NANOLITHOGRAPHY PROCESS
    1.
    发明公开
    NANOLITHOGRAPHY PROCESS 有权
    NANOLITHOGRAFIEVERFAHREN

    公开(公告)号:EP2399167A1

    公开(公告)日:2011-12-28

    申请号:EP10711602.2

    申请日:2010-02-16

    IPC分类号: G03F7/00 G03F7/027 G03F7/004

    摘要: The invention pertains to a method for replicating a pattern, said method comprising: (a) providing patterned template, wherein said patterned template comprises a patterned template surface having a plurality of recessed or protruded areas formed therein; (b) contacting a volume of a curable perfluoropolyether composition [composition (C)] with said patterned template surface, said composition comprising: - at least one functional perfluoropolyether compound [compound (E)], said compound (E) comprising a (per)fluoropolyoxyalkylene chain [chain (R
    f )], wherein the molecular weight of said chain R
    f is more than 1000 and less than 3500; and at least two unsaturated moieties; and - at least one photoinitiator; (c) submitting to UV radiations said composition (C) to yield a mould comprising a patterned mould surface, and separating said mould from said patterned template; (d) contacting said patterned mould surface with a (pre)polymer composition [composition (P)]; (e) processing said composition (P) to yield an article having a patterned surface, and separating said article from said mould.