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公开(公告)号：EP4417738A1
公开(公告)日：2024-08-21
申请号：EP22921648.6
申请日：2022-12-01
发明人： XIAO, Yunzhang , HUANG, Shuaishuai , LIU, Lianghui , YANG, Fang , LIU, Jiaming , XU, Xin , JING, Junhui , CHEN, Bingan , ZHONG, Guofang
CPC分类号： Y02P70/50
摘要： Disclosed is an epitaxial reaction device. The epitaxial reaction device includes: a conveying apparatus and at least one reaction apparatus. The reaction apparatus includes a high-temperature reaction chamber, a gas supply module, and a gas extraction module. The high-temperature reaction chamber is used for providing an environmental condition required during wafer processing. The gas supply module and the gas extraction module are oppositely provided in the high-temperature reaction chamber. The gas supply module is used for supplying reaction gas to the high-temperature reaction chamber, and the gas extraction module is used for extracting residual gas. The conveying apparatus is provided on the high-temperature reaction chamber and located on a same side as the gas supply module. The conveying apparatus is used for taking out and placing the wafer.
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公开(公告)号：EP4417731A1
公开(公告)日：2024-08-21
申请号：EP22894684.4
申请日：2022-11-09
发明人： XIAO, Yunzhang , XU, Xin , HUANG, Shuaishuai , LIU, Lianghui , LIU, Jiaming , CHEN, Bingan , ZHONG, Guofang
IPC分类号： C23C16/32 , C23C16/458
CPC分类号： Y02P70/50
摘要： A reaction chamber (100) and a reaction device (200) are disclosed. The reaction chamber (100) includes a hollow heating member (20), a rotating platform, a protection plate assembly and a separator (70). The rotating platform is rotatably provided in an inner cavity (201) of the hollow heating member (20). The rotating platform is used for bearing a wafer. The protection plate assembly is provided on two sides of the rotating platform. The separator (70) is erected on the protection plate assembly. The separator (70) is matched with the protection plate assembly.
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