公开(公告)号：EP1593754A4

公开(公告)日：2011-03-23

申请号：EP03782915

申请日：2003-12-26

申请人： TOPPAN PRINTING CO LTD ,  APPLIED MATERIALS GMBH & CO KG

发明人： SASAKI NOBORU ,  SUZUKI HIROSHI ,  KOIZUMI FUMITAKE ,  IMAI NOBUHIKO ,  ARAI KUNIMASA ,  KONAGAI HIROYUKI

IPC分类号： C23C14/56 ,  C23C16/54

CPC分类号： C23C14/562

摘要： This invention relates to a vacuum vapor-deposition apparatus for forming vapor-deposited films on a base film, thereby to produce vapor-deposited films, and also to a method of producing vapor-deposited films. In the vacuum vapor-deposition apparatus, the synchronizing means (18) equalizes the circumference velocity v1 of the coating roll (14) and the circumference velocity v2 of the takeup guide roll (15). Hence, v1 = v2. Therefore, the takeup guide roll (15) never rubs the vapor-deposited layer provided on the surface of the film. This eliminates the possibility that the vapor-deposited layer has scratches. The vapor-deposited layer can therefore possess desired properties.