公开(公告)号：EP1898445A4

公开(公告)日：2011-08-10

申请号：EP06766987

申请日：2006-06-20

申请人： TOKYO ELECTRON LTD

发明人： MACHIYAMA WATARU ,  ISHIZAWA SHIGERU ,  KOIZUMI HIROSHI ,  HIROKI TSUTOMU ,  KONDOH KEISUKE

IPC分类号： H01L21/677

CPC分类号： H01L21/67745 ,  H01L21/67276 ,  H01L21/67742

公开(公告)号：EP1207025A4

公开(公告)日：2004-05-26

申请号：EP99972143

申请日：1999-11-15

申请人： TOKYO ELECTRON LTD

发明人： SAEKI HIROAKI ,  KONDOH KEISUKE

IPC分类号： B25J9/06 ,  B25J9/10 ,  B25J18/02 ,  H01L21/677 ,  H01L21/687 ,  B25J17/02 ,  H01L21/00 ,  H01L21/68

CPC分类号： H01L21/687 ,  B25J9/1065 ,  B25J9/107 ,  H01L21/67742 ,  Y10S414/13 ,  Y10T74/20305 ,  Y10T74/20329

摘要： Semiconductor wafer processing chambers, for example, are often located in a high temperature corrosive environment, and if an arm having a belt, such as a steel belt, is carried into and out of such environment, the belt is exposed to the high temperature corrosive environment. Belts, such as steel belts, are limited in heat resistance and corrosion resistance, and their service life will be shortened in such high temperature corrosive environment as in processing chambers. A conveyor system characterized by comprising a frog-leg type arm (3), and a wafer holder (4) connected thereto, the wafer holder (4) being supported at the respective front ends of first and second front arms (8A, 8B) through an articulation (10) of coaxial construction, an attitude retaining link (5) consisting of two antiparallel link mechanisms connecting the first and second front arms (8A, 8B) and the wafer holder (4) to each other, through which attitude retaining link the rotation of the wafer holder (4) relative to the first and second front arms (8A, 8B) is controlled.

摘要翻译： 在大多数情况下，在例如半导体晶片处理室中产生热的腐蚀性气体。 当包括诸如钢带的带子的臂移动到这样的半导体晶片处理室中时，带子暴露于热的腐蚀性气氛中。 皮带，如钢带，具有有限的耐热性和耐腐蚀性，加工室内的热腐蚀性气氛缩短了皮带的使用寿命。 本发明的携带装置具有连接到青蛙腿型臂（3）的蛙腿式臂（3）和晶片保持架（4）。 晶片保持器（4）通过同轴接头（10）枢转地连接到第一前臂（8A）和第二前臂（8B）的前端部分。 晶片保持器（4）通过包括两个能够控制晶片保持器（4）的相对转动的两个反平行连杆的姿态维持联动装置（5）连接到第一前臂（8A）和第二前臂（8B） 第一和第二前臂（8A，8B）。