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    Optically black absorption or emission surface and method for producing the same
    1.
    发明公开
    Optically black absorption or emission surface and method for producing the same 有权
    Optisch schwarze Absorptions-oderEmissionsflächeund Herstellungsverfahren

    公开(公告)号：EP0922972A1

    公开(公告)日：1999-06-16

    申请号：EP98660137.5

    申请日：1998-12-08

    申请人： VALTION TEKNILLINEN TUTKIMUSKESKUS ,  VAISALA OYJ

    发明人： Blomberg, Martti Juhani ,  Torkkeli, Altti Kaleva ,  Lehto, Ari

    IPC分类号： G02B5/22 ,  G02B5/20

    CPC分类号： G02B5/22

    摘要： The invention relates to a structure suitable for manufacturing by the fabrication techniques of microelectronics so as to include an optically black surface adapted to function as an absorber or emitter, respectively, over a predetermined wavelength range, said structure comprising a electrically nonconducting support layer (1), a metallic mirror layer (2) made on said support layer (1), and a lossy layer (4) made on the support layer (1) and the metallic mirror layer (2) superimposed thereon. According to the invention, the mirror layer (2) is made on the upper surface of said support layer (1) and the lossy layer (4) is made from a doped semiconductor material. The thickness of the multilayer structure (3, 4, 7) and the doping of the lossy layer (4) are proportioned to each other so that the mirror layer (2) will be optically matched over the predetermined wavelength range of absorption or emission, respectively, to the medium surrounding the structure. The invention also concerns a method for manufacturing said surfaces.

    摘要翻译： 本发明涉及一种适用于通过微电子学制造技术制造的结构，以便包括分别在预定波长范围上用作吸收体或发射体的光学黑色表面，所述结构包括电非导电支撑层（1 ），在所述支撑层（1）上形成的金属镜层（2）和在支撑层（1）上形成的有损耗层（4）和叠置在其上的金属镜层（2）。 根据本发明，镜面层（2）制成在所述支撑层（1）的上表面上，并且有损层（4）由掺杂的半导体材料制成。 多层结构（3,4,7）的厚度和有损层（4）的掺杂彼此成比例，使得镜层（2）在预定的吸收或发射波长范围内将被光学匹配， 分别围绕结构的介质。 本发明还涉及制造所述表面的方法。