ULTRAVIOLET IRRADIATION DEVICE
    1.
    发明公开
    ULTRAVIOLET IRRADIATION DEVICE 有权
    ULTRAVIOLETTBESTRAHLUNGSVORRICHTUNG

    公开(公告)号:EP2579295A4

    公开(公告)日:2013-12-04

    申请号:EP11789734

    申请日:2011-05-30

    摘要: Provided is a compact ultraviolet irradiation apparatus which is capable of emitting ultraviolet radiation with high efficiency. This ultraviolet irradiation apparatus includes, in a vessel, a semiconductor multi-layered film element and an electron beam irradiation source for irradiating the semiconductor multi-layered film element with an electron beam, the vessel being hermetically sealed to have a negative internal pressure and having an ultraviolet transmitting window. Furthermore, the semiconductor multi-layered film element includes an active layer having a single quantum well structure or a multi quantum well structure of In x Al y Ga 1-x-y N (0 ‰¤ x

    摘要翻译: 本发明提供能够高效地发射紫外线的小型的紫外线照射装置。 该紫外线照射装置在容器内具有半导体多层膜元件和用电子束照射半导体多层膜元件的电子束照射源,该容器被气密密封以具有负的内压并具有 一个紫外线透射窗口。 此外,半导体多层膜元件包括具有单量子阱结构或In x Al y Ga 1-xy N(0≤x≤1,0≤y≤y≤1的多量子阱结构的有源层 1,x +y≤1),并且用来自电子束照射源的电子束照射半导体多层膜元件的有源层。 这允许半导体多层膜元件通过紫外线透射窗将紫外线辐射发射出容器。 此外,满足以下等式(1),4.18×V 1.50‰t‰¤10.6×V 1.54其中V(kV)是电子束的加速电压,t(nm)是有源层的厚度。