-
公开(公告)号：EP1279021A2
公开(公告)日：2003-01-29
申请号：EP01926631.1
申请日：2001-04-05
CPC分类号： G01N29/4436 , G01N5/04 , G01N5/045 , G01N29/022 , G01N29/228 , G01N2291/014 , G01N2291/0212 , G01N2291/0228 , G01N2291/0256 , G01N2291/02845 , G01N2291/0427
摘要： An apparatus (10) for measuring the mass of a substance includes a sensor (12) having a membrane layer (14), the membrane for receiving the substance thereon, an oscillator device (20) for driving the membrane at a reference resonant frequency, a frequency detection device (24) for determining a change in the reference resonant frequency caused by the presence of the substance on the membrane and a mass determining device (26) for determining the mass of the substance, the change in the reference resonant frequency being indicative of the mass of the substance. The apparatus may be used to determine the concentration of the substance within a volatile solution, to determine the moisture content of the substance, and to determine the boiling point of the substance.
-
公开(公告)号：EP1266214B1
公开(公告)日：2009-09-23
申请号：EP01920576.4
申请日：2001-03-20
CPC分类号： G01N29/022 , G01N29/22 , G01N2291/02466 , G01N2291/0255 , G01N2291/0256 , G01N2291/0427 , G01N2291/106 , Y10T29/42 , Y10T29/49007
摘要： A method for manufacturing a flexural plate wave sensor includes the steps of depositing an etch-stop layer (34) over a substrate (32), depositing a membrane layer (36) over the etch stop layer, depositing a piezoelectric layer (38) over the membrane layer, forming a first transducer (44) on the piezoelectric layer and forming a second transducer (48) on the piezoelectric layer, spaced from the first transducer. The method further includes the steps of etching a cavity (52) through the substrate, the cavity having substantially parallel interior walls (54a, 54b), removing the portion of the etch stop layer between the cavity and the membrane layer to expose a portion (53) of the membrane layer, and depositing an absorptive coating (56) on the exposed portion of the membrane layer.
-
公开(公告)号：EP1266214A1
公开(公告)日：2002-12-18
申请号：EP01920576.4
申请日：2001-03-20
CPC分类号： G01N29/022 , G01N29/22 , G01N2291/02466 , G01N2291/0255 , G01N2291/0256 , G01N2291/0427 , G01N2291/106 , Y10T29/42 , Y10T29/49007
摘要： A method for manufacturing a flexural plate wave sensor includes the steps of depositing an etch-stop layer (34) over a substrate (32), depositing a membrane layer (36) over the etch stop layer, depositing a piezoelectric layer (38) over the membrane layer, forming a first transducer (44) on the piezoelectric layer and forming a second transducer (48) on the piezoelectric layer, spaced from the first transducer. The method further includes the steps of etching a cavity (52) through the substrate, the cavity having substantially parallel interior walls (54a, 54b), removing the portion of the etch stop layer between the cavity and the membrane layer to expose a portion (53) of the membrane layer, and depositing an absorptive coating (56) on the exposed portion of the membrane layer.
-
-
搜索结果
3 条记录 (耗时 0.011 秒)
