摘要:
A memory system is organized as a matrix including a memory cell at each intersection of a bit line with write and read word lines Each memory cell comprises a first FET 20 having its gate coupled to a write word line and its drain coupled to a bit line, a second FET 22 having its source coupled to the bit line and its drain coupled to a read word line, and first and second negative resistance devices 24,26 coupled in series between a supply voltage and a substrate voltage, the common point SN of the series-connected negative resistance devices being coupled to the source of the first FET and to the gate of the second FET. Preferably, the first FET 20 is a p-channel device, the second FET 22 is an n-channel device, and the first and second negative resistance devices 24,26 are RTDs. In a second embodiment, a memory system has a memory cell at each intersection of a bit line with a word line. The memory cell comprises an FET having its gate coupled to a word line and one of its drain and source electrodes coupled to a bit line, first and second negative resistance devices 44,46 coupled in series between a supply voltage and a substrate voltage, the common point SN of the series-connected negative resistance devices being coupled to the other of the drain and source electrodes, and a capacitance 48 coupled between the common point of the series-connected negative resistance devices.
摘要:
A two-port memory cell includes a bistable latch of two series connected resonant tunnel diodes (RTDs) 34, 38 connected between supply (+Pwr) and substrate (-Pwr) voltages, the common node 36 of the two RTDs being coupled to both the reading and writing functions of the cell. The writing function is achieved by a field effect pass transistor 30 whose active electrodes 25, 28 are tied between the common node of the RTDs and the bit writing bus WB and whose gate 26 is tied to the digital memory word writing bus WW. The reading function is achieved with a sense amplifier n-channel transistor 46 with the source tied to the negative power supply, the gate 40 tied to the common node 36 of the RTDs and the drain 42 tied to an electrode 48 of an n-channel pass transistor 53 which connects the sense amplifier drain 42 to the read bit line RB depending on the gate voltage of the pass transistor 53 whose gate 50 is tied to the read word line RW.
摘要:
A two-port memory cell includes a bistable latch of two series connected resonant tunnel diodes (RTDs) 34, 38 connected between supply (+Pwr) and substrate (-Pwr) voltages, the common node 36 of the two RTDs being coupled to both the reading and writing functions of the cell. The writing function is achieved by a field effect pass transistor 30 whose active electrodes 25, 28 are tied between the common node of the RTDs and the bit writing bus WB and whose gate 26 is tied to the digital memory word writing bus WW. The reading function is achieved with a sense amplifier n-channel transistor 46 with the source tied to the negative power supply, the gate 40 tied to the common node 36 of the RTDs and the drain 42 tied to an electrode 48 of an n-channel pass transistor 53 which connects the sense amplifier drain 42 to the read bit line RB depending on the gate voltage of the pass transistor 53 whose gate 50 is tied to the read word line RW.
摘要:
A memory system is organized as a matrix including a memory cell at each intersection of a bit line with write and read word lines Each memory cell comprises a first FET 20 having its gate coupled to a write word line and its drain coupled to a bit line, a second FET 22 having its source coupled to the bit line and its drain coupled to a read word line, and first and second negative resistance devices 24,26 coupled in series between a supply voltage and a substrate voltage, the common point SN of the series-connected negative resistance devices being coupled to the source of the first FET and to the gate of the second FET. Preferably, the first FET 20 is a p-channel device, the second FET 22 is an n-channel device, and the first and second negative resistance devices 24,26 are RTDs. In a second embodiment, a memory system has a memory cell at each intersection of a bit line with a word line. The memory cell comprises an FET having its gate coupled to a word line and one of its drain and source electrodes coupled to a bit line, first and second negative resistance devices 44,46 coupled in series between a supply voltage and a substrate voltage, the common point SN of the series-connected negative resistance devices being coupled to the other of the drain and source electrodes, and a capacitance 48 coupled between the common point of the series-connected negative resistance devices.