公开(公告)号：EP0905740A4

公开(公告)日：2006-03-29

申请号：EP98907206

申请日：1998-03-12

申请人： TOSHIBA KK

发明人： SATOU KAZUNORI ,  KIMIYA JUNICHI ,  SUGAWARA SHIGERU ,  ONO OSAMU ,  AWANO TAKASHI

IPC分类号： H01J29/48 ,  H01J29/50

CPC分类号： H01J29/485

摘要： The bead glass placing position of a support section (122) contained in the second grid (112) of an electron gun structure is positioned in a region on the third grid (113) side of a thick plate (121) having an electron beam passing hole. The electrode structure (123) of the third grid (113) on the second grid side is formed in a cup-like shape, and the bottom face (140) of the structure (123) is formed in a rectangular shape having a vertical width which is narrower than that of the opening of the bottom face (140) on a fourth grid side. A side wall (142) which is joined to the longer side of the bottom face (140) is inclined to the fourth grid side from the second grid side. Thus, an electron gun structure which is improved in withstand voltage characteristics without giving any influence to the electric field (156) of an auxiliary lens and has a simple structure can be obtained.