专利检索 ap:("TOKYO OHKA KOGYO CO., LTD.") AND inv:"HIRANO Isao" 第 1 页

1.

发明公开
FILM CLEANING SOLUTION AND METHOD FOR CLEANING FILM 审中-公开

公开(公告)号：EP4249107A1

公开(公告)日：2023-09-27

申请号：EP21894669.7

申请日：2021-11-17

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： HIRANO Isao

IPC分类号： B01D65/06 , B01D71/26 , B01D71/64 , B08B3/10 , C11D7/26 , C11D7/50

摘要： A film cleaning solution that contains a solvent and a metal removing agent, in which two or more kinds of the solvents are contained, and a distance between a Hansen solubility parameter of the film cleaning solution and a Hansen solubility parameter of dimethylacetamide is 1.0 or less.