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公开(公告)号:EP1907320A2
公开(公告)日:2008-04-09
申请号:EP06770854.5
申请日:2006-05-23
IPC分类号: C01B31/06
CPC分类号: C30B29/04 , C01B32/25 , C23C16/274 , C23C16/277 , C23C16/279 , C30B25/105
摘要: The present invention relates to a method for producing colorless, single-crystal diamonds at a rapid growth rate. The method for diamond production includes controlling temperature of a growth surface of the diamond such that all temperature gradients across the growth surface of the diamond are less than about 20 0C, and growing single-crystal diamond by microwave plasma chemical vapor deposition on the growth surface of a diamond at a growth temperature in a deposition chamber having an atmosphere, wherein the atmosphere comprises from about 8 % to about 20 % CH4 per unit of H2 and from about 5 to about 25 % O2 per unit of CH4. The method of the invention can produce diamonds larger than 10 carats. Growth rates using the method of the invention can be greater than 50 μm/hour.