DEPOSITION APPARATUS
    1.
    发明公开

    公开(公告)号:EP4324956A1

    公开(公告)日:2024-02-21

    申请号:EP23189315.7

    申请日:2023-08-02

    摘要: A deposition apparatus according to an embodiment includes a deposition source, and a deposition portion that faces the deposition source. The deposition portion is disposed at an angle of about 4 degrees to about 14 degrees with respect to an imaginary vertical line that is perpendicular to ground. The deposition portion includes a frame including an opening, and an outer portion disposed around the opening, a substrate disposed on a first side of the frame, and a plurality of back stages disposed on a second side opposite to the first side of the frame. The frame moves by movement of the plurality of back stages.