摘要:
A memory device includes a plurality of memory cells arranged in a string substantially perpendicular to the major surface of the substrate in a plurality of device levels, at least one first select gate electrode located between the major surface of the substrate and the plurality of memory cells, at least one second select gate electrode located above the plurality of memory cells, a semiconductor channel having a portion that extends vertically along a direction perpendicular to the major surface, a first memory film contacting a first side of the semiconductor channel, and a second memory film contacting a second side of the semiconductor channel. The second memory film is electrically isolated from the first memory film, and is located at a same level as the first memory film.
摘要:
Monolithic three-dimensional NAND memory strings and methods of fabricating a monolithic three-dimensional NAND memory string include forming single crystal or large grain polycrystalline semiconductor material charge storage regions by a metal induced crystallization process. In another embodiment, a plurality of front side recesses are formed having a concave-shaped surface and a blocking dielectric and charge storage regions are formed within the front side recesses and over the concave-shaped surface. In another embodiment, layers of oxide material exposed in a front side opening of a material layer stack are surface nitrided and etched to provide convexly-rounded corner portions, and a blocking dielectric is formed over the convexly-rounded corner portions.