MULTI-BEAM KLYSTRON APPARATUS
    1.
    发明公开
    MULTI-BEAM KLYSTRON APPARATUS 有权
    MEHRSTRAHLEN-KLYSTRONVORRICHTUNG

    公开(公告)号:EP1964146A4

    公开(公告)日:2009-05-06

    申请号:EP06822949

    申请日:2006-10-27

    发明人: MIYAKE SETSUO

    摘要: The present invention provides a multi-beam klystron apparatus (11). In the above-described multi-beam klystron apparatus, the magnetic field generating element (52) of the electron-gun-unit-side magnetic field generating unit (41) is disposed around the electron gun unit (18), and a plurality of magnetic gaps (54, 55) are provided in the inner peripheral surface of the magnetic pole (53), which covers the magnetic field generating element, in the direction of travel of the electron beams. Therefore, lines of magnetic force, which are parallel to the center axis of the radio-frequency interaction unit (19), can be generated. Thus, even the electron beam, which is generated from the location apart from the center axis of the electron gun unit, can be guided to the radio-frequency interaction unit in the same manner as in the location at the canter axis of the electron gun unit.

    摘要翻译: 本发明提供了一种多波束速调管装置(11)。 在上述多束速调管装置中,电子枪单元侧磁场发生单元(41)的磁场发生元件(52)设置在电子枪单元(18)周围,并且多个 在电子束的行进方向上,在覆盖磁场产生元件的磁极(53)的内周表面中设置有磁隙(54,55)。 因此,可以产生平行于射频交互单元19的中心轴线的磁力线。 因此,即使从远离电子枪单元的中心轴的位置产生的电子束也可以以与电子枪的俯仰轴处的位置相同的方式被引导到射频交互单元 单元。