公开(公告)号：EP3380642A1

公开(公告)日：2018-10-03

申请号：EP15813103.7

申请日：2015-11-23

申请人： Ecole Polytechnique Fédérale de Lausanne (EPFL)

发明人： HEFYENE, Nasser ,  GRANDJEAN, Nicolas

IPC分类号： C23C14/06 ,  C23C16/30 ,  G04B19/00 ,  B42D25/00

CPC分类号： B42D25/387 ,  B42D25/36 ,  B42D25/373 ,  B42D25/415 ,  B42D25/43 ,  B42D25/465 ,  C09K11/0883 ,  C09K11/62 ,  C09K11/64 ,  C23C14/042 ,  C23C14/0617 ,  C23C16/042 ,  C23C16/303 ,  G04B45/0015 ,  G04B45/0084

摘要： A method for marking a product (1) with a photoluminescent mark, said mark comprising a photoluminescent portion (10) which is transparent under normal light conditions and revealed by photoluminescence under UV illumination, said mark further comprising a non photoluminescent portion (9) which is transparent under normal light conditions as well as under UV illumination, said method comprising: deposing on said product a stack, said stack comprising alternatively layers (2, 4), such as AlN, with a thickness of less than 1 micron and layers (3) of a second material, such as GaN, with a thickness of less than 10 nm; raising the transparency of said non photoluminescent portion (10) with a deposition of transparent material (6) or incorporation of ions into said non photoluminescent portions.

公开(公告)号：EP3257965B1

公开(公告)日：2018-06-20

申请号：EP17174218.2

申请日：2017-06-02

申请人： Waldorf Technik GmbH ,  Cavonic GmbH

发明人： CZIZEGG, Wolfgang

IPC分类号： C23C14/04 ,  C23C14/50 ,  C23C16/04 ,  C23C16/458 ,  B65D33/16 ,  B65D75/58

CPC分类号： C23C14/046 ,  B65D33/16 ,  B65D75/5861 ,  B65D75/5883 ,  C23C14/042 ,  C23C14/50 ,  C23C16/042 ,  C23C16/045 ,  C23C16/458

公开(公告)号：EP3021375A1

公开(公告)日：2016-05-18

申请号：EP15193834.7

申请日：2015-11-10

申请人： Samsung Display Co., Ltd.

发明人： HUH, Myungsoo ,  KEY, Sunghun ,  KIM, Sungchul ,  ROH, Cheollae ,  JUNG, Sukwon ,  JOO, Hyunwoo ,  CHOI, Jaihyuk

IPC分类号： H01L51/52 ,  H01J37/32 ,  C23C16/00

CPC分类号： H01L51/5256 ,  C23C16/042 ,  C23C16/345 ,  C23C16/45565 ,  C23C16/505 ,  H01J37/32091 ,  H01J37/3244

摘要： A display device and an apparatus and method for manufacturing the same are disclosed. The display device includes: a substrate; a display unit formed on the substrate; and an inorganic layer formed on the display unit, wherein a water vapor transmission rate (WVTR) of the inorganic layer is 5x10 -5 g/m 2 day or less. The apparatus for manufacturing a display device includes: a chamber; a shower head for spraying a mixed gas into the chamber; a plasma generation unit for forming plasma from the mixed gas; a susceptor facing the shower head and on which a substrate is seated; and a power supply unit electrically connected to the plasma generation unit, wherein a frequency of a current supplied from the power supply unit to the plasma generation unit is between about 27 MHz and about 42 MHz.

摘要翻译： 公开了一种显示装置及其制造方法。 显示装置包括：基板; 形成在所述基板上的显示单元; 以及形成在所述显示单元上的无机层，其中所述无机层的水蒸汽透过率（WVTR）为5×10 -5 g / m 2天以下。 用于制造显示装置的装置包括：腔室; 用于将混合气体喷射到所述室中的淋浴头; 用于从所述混合气体形成等离子体的等离子体产生单元; 面向淋浴喷头的感受器，其上安置有基底; 以及电连接到所述等离子体产生单元的电源单元，其中从所述电源单元提供给所述等离子体产生单元的电流的频率在约27MHz至约42MHz之间。

公开(公告)号：EP2943289A4

公开(公告)日：2016-02-17

申请号：EP14738293

申请日：2014-01-07

申请人： HZO INC

发明人： ASTLE DAVID JAMES ,  CHILD TYLER CHRISTENSEN ,  KASAGANI VIMAL KUMAR ,  LOOSE CAMERON LAMAR ,  STEVENS BLAKE LEROY ,  SORENSON MAX ERNEST

IPC分类号： H01L21/64 ,  C23C14/04 ,  C23C16/04 ,  H01L21/67 ,  H05K7/02

CPC分类号： B23K26/362 ,  B23K26/0622 ,  B23K26/082 ,  B23K26/361 ,  B23K26/402 ,  B23K2203/50 ,  C23C14/042 ,  C23C16/042 ,  H01L21/561 ,  H01L23/3121 ,  H01L2924/0002 ,  H05K3/285 ,  H05K3/288 ,  H05K2203/025 ,  H05K2203/092 ,  H05K2203/095 ,  H05K2203/107 ,  H05K2203/1105 ,  H05K2203/163 ,  H01L2924/00

摘要： A method for selectively removing portions of a protective coating from a substrate, such as an electronic device, includes removing portions of the protective coating from the substrate. The removal process may include cutting the protective coating at specific locations, then removing desired portions of the protective coating from the substrate, or it may include ablating the portions of the protective coating that are to be removed. Coating and removal systems are also disclosed.

公开(公告)号：EP2971225A1

公开(公告)日：2016-01-20

申请号：EP13711867.5

申请日：2013-03-15

申请人： Applied Materials, Inc.

发明人： HINTERSCHUSTER, Reiner ,  BRÜNING, Andre

IPC分类号： C23C14/50 ,  C03C17/00

CPC分类号： C23C14/04 ,  C23C14/50 ,  C23C16/042 ,  C23C16/4587

摘要： A carrier (200; 300; 400) for carrying a substrate (210; 310) in a deposition chamber is described. The carrier includes a frame (240; 250; 260; 270; 340; 350; 360; 370; 440; 450; 460; 470) for vertically holding the substrate (210; 310), wherein the frame has a substantially rectangular shape with a bottom frame part (240; 340; 440); a fixing means (225; 325) for firmly fixing the substrate (210; 310) to the carrier (200; 300; 400), wherein the fixing means (225; 325) is located in a center region of the bottom frame part (240; 340; 440); and one or more support members (220; 230; 320) for supporting but not firmly fixing the substrate (210; 310). Further, a method for carrying a substrate during deposition is described.

公开(公告)号：EP2780935A4

公开(公告)日：2015-11-11

申请号：EP14700800

申请日：2014-01-07

申请人： HZO INC

发明人： ASTLE DAVID JAMES ,  CHILD TYLER CHRISTENSEN ,  KASAGANI VIMAL KUMAR ,  LOOSE CAMERON LAMAR ,  STEVENS BLAKE LEROY ,  SORENSON MAX ERNEST

IPC分类号： H01L21/64 ,  C23C14/58 ,  C23C16/56 ,  H01L21/67 ,  H05K7/02

CPC分类号： B23K26/362 ,  B23K26/0622 ,  B23K26/082 ,  B23K26/361 ,  B23K26/402 ,  B23K2203/50 ,  C23C14/042 ,  C23C16/042 ,  H01L21/561 ,  H01L23/3121 ,  H01L2924/0002 ,  H05K3/285 ,  H05K3/288 ,  H05K2203/025 ,  H05K2203/092 ,  H05K2203/095 ,  H05K2203/107 ,  H05K2203/1105 ,  H05K2203/163 ,  H01L2924/00

摘要： A method for selectively removing portions of a protective coating from a substrate, such as an electronic device, includes removing portions of the protective coating from the substrate. The removal process may include cutting the protective coating at specific locations, then removing desired portions of the protective coating from the substrate, or it may include ablating the portions of the protective coating that are to be removed. Coating and removal systems are also disclosed.

公开(公告)号：EP2767612A1

公开(公告)日：2014-08-20

申请号：EP12840633.7

申请日：2012-10-12

申请人： Toyo Tanso Co., Ltd.

发明人： KITA, Masaaki ,  KUBOTA, Takeshi ,  HIRANO, Hiroyuki

IPC分类号： C23C16/458 ,  H01L21/205

CPC分类号： C30B35/00 ,  C04B41/009 ,  C04B41/5057 ,  C04B41/5059 ,  C04B41/87 ,  C23C16/042 ,  C23C16/325 ,  C23C16/4404 ,  C23C16/4588 ,  C04B35/52 ,  C04B41/4531 ,  C04B41/4572

摘要： The invention provides a CVD apparatus that can remarkably improve the quality and productivity of a susceptor provided with a film such as a SiC film or a TaC film without causing increase in production cost or increase in size of the apparatus. The invention also provides a method of manufacturing a susceptor using the CVD apparatus and a susceptor.
A masking portion (recessed portion) 20 is provided at the center of a rear surface of a carbonaceous substrate 10. The masking portion 20 includes a first bore portion 20a and a second bore portion 20b. The first bore portion 20a has an inner wall in which a female screw portion 21 is formed. A male screw portion 7a of a masking jig 7 is screw-fitted to the female screw portion 21. The masking jig 7 is fixed to a film forming jig 2. The carbonaceous substrate is thus supported in a standing posture, and the carbonaceous substrate is provided, on a surface, with a film such as a SiC film or a TaC film except for the recessed portion by introducing gas into the apparatus in this supported state.

摘要翻译： 本发明提供一种化学气相沉积装置确实可以显着提高设置有一个基座的质量和生产率膜审查作为膜 - 碳化硅或TAC电影，而不在装置的尺寸导致生产成本的增加或增加。 因此本发明提供使用该CVD设备和基座制造基座的方法。 掩蔽部分（凹部）20以碳质基材10的屏蔽部分20包括第一孔部分20a和20b的第二孔部分的后表面的中心处。 所述第一孔部20a具有在其中的阴螺纹部21形成内壁。 掩蔽夹具7的外螺纹部7a螺纹配合到该掩模夹具7固定到成膜夹具2的碳质基材是在站立姿势因此支持阴螺纹部21，和碳质基材是 提供，在表面上，用薄膜：如在SiC电影或TAC膜 - 除了通过将气体引入到支撑在该状态下该装置的凹部。

公开(公告)号：EP2217740B1

公开(公告)日：2014-02-26

申请号：EP08833709.2

申请日：2008-09-16

申请人： Eastman Kodak Company

发明人： YANG, Cheng ,  IRVING, Lyn, Marie ,  LEVY, David, Howard ,  COWDERY-CORVAN, Peter, Jerome ,  FREEMAN, Diane, Carol

IPC分类号： C23C16/04 ,  C23C16/455 ,  H01L21/02 ,  H01L21/314 ,  H01L21/316 ,  H01L51/00

CPC分类号： C23C16/45551 ,  C23C16/042 ,  H01L21/02175 ,  H01L21/02178 ,  H01L21/0228 ,  H01L21/02304 ,  H01L21/3141 ,  H01L21/31616 ,  H01L51/0004

公开(公告)号：EP2262043B1

公开(公告)日：2013-11-20

申请号：EP10354026.6

申请日：2010-05-28

申请人： Commissariat à l'Énergie Atomique et aux Énergies Alternatives

发明人： Martin, Steve ,  Dunoyer, Nicolas ,  Oukassi, Sami ,  Salot, Raphaël

IPC分类号： H01M6/18 ,  H01M6/40 ,  C23C14/04 ,  C23C16/04 ,  C23C16/46 ,  C23C14/54 ,  C23C16/52

CPC分类号： H01M6/40 ,  C23C14/042 ,  C23C14/541 ,  C23C16/042 ,  C23C16/52 ,  H01M6/18 ,  H01M6/185

摘要： The method involves performing successive deposition of different layers of one of stacks through a same central opening (7) of a same mask (6), and heating the mask to a temperature to form a pattern, and to another temperature, different from the former temperature, to form another pattern. The opening of the mask is off-centered to offset the patterns with respect to one another, in a direction parallel to a substrate, where the opening is in the shape of a parallelogram, and the mask is subdivided into two elemental parts separated by expansion joints.

公开(公告)号：EP2630272A1

公开(公告)日：2013-08-28

申请号：EP11779095.6

申请日：2011-10-21

申请人： Leybold Optics GmbH

发明人： ELLRICH, Jens ,  NOVAK, Emmerich, Manfred ,  CASPARI, Andreas

IPC分类号： C23C14/56 ,  C23C16/44

CPC分类号： C23C16/042 ,  C23C14/564 ,  C23C16/4401

摘要： The invention relates to an apparatus (1) for coating a surface (21) of a substrate (20). The apparatus comprises a processing chamber (2) with a particle source (3) for producing coating particles (19), which are also deposited on the inner wall (5) of the processing chamber (2) and on shielding apparatuses (4') arranged therein during operation, in addition to the desired coating of the substrate surface. As the operating time increases, the layer thickness of these deposits (6) grows until the latter undergo spalling, which can lead to contamination of the substrate surfaces to be coated. In order to prevent this, shielding screens (10, 10') are arranged on the inner wall (5) of the processing chamber (2) and/or on the shielding apparatuses (4') and prevent deposits (6, 7) which undergo spalling from passing into the interior (17) of the processing chamber (2). The shielding screens (10, 10') consist preferably of an expanded metal. The invention also relates to a process for coating a surface (21) of a substrate (20), including receiving the substrate (20) in a processing chamber (2) during the coating process, producing coating particles (19) using a particle source (3), allowing coating particles (19) to penetrate into a region between a shielding screen (10, 10'), which is arranged between the particle source (3) and a surface (5, 5') facing toward the interior (17), detaining deposits (6), which have spalled from the surfaces (5, 5'), in the region between the shielding screen (10, 10') and the surface (5, 5') by means of the shielding screen (10, 10').