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公开(公告)号：EP3045973B1
公开(公告)日：2018-04-11
申请号：EP14844507.5
申请日：2014-07-24
发明人： SUZUKI, Tsutomu , OHORI, Shinichi , KOITABASHI, Ryuji , NAKAGAWA, Hideo , TAKASAKA, Takuro , KINOSHITA, Takahiro , FUKUDA, Hiroshi
IPC分类号： G03F1/66 , H01L21/673
CPC分类号： G03F1/66 , H01L21/67359 , H01L21/67393
摘要： The purpose of the present invention is to further reliably reduce the contamination of photomask blanks due to the adherence of the dust and particles generated during the storage, transportation, or operation of the container while suppressing the effect on a resist pattern, thereby improving the quality and yield of the photomask blanks. The present invention pertains to a container (1) for storing photomask blanks that stores, transports, or safeguards photomask blanks (2), wherein at least one of the components is constituted by a thermoplastic resin where the amount of caprolactam measured by the dynamic head space method when kept for 60 minutes at 40°C is 0.01 ppm or less n-decane conversion amount per resin weight, and the surface resistance value is no more than 1.0E + 13 ohms.
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公开(公告)号：EP3045973A1
公开(公告)日：2016-07-20
申请号：EP14844507.5
申请日：2014-07-24
发明人： SUZUKI, Tsutomu , OHORI, Shinichi , KOITABASHI, Ryuji , NAKAGAWA, Hideo , TAKASAKA, Takuro , KINOSHITA, Takahiro , FUKUDA, Hiroshi
IPC分类号： G03F1/66 , H01L21/673
CPC分类号： G03F1/66 , H01L21/67359 , H01L21/67393
摘要： The purpose of the present invention is to further reliably reduce the contamination of photomask blanks due to the adherence of the dust and particles generated during the storage, transportation, or operation of the container while suppressing the effect on a resist pattern, thereby improving the quality and yield of the photomask blanks. The present invention pertains to a container (1) for storing photomask blanks that stores, transports, or safeguards photomask blanks (2), wherein at least one of the components is constituted by a thermoplastic resin where the amount of caprolactam measured by the dynamic head space method when kept for 60 minutes at 40°C is 0.01 ppm or less n-decane conversion amount per resin weight, and the surface resistance value is no more than 1.0E + 13 ohms.
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公开(公告)号：EP3355115A1
公开(公告)日：2018-08-01
申请号：EP18153551.9
申请日：2018-01-25
IPC分类号： G03F1/84 , G01N21/956
CPC分类号： G01N21/8851 , G01N21/956 , G01N2021/8874 , G01N2021/95676 , G03F1/84
摘要： A photomask blank having a thin film on a transparent substrate is inspected for defects by irradiating inspection light to a surface region of the blank, collecting the reflected light from the irradiated region via an optical inspection system to form a magnified image of the region, extracting a feature parameter of light intensity distribution from the magnified image, and identifying the bump/pit shape of the defect based on the feature parameter combined with the structure of the thin film. The defect inspection method is effective for discriminating defects of bump or pit shape in a highly reliable manner. On application of the defect inspection method, photomask blanks having no pinhole defects are available at lower costs and higher yields.
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4.发明授权DEFECT INSPECTING METHOD, SORTING METHOD AND PRODUCING METHOD FOR PHOTOMASK BLANK 有权光刻空白的缺陷检测方法，分选方法和生产方法
公开(公告)号：EP3139213B1
公开(公告)日：2018-05-09
申请号：EP16185344.5
申请日：2016-08-23
IPC分类号： G03F1/84 , G03F1/72 , G01N21/88 , G01N21/956
CPC分类号： G01N21/8851 , G01N21/956 , G01N2021/95676 , G03F1/84
摘要： Disclosed is a method of inspecting a defect present at a surface portion of a photomask blank which includes an optical film, and a thin film. The method includes: selecting and designating an inspection treatment procedure and a criterion for determination of rugged shape of the defect which correspond to modes of the optical film and the thin film of the photomask blank; applying inspection light to a region including the defect while maintaining a distance between the defect and an objective lens of an inspecting optical system, based on the designated inspection treatment procedure, and collecting reflected light from the region irradiated with the inspection light, as a magnified image of the region, through the inspecting optical system; and determining the rugged shape of the defect, from light intensity distribution of the magnified image, based on the designated criterion for determination.
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5.发明公开DEFECT INSPECTING METHOD, SORTING METHOD AND PRODUCING METHOD FOR PHOTOMASK BLANK 有权光刻空白的缺陷检测方法，分选方法和生产方法
公开(公告)号：EP3139213A3
公开(公告)日：2017-05-10
申请号：EP16185344.5
申请日：2016-08-23
IPC分类号： G03F1/84 , G03F1/72 , G01N21/88 , G01N21/956
CPC分类号： G01N21/8851 , G01N21/956 , G01N2021/95676 , G03F1/84
摘要： Disclosed is a method of inspecting a defect present at a surface portion of a photomask blank which includes an optical film, and a thin film. The method includes:
selecting and designating an inspection treatment procedure and a criterion for determination of rugged shape of the defect which correspond to modes of the optical film and the thin film of the photomask blank; applying inspection light to a region including the defect while maintaining a distance between the defect and an objective lens of an inspecting optical system, based on the designated inspection treatment procedure, and collecting reflected light from the region irradiated with the inspection light, as a magnified image of the region, through the inspecting optical system; and
determining the rugged shape of the defect, from light intensity distribution of the magnified image, based on the designated criterion for determination.摘要翻译： 公开了一种检查存在于包括光学膜和薄膜的光掩模坯的表面部分处的缺陷的方法。 该方法包括：选择并指定用于确定与光学膜和光掩模坯的薄膜的模式相对应的缺陷的凹凸形状的检验处理程序和标准; 在保持检查光学系统的缺陷与物镜之间的距离的同时，基于指定的检查处理过程将检查光施加到包括缺陷的区域，并且将从被检查光照射的区域反射的光收集为放大的 该区域的图像，通过检查光学系统; 以及基于所确定的指定标准从放大图像的光强度分布确定缺陷的凹凸形状。
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6.发明公开DEFECT INSPECTING METHOD, SORTING METHOD AND PRODUCING METHOD FOR PHOTOMASK BLANK 有权MÄNGELINSPEKTIONSVERFAHREN，SORTIERVERFAHREN UND HERSTELLUNGSVERFAHRENFÜRFOTOMASKENROHLING
公开(公告)号：EP3139213A2
公开(公告)日：2017-03-08
申请号：EP16185344.5
申请日：2016-08-23
IPC分类号： G03F1/84
CPC分类号： G01N21/8851 , G01N21/956 , G01N2021/95676 , G03F1/84
摘要： Disclosed is a method of inspecting a defect present at a surface portion of a photomask blank which includes an optical film, and a thin film. The method includes:
selecting and designating an inspection treatment procedure and a criterion for determination of rugged shape of the defect which correspond to modes of the optical film and the thin film of the photomask blank; applying inspection light to a region including the defect while maintaining a distance between the defect and an objective lens of an inspecting optical system, based on the designated inspection treatment procedure, and collecting reflected light from the region irradiated with the inspection light, as a magnified image of the region, through the inspecting optical system; and
determining the rugged shape of the defect, from light intensity distribution of the magnified image, based on the designated criterion for determination.摘要翻译： 公开了一种检查存在于包括光学膜和薄膜的光掩模坯料的表面部分处的缺陷的方法。 该方法包括：选择和指定检查处理程序和用于确定与光掩模坯料的光学膜和薄膜的模式对应的缺陷的粗糙形状的标准; 基于指定的检查处理程序，将检查光施加到包括缺陷的区域，同时保持检查光学系统的缺陷和物镜之间的距离，并将来自被检查光照射的区域的反射光作为放大 该地区的形象，通过检查光学系统; 以及根据所确定的确定标准，根据放大图像的光强度分布确定缺陷的粗糙形状。
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7.发明公开DEFECT INSPECTING METHOD, SORTING METHOD, AND PRODUCING METHOD FOR PHOTOMASK BLANK 审中-公开DEFEKTINSPEKTIONSVERFAHREN，SORTIERVERFAHREN UND HERSTELLUNGSVERFAHRENFÜRFOTOMASKENROHLING
公开(公告)号：EP3109700A3
公开(公告)日：2017-03-08
申请号：EP16172622.9
申请日：2016-06-02
CPC分类号： G03F1/36 , G01B11/24 , G01N21/9501 , G01N2201/0638 , G03F1/84
摘要： A method of inspecting a defect present at a surface portion of a photomask blank having at least one thin film formed on a substrate by use of the inspecting optical system. The method includes setting the distance between the defect and an objective lens of an inspecting optical system to a defocus distance, applying inspection light to the defect through the objective lens, collecting reflected light from the region irradiated with the inspection light, through the objective lens, as a magnified image, identifying a light intensity variation portion of the magnified image, and determining the rugged shape of the defect on the basis of a variation in light intensity of the light intensity variation portion of the magnified image.
摘要翻译： 通过使用检查光学系统检查存在于具有形成在基板上的至少一个薄膜的光掩模坯料的表面部分处的缺陷的方法。 该方法包括将检查光学系统的缺陷与物镜之间的距离设定为散焦距离，通过物镜对缺陷施加检查光，通过物镜收集来自被检查光照射的区域的反射光 作为放大图像，识别放大图像的光强度变化部分，并且基于放大图像的光强度变化部分的光强度的变化来确定缺陷的粗糙形状。
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8.发明公开DEFECT INSPECTING METHOD, SORTING METHOD, AND PRODUCING METHOD FOR PHOTOMASK BLANK 审中-公开缺陷检查处理，排序方法和方法光掩模坯料
公开(公告)号：EP3109700A2
公开(公告)日：2016-12-28
申请号：EP16172622.9
申请日：2016-06-02
IPC分类号： G03F1/84
CPC分类号： G03F1/36 , G01B11/24 , G01N21/9501 , G01N2201/0638 , G03F1/84
摘要： A method of inspecting a defect present at a surface portion of a photomask blank having at least one thin film formed on a substrate by use of the inspecting optical system. The method includes setting the distance between the defect and an objective lens of an inspecting optical system to a defocus distance, applying inspection light to the defect through the objective lens, collecting reflected light from the region irradiated with the inspection light, through the objective lens, as a magnified image, identifying a light intensity variation portion of the magnified image, and determining the rugged shape of the defect on the basis of a variation in light intensity of the light intensity variation portion of the magnified image.
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