公开(公告)号：EP2441085A2

公开(公告)日：2012-04-18

申请号：EP10786594.1

申请日：2010-06-03

Applicant: Veeco Instruments Inc.

Inventor： ARMOUR, Eric A. ,  QUINN, William E. ,  SFERLAZZO, Piero

IPC: H01L21/205 ,  C23C16/54

CPC classification number: C23C16/545 ,  C23C16/45502 ,  C30B25/14

Abstract: A roll-to-roll CVD system includes at least two rollers that transport a web through a deposition chamber during CVD processing. The deposition chamber defines a passage for the web to pass through while being transported by the at least two rollers. The deposition chamber includes a plurality of process chambers that are isolated by barriers which maintain separate process chemistry in each of the plurality of process chambers. Each of the plurality of process chambers includes a gas input port and a gas exhaust port, and a plurality of CVD gas sources. At least two of the plurality of CVD gas sources is coupled to the gas input port of each of the plurality of process chambers.

公开(公告)号：EP2441086A2

公开(公告)日：2012-04-18

申请号：EP10786595.8

申请日：2010-06-03

Applicant: Veeco Instruments Inc.

Inventor： ARMOUR, Eric A. ,  QUINN, William E. ,  SFERLAZZO, Piero

IPC: H01L21/205

CPC classification number: C23C16/54 ,  C23C16/4582 ,  C30B25/025 ,  C30B35/00

Abstract: A continuous feed CVD system includes a wafer transport mechanism that transport a wafer through a deposition chamber during CVD processing. The deposition chamber defines a passage for the wafer to pass through while being transported by the wafer transport mechanism. The deposition chamber includes a plurality of process chambers that are isolated by barriers which maintain separate process chemistry in each of the plurality of process chambers. Each of the plurality of process chambers includes a gas input port and a gas exhaust port, and a plurality of CVD gas sources. At least two of the plurality of CVD gas sources are coupled to the gas input port of each of the plurality of process chambers.

公开(公告)号：EP2735020A2

公开(公告)日：2014-05-28

申请号：EP12815170.1

申请日：2012-07-02

Applicant: Veeco Instruments Inc.

Inventor： PARANJPE, Ajit ,  ARMOUR, Eric A. ,  QUINN, William E.

IPC: H01L21/205

CPC classification number: C23C16/4582 ,  C23C16/54 ,  C30B25/025 ,  C30B35/00

Abstract: A multi-chamber CVD system includes a plurality of substrate carriers where each substrate carrier is adapted to support at least one substrate. A plurality of enclosures are each configured to form a deposition chamber enclosing one of the plurality of substrate carriers to maintain an independent chemical vapor deposition process chemistry for performing a processing step. A transport mechanism transports each of the plurality of substrate carriers to each of the plurality of enclosures in discrete steps that allow processing steps to be performed in the plurality of enclosures for a predetermined time. In some embodiments, the substrate carrier can be rotatable.