-
1.发明公开
公开(公告)号：EP0455408A1
公开(公告)日：1991-11-06
申请号：EP91303681.0
申请日：1991-04-24
CPC分类号： C23C14/562
摘要： A process for coating the surface of a fibre for use in a metal matrix composite material in which the fibre is drawn continuously through a plasma discharge in a hollow cathode electrode the inner wall of which at least is made of a material to be deposited on the fibre.
摘要翻译： 一种用于涂覆在金属基质复合材料中的纤维表面的方法，其中纤维通过中空阴极电极中的等离子体放电连续地被抽吸，其中内壁至少由要沉积在其上的材料制成 纤维。
-
公开(公告)号：EP0208487A2
公开(公告)日：1987-01-14
申请号：EP86305043.1
申请日：1986-06-27
CPC分类号： C23C14/541 , C23C14/165
摘要： A coating is formed on a substrate by sputter ion plating wherein a DC glow discharge is generated under soft vacuum conditions in the presence of the substrate and of a cathode constituted by the coating material thereby to release material at the cathode by ion bombardment, which released material diffuses to the substrate to form the coating thereon, and wherein a potential is applied to the substrate during coating.
The coating material comprises a MCrAlSi allow (where M is a single metal or combination of metals selected from the group consisting of nickel, cobalt and iron) and the potential is in the form of an AC bias in order to control the properties of the coating. It is thereby possible to coat uniformly subtrates having sharp edges such as aerofoil components. Moreover, the coatings are found to possess outstanding corrosion resistance properties.摘要翻译： 通过溅射离子电镀在基板上形成涂层，其中在基板和由涂层材料构成的阴极的存在下，在软真空条件下产生直流辉光放电，从而通过离子轰击在阴极释放材料，释放 材料扩散到基底以在其上形成涂层，并且其中在涂覆期间将电势施加到基底。 涂层材料包括MCrAlSi允许（其中M是单一金属或选自镍，钴和铁的金属组合），并且电位为AC偏压的形式以控制涂层的性质 。 因此可以均匀地涂覆具有锋利边缘的均匀的底物，例如机翼成分。 此外，发现涂层具有优异的耐腐蚀性能。
-
公开(公告)号：EP0207768A2
公开(公告)日：1987-01-07
申请号：EP86305044.9
申请日：1986-06-27
IPC分类号： C23C14/34
CPC分类号： C23C14/165 , C23C14/541
摘要： A coating is formed on a substrate by sputter ion plating wherein a DC glow discharge is generated under soft vacuum conditions in the presence of the substrate and of a cathode constituted by the coating material thereby to release material at the cathode by ion bombardment, which released material diffuses to the substrate to form the coating thereon, and wherein a potential is applied to the substrate during coating.
In order to control the coating, for example when it is an alloy containing Al and when the substrate has sharp edges, the potential is applied in the form of an AC bias of e.g. 20 to 200 volts wherein ion polishing occurs in the negative part of the cycle and retention of coating material in the positive part thereof.摘要翻译： 通过溅射离子电镀在衬底上形成涂层，其中在存在衬底和由涂层材料构成的阴极的情况下在软真空条件下产生DC辉光放电，从而通过离子轰击在阴极释放材料，其释放 材料扩散到基材上以在其上形成涂层，并且其中在涂布期间将电势施加到基材。 为了控制涂层，例如当它是含有Al的合金时，并且当衬底具有尖锐的边缘时，电势以AC偏压（例如， 20至200伏特，其中离子抛光发生在循环的负部分并且涂层材料保留在其正部分中。
-
公开(公告)号：EP0208487A3
公开(公告)日：1987-08-19
申请号：EP86305043
申请日：1986-06-27
CPC分类号： C23C14/541 , C23C14/165
摘要： A coating is formed on a substrate by sputter ion plating wherein a DC glow discharge is generated under soft vacuum conditions in the presence of the substrate and of a cathode constituted by the coating material thereby to release material at the cathode by ion bombardment, which released material diffuses to the substrate to form the coating thereon, and wherein a potential is applied to the substrate during coating. The coating material comprises a MCrAlSi allow (where M is a single metal or combination of metals selected from the group consisting of nickel, cobalt and iron) and the potential is in the form of an AC bias in order to control the properties of the coating. It is thereby possible to coat uniformly subtrates having sharp edges such as aerofoil components. Moreover, the coatings are found to possess outstanding corrosion resistance properties.
-
公开(公告)号：EP0207768A3
公开(公告)日：1987-08-05
申请号：EP86305044
申请日：1986-06-27
IPC分类号： C23C14/34
CPC分类号： C23C14/165 , C23C14/541
摘要： A coating is formed on a substrate by sputter ion plating wherein a DC glow discharge is generated under soft vacuum conditions in the presence of the substrate and of a cathode constituted by the coating material thereby to release material at the cathode by ion bombardment, which released material diffuses to the substrate to form the coating thereon, and wherein a potential is applied to the substrate during coating. In order to control the coating, for example when it is an alloy containing Al and when the substrate has sharp edges, the potential is applied in the form of an AC bias of e.g. 20 to 200 volts wherein ion polishing occurs in the negative part of the cycle and retention of coating material in the positive part thereof.
-
-
-
-
搜索结果
5 条记录 (耗时 0.01 秒)
