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公开(公告)号：EP3482868A3
公开(公告)日：2019-08-07
申请号：EP18206324.8
申请日：2018-11-14
发明人： KIM, Wonyong , HAN, Gyoowan , KANG, Taekkyo , MYOUNG, Seungho , OH, Taekil
IPC分类号： B23K26/0622 , B23K26/064 , B23K26/082 , B23K26/364 , B05C21/00 , C23C14/04 , G03F1/80 , C23C16/04 , H01L27/32 , H01L51/00 , B23K26/06 , H01L51/56 , B23K103/02
摘要： An apparatus (2000) for manufacturing a mask (MS) is provided. The apparatus includes a stage (700) on which a pre-mask is disposed, and a laser irradiation device (600) including a laser generation member (610), an optical system (620) for controlling a shape of a laser beam, and a scanner (630) for adjusting a path of a laser beam that has the shape controlled by the optical system. The pre-mask (MC) includes a first pattern groove (PT1,PT3) defined on a front surface (S1,S3) and a second pattern groove (PT2,PT4) defined on a rear surface (S2,S4) that corresponds to the front surface. A first portion (M1,M3) and a second portion (M2,M4) are defined in a first direction that is a thickness direction of the pre-mask. The laser beam with the controlled shape is irradiated to the second portion of the pre-mask in a second direction crossing the first direction, a mask having an opening, in which the second portion is removed, is provided.
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公开(公告)号：EP3482868A2
公开(公告)日：2019-05-15
申请号：EP18206324.8
申请日：2018-11-14
发明人： KIM, Wonyong , HAN, Gyoowan , KANG, Taekkyo , MYOUNG, Seungho , OH, Taekil
IPC分类号： B23K26/0622 , B23K26/064 , B23K26/082 , B23K26/364 , B23K26/06 , H01L51/56 , B23K103/02
CPC分类号： H01L51/0011 , B05C21/005 , B23K26/0624 , B23K26/064 , B23K26/082 , B23K26/364 , B23K2103/02 , C23C14/042 , C23C16/042 , G03F1/80 , H01L27/3244 , H01L51/001 , H01L51/56 , H01L2251/56
摘要： An apparatus (2000) for manufacturing a mask (MS) is provided. The apparatus includes a stage (700) on which a pre-mask is disposed, and a laser irradiation device (600) including a laser generation member (610), an optical system (620) for controlling a shape of a laser beam, and a scanner (630) for adjusting a path of a laser beam that has the shape controlled by the optical system. The pre-mask (MC) includes a first pattern groove (PT1,PT3) defined on a front surface (S1,S3) and a second pattern groove (PT2,PT4) defined on a rear surface (S2,S4) that corresponds to the front surface. A first portion (M1,M3) and a second portion (M2,M4) are defined in a first direction that is a thickness direction of the pre-mask. The laser beam with the controlled shape is irradiated to the second portion of the pre-mask in a second direction crossing the first direction, a mask having an opening, in which the second portion is removed, is provided.
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