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公开(公告)号：EP3702349A1
公开(公告)日：2020-09-02
申请号：EP20158448.9
申请日：2020-02-20
发明人： KWON, Eunsuk , NAM, Youngmin , PARK, Sangho , BAE, Hyejin , SON, Jhunmo , OH, Wonseok , JUNG, Yongsik , KRAVCHUK, Dmitry
IPC分类号： C07D209/86 , C07D209/88 , C09K11/06 , H01L51/00 , H05B33/14
摘要： A heterocyclic compound represented by Formula 1:
and an organic light-emitting device including the same are provided.-
公开(公告)号：EP3836150A1
公开(公告)日：2021-06-16
申请号：EP20211499.7
申请日：2020-12-03
发明人： KWON, Youngchun , YOO, Jiho , CHOI, Younsuk , NAM, Youngmin , PARK, Minsik , PARK, Jinwoo , LEE, Dongseon
摘要： A neural network apparatus for generating a new chemical structure may receive a structure input of a chemical structure; generate, based on the structure input, a negative attention vector that indicates a respective probability of presence of each of a plurality of blacklists in the structure input; generate a structure expression by encoding the structure input; generate a final reverse blacklist vector that does not include the plurality of blacklists, based on the negative attention vector and the structure expression; and generate the new chemical structure by decoding the final reverse blacklist vector.
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公开(公告)号：EP4394508A1
公开(公告)日：2024-07-03
申请号：EP23179243.3
申请日：2023-06-14
发明人： KOH, Haengdeog , KWAK, Yoonhyun , KIM, Mijeong , NAM, Youngmin , AHN, Chanjae , LEE, Changheon , IM, Kyuhyun , CHOI, Sungwon , HAN, Sunghyun
CPC分类号： G03F7/0042 , C07F7/2224
摘要： Provided are a resist composition and a pattern forming method using the same. The resist composition may include an organometallic compound represented by Formula 1 below and a polymer repeating unit represented by Formula 2 below.
M11(R11)n(OR12)(4-n)
In Formulas 1 and 2, descriptions of M11, R11, R12, n, A21, L21 to L24, a21 to a24, R21, R22, b22, p, and X21 refer to the specification.-
公开(公告)号：EP4332083A1
公开(公告)日：2024-03-06
申请号：EP23150544.7
申请日：2023-01-06
发明人： CHAE, Jungha , KOH, Haengdeog , KWAK, Yoonhyun , KIM, Minsang , KIM, Hana , KIM, Hyeran , NAM, Youngmin , LEE, Changheon , IM, Kyuhyun
摘要： Provided are a carboxylate salt represented by Formula 1, a photoresist composition including the carboxylate salt, and a method of forming a pattern by using the photoresist composition
wherein, in Formula 1, A 11 , R 11 to R 15 , b15, n11, n12, and M + are described in the specification.-
公开(公告)号：EP3617216A1
公开(公告)日：2020-03-04
申请号：EP19194318.2
申请日：2019-08-29
发明人： CHOI, Hyeonho , HWANG, Kyuyoung , KWAK, Seungyeon , NAM, Youngmin , LEE, Kum Hee , JEON, Aram , CHOI, Whail , KIM, Kyungdoc , YOO, Jiho , CHOI, Younsuk
摘要： Provided are an organometallic compound represented by Formula 1, an organic light-emitting device including the same, and a diagnostic composition including the organometallic compound:
M(L 1 ) n1 (L 2 ) n2
In Formula 1, M, L 1 , L 2 , n1 and n2 are each the same as defined in this disclosure.
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