公开(公告)号：EP2896994A1

公开(公告)日：2015-07-22

申请号：EP15151391.8

申请日：2015-01-16

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Motoyuki, Yamada ,  Shoji, Akiyama

IPC分类号： G03F1/00 ,  G03F1/62 ,  G03F1/64 ,  G03F1/24

CPC分类号： G03F1/24 ,  G03F1/142 ,  G03F1/62 ,  G03F1/64

摘要： Here are disclosed a pellicle for EUV and an assembly made up of this pellicle and a mask, which brings about a projection of low contrast (intensity) shadows of a mesh structure on the mask, thus minimizing the adverse effect of the shadow on the lithographic printing; also a method for assembling such assembly is disclosed wherein the pellicle is rotated relative to the mask to minimize the shadow contrast, in terms of a contrast ratio, of the mesh structure; the angle of the rotation is 30 degrees or smaller, and the resultant contrast ratio should be 25 % or lower.

摘要翻译： 这里公开了一种用于EUV的防护薄膜组件和由该防护薄膜和掩模组成的组件，其导致在掩模上的网状结构的低对比度（强度）阴影的投影，从而最小化阴影对光刻的不利影响 印刷; 还公开了一种用于组装这种组件的方法，其中防护薄膜组件相对于掩模旋转以最小化网格结构的对比度的阴影对比度; 旋转角度为30度以下，对比度为25％以下。