28) and the plurality of second magnets (105).

    VERFAHREN ZUR HERSTELLUNG VON BESCHICHTETEN SUBSTRATEN
    3.
    发明公开
    VERFAHREN ZUR HERSTELLUNG VON BESCHICHTETEN SUBSTRATEN 审中-公开
    生产涂层基材的方法

    公开(公告)号：EP3289113A1

    公开(公告)日：2018-03-07

    申请号：EP16714365.0

    申请日：2016-03-31

    Applicant: Bühler Alzenau GmbH

    Inventor： PISTNER, Jürgen ,  HAGEDORN, Harro

    IPC: C23C14/00 ,  C23C14/54

    CPC classification number: C23C14/0078 ,  C23C14/547 ,  H01J37/18 ,  H01J37/32036 ,  H01J37/32119 ,  H01J37/32155

    Abstract: The invention relates to a method for producing substrates having a plasma coated surface made of a dielectric coating material in a vacuum chamber, having an AC-powered plasma device, comprising moving a substrate relative to the plasma device by means of a movement device along a curve, and depositing coating material on a surface of the substrate in a coating region along a trajectory lying on the surface of the substrate using the plasma device. Also provided is: a) the determining of actual values of a layer thickness of deposited coating material on at least parts of the trajectory in the movement direction of the substrate; b) the comparing of the actual values with target values of the layer thickness on the at least parts of the trajectory; c) the determining of parameters of the plasma device to change the amount of coating material deposited per time unit i accordance with the position of the substrate, in such a way that the actual values of the layer thickness of deposited coating material deviate by less than a predetermined difference from the target values; d) the setting of parameters of the plasma device to change the amount of coating material deposited per time unit according to point c); and e) depositing coating material by means of the plasma device, using the parameters set in point d). The invention further relates to a device for producing substrates (10, 100) having a plasma-coated surface made of a dielectric coating material in a vacuum chamber, having an AC-powered plasma device (31, 32, 150, 180), comprising a movement device for moving a substrate (10, 100) relative to the plasma device (31, 32, 150, 180) along a curve, wherein by means of the plasma device (31, 32, 150, 180) coating material is deposited on a surface (11, 101) of the substrate (10, 100) in a coating region along a trajectory lying on the surface of the substrate (12, 105), comprising a control module (140) which is designed and configured to carry out the method.

    MULTI-VANE THROTTLE VALVE
    6.
    发明公开
    MULTI-VANE THROTTLE VALVE 审中-公开
    多叶片节流阀

    公开(公告)号：EP3180552A1

    公开(公告)日：2017-06-21

    申请号：EP14899842.0

    申请日：2014-08-14

    Applicant: Ferrotec (USA) Corporation

    Inventor： SIN, Pheng

    IPC: F16K27/12 ,  F16K51/02

    CPC classification number: F16K1/223 ,  F16K1/222 ,  F16K49/007 ,  F16K51/02 ,  H01J37/18 ,  H01J2237/186 ,  H01J2237/3132

    Abstract: A multi-vane throttling valve for a vacuum process chamber includes a reciprocal vane pivotally connected to and extending backwardly away from a back side of each of a plurality of rotatable vanes, and a stationary reciprocal vane angling assembly fixed in a predefined position and having an assembly pin extending transversely toward the reciprocal vane a predefined distance sufficient to support the reciprocal vane whereby the stationary angling assembly causes the reciprocal vane to pivot in a range between a substantially parallel position with the respective rotatable vane and a transverse position with the respective rotatable vane when the respective rotatable vane is rotated.

    Abstract translation: 用于真空处理室的多叶片节流阀包括可枢转地连接到多个可旋转叶片中的每一个的背侧并向后延伸的往复叶片以及固定在预定位置并且具有 所述装配销横向朝向所述往复叶片延伸足够的预定距离以支撑所述往复叶片，由此所述固定成角度组件使得所述往复叶片在与相应可旋转叶片的基本平行位置和相应可旋转叶片的横向位置之间的范围内枢转 当相应的可旋转叶片旋转时。

    ELECTRON BEAM MICROSCOPE WITH IMPROVED IMAGING GAS AND METHOD OF USE
    7.
    发明公开
    ELECTRON BEAM MICROSCOPE WITH IMPROVED IMAGING GAS AND METHOD OF USE 有权
    方法用于成像的样品与带电粒子束利用气体图

    公开(公告)号：EP3096343A1

    公开(公告)日：2016-11-23

    申请号：EP16169828.7

    申请日：2016-05-17

    Applicant: FEI Company

    Inventor： Shanley, Toby ,  Scott, John ,  Toth, Milos

    IPC: H01J37/244

    CPC classification number: H01J37/18 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/182 ,  H01J2237/2448 ,  H01J2237/2605 ,  H01J2237/2608 ,  H01J2237/2801 ,  H01J2237/2806

    Abstract: Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH 3 CH 2 OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH 3 CH 2 OH to ionize the CH 3 CH 2 OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH 3 CH 2 OH-based processes.

    Abstract translation: 使用气体放大具有改善的气体的成像提供带电粒子束成像和测量系统。 该系统包括用于将带电粒子束到工件，用于聚焦带电粒子到工件上的聚焦透镜，和在电极用于加速由所述带电实践束从工件照射而产生的二次电子的带电粒子束源， 或其它气体级联检测方案。 气体成像在高压扫描电子显微镜（HPSEM）室中进行用于封闭所述改进的成像气体包括CH 3 CH 2 OH（乙醇）的蒸气。 电极加速二次电子虽然CH 3 CH 2 OH通过电离级联电离CH 3 CH 2 OH以放大探测二次电子的数量。 的最优配置提供了一种用于使用改进的成像气体的，并且提供的技术来进行的有机液体和溶剂，以及其他CH 3 CH 2 OH基的流程成像研究。

    AUTOMATIC X-RAY INSPECTION APPARATUS FOR SMT INLINE PROCESS
    9.
    发明公开
    AUTOMATIC X-RAY INSPECTION APPARATUS FOR SMT INLINE PROCESS 审中-公开
    自动化工程机械

    公开(公告)号：EP2796862A1

    公开(公告)日：2014-10-29

    申请号：EP12860408.9

    申请日：2012-12-21

    Applicant: Sec Co., Ltd.

    Inventor： KIM, Jong-hyun ,  KIM, Man-seok ,  RYU, Ki-ung ,  RYU, Ki-jun

    IPC: G01N23/04 ,  G01B15/00

    CPC classification number: G01N23/046 ,  G01N2223/419 ,  H01J37/18

    Abstract: The invention relates to an automatic X-ray inspection apparatus for a SMT inline process, comprising: a stage unit for supporting an object to be inspected such that the object is attachable/detachable, the stage unit being movable on an X-axis and Y-axis in a plane and rotatable; an X-ray vacuum tube arranged beneath the stage unit so as to irradiate the object arranged on the stage unit with X-rays; and a detector arranged above the stage unit so as to swivel toward one side in order to detect X-rays transmitted through the object. The X-ray vacuum tube swivels in synchronization with the swiveling of the detector, and an X-ray emission surface of the X-ray vacuum tube is arranged so as to be parallel to the stage unit. The stage unit has a hollow shaft, and a hollow bearing that supports the hollow shaft such that the hollow shaft is rotatable.

    Abstract translation: 本发明涉及一种用于SMT在线处理的自动X射线检查装置，包括：用于支撑待检查物体的台架单元，使得物体可附接/可拆卸，台架单元可在X轴上移动，Y 在一个平面上可旋转的轴; X射线真空管，布置在载物台单元下方，以便用X射线照射设置在载物台单元上的物体; 以及检测器，其布置在平台单元的上方，以朝向一侧旋转，以便检测透过物体的X射线。 X射线真空管与检测器的旋转同步地旋转，并且X射线真空管的X射线发射表面被布置成平行于平台单元。 舞台单元具有中空轴和支撑空心轴的中空轴承，使得中空轴可旋转。

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