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    PLASMA PROCESS AND REACTOR FOR THE THERMOCHEMICAL TREATMENT OF THE SURFACE OF METALLIC PIECES
    3.
    发明公开
    PLASMA PROCESS AND REACTOR FOR THE THERMOCHEMICAL TREATMENT OF THE SURFACE OF METALLIC PIECES 审中-公开
    用于金属片表面热化学处理的等离子体处理和反应器

    公开(公告)号：EP3210233A1

    公开(公告)日：2017-08-30

    申请号：EP15790820.3

    申请日：2015-10-19

    申请人： Universidade Federal De Santa Catarina (UFSC)

    发明人： BINDER, Cristiano ,  BERNARDELLI, Euclides Alexandre ,  HAMMES, Gisele ,  KLEIN, Aloisio Nelmo ,  LAMIM, Thiago De Souza ,  BINDER, Roberto

    IPC分类号： H01J37/32 ,  C23C16/448 ,  H01J37/34

    摘要： The reactor (R) has a reaction chamber (RC) provided with a support (S) for the metallic pieces (1) and with a system of an anode (2), connected to a ground (2b), and of a cathode system (3) connected to the support (S) and to a pulsating DC power supply (10). In the reaction chamber (RC), which is heated and supplied with a gas load is formed, by means of an electric discharge in the cathode (3), a gas plasma. A liquid or gas precursor is admitted in at least one tubular cracking chamber (20) associated with a high voltage energy source (30). It may be provided at least one tubular sputtering chamber (40) associated with an electric power supply (50) receiving a solid precursor. A potential difference is applied between the anode (2) and one and/or other of said tubular chambers (20, 40), in order to release the alloy elements to be ionically bombarded against the metallic pieces (1), either simultaneously or individually and in any order.

    摘要翻译： 反应器（R）具有设置有用于金属片（1）的支撑件（S）的反应室（RC）以及连接到地面（2b）的阳极（2）的系统和阴极系统 （3）连接到支架（S）和脉动直流电源（10）。 在通过阴极（3）中的放电形成被加热并供应有气体负载的反应室（RC）中的气体等离子体。 液态或气态前体进入至少一个与高压能源（30）相关的管式裂化室（20）中。 可以提供与接收固体前体的电源（50）相关联的至少一个管状溅射室（40）。 在阳极（2）和所述管状腔室（20,40）中的一个和/或另一个之间施加电位差，以便同时或单独地释放合金元素以对金属片（1）进行离子轰击 并以任何顺序。