摘要:
A cover window (100) is disclosed. The cover window includes a first surface (110), a second surface (120) opposite the first surface, a first polished surface (131) extending from an end of the first surface along a first direction, the first polishing surface having a first inclination angle, and a second polishing surface (132) extending from an end of the second surface along a second direction, the second polishing surface having a second inclination angle. The first polishing surface and the second polishing surface may be asymmetric with respect to the center plane passing through the center of the cover window in parallel with the first surface.
摘要:
A method of manufacturing a transistor display panel and a transistor display panel, the method including forming a polycrystalline silicon layer on a substrate; forming an active layer by patterning the polycrystalline silicon layer; forming a first insulating layer covering the substrate and the active layer; exposing the active layer by polishing the first insulating layer using a polishing apparatus; and forming a second insulating layer that contacts the first insulating layer and the active layer, wherein exposing the active layer by polishing the first insulating layer includes coating a first slurry on a surface of the first insulating layer, the first slurry reducing a polishing rate of the active layer.