公开(公告)号：EP1883429B1

公开(公告)日：2013-07-10

申请号：EP06741298.1

申请日：2006-05-02

申请人： Vlaamse Instelling voor Technologisch Onderzoek N.V. (VITO)

发明人： VANGENEUGDEN, Dirk ,  REGO, Robby ,  HAVERMANS, Danny ,  BLOK, Herman

IPC分类号： A61L2/14 ,  A61L9/22 ,  H05H1/24 ,  B01J19/08 ,  C02F1/46 ,  A61L2/10

CPC分类号： A61L9/16 ,  A61L2/10 ,  A61L2/14 ,  A61L9/22 ,  C02F1/325 ,  C02F1/46109 ,  C02F1/48 ,  C02F1/725 ,  C02F2001/46152 ,  C02F2103/42 ,  C02F2305/10

公开(公告)号：EP1844635B1

公开(公告)日：2011-07-06

申请号：EP06705055.9

申请日：2006-02-06

申请人： Vlaamse Instelling voor Technologisch Onderzoek N.V. (VITO)

发明人： REGO, Robby Jozef Martin ,  HAVERMANS, Danny ,  COOLS, Jan Jozef

IPC分类号： H05H1/24

CPC分类号： H05H1/2406 ,  H05H2001/2412 ,  H05H2001/245

摘要： The present invention is related to a plasma jet apparatus for performing plasma processing of an article, comprising: - An elongated central electrode (2,15), - An elongated cylindrical outer electrode (1) or two outer electrodes (15,16) surrounding said central electrode and being coaxial with said central electrode, or two electrodes substantially parallel to the central electrode, - An electrical insulator (3) or insulators (18,19) disposed between said outer electrode(s) and said central electrode, wherein a discharge lumen having a distal end and a proximal end is defined between said central electrode and said electrical insulator(s), - A supply opening (6) disposed at said distal end of said discharge lumen for supplying a plasma producing gas to said discharge lumen, - A power source (9) for providing a voltage between said central electrode and said outer electrode characterised in that said electrical insulator has a radial or outward extension (40,20) at said proximal end beyond the outer surface of said outer electrode(s).