摘要:
An inkjet recording element comprises a support having thereon in order, from top to bottom, a fusible, porous layer comprising a mixture of fusible reactive polymer particles that comprise a thermoplastic polymer, with at least two reactive functional groups on two different particles in the mixture are capable of crosslinking with each other in the different particles. Optionally, an ink-carrier-liquid receptive layer is present between the fusible, porous layer and the support. Also disclosed is a method of inkjet printing on the element.
摘要:
Die Erfindung bezieht sich auf eine Zylinderanordnung für elektrographische Druckeinheiten, mit an einem Trägerkörper (1) aufgenommenen Stirnseiten (4, 7), an deren Umfang eine Zylinderhülse (6) abgestützt ist, deren Mantelfläche eine Funktionsschicht (16) aufnimmt. Die Zylinderanordnung (1, 4, 6, 7) enthält Einrichtungen (21; 25, 26, 27, 28, 29) zur Vorpositionierung der Zylinderhülse (6) bei deren Auswechseln.
摘要:
An inkjet recording element comprises a support having thereon in order, from top to bottom, a fusible, porous layer comprising a mixture of fusible reactive polymer particles that comprise a thermoplastic polymer, with at least two reactive functional groups on two different particles in the mixture are capable of crosslinking with each other in the different particles. Optionally, an ink-carrier-liquid receptive layer is present between the fusible, porous layer and the support. Also disclosed is a method of inkjet printing on the element.
摘要:
An improved continuous ink jet print station includes a drop generator with a jet array (14) and a drop charging assembly (16). The drop charging assembly includes a substrate (18) with a first side (20) facing the jet array, and one or more resistive heater elements (22a-22f) placed on the substrate aligned with the jet array. The resistive heater elements are discontinuously disposed on portions of the substrate. One or more one charging electrodes (24) are disposed on the first side. The continuous ink jet print station includes a power source (26) for powering the resistive heater elements to heat the substrate to a temperature sufficient to prevent condensation of fluid on the first side.
摘要:
A vapor deposition source for use in vacuum chamber for coating an organic layer on a substrate of an OLED device, includes a manifold(60) including side and bo ttom walls defining a chamber for receiving organic material, and an aperture pl ate(40) disposed between the side walls, the aperture plate having a plurality of spaced apart apertures(90) for emitting vaporized organic material; the apertu re plate including conductive material which in response to an electrical current produces heat; means for heating the organic material to a temperature which c auses its vaporization, and heating the side walls of the manifold; and an elect rical insulator(120) coupling the aperture plate to the side walls for concentra ting heat in the unsupported region of the aperture plate adjacent to the apertu res, whereby the distance between the aperture plate and the substrate can be re duced to provide high coatA vapor deposition source for use in vacuum chamber for coating an organic layer on a substrate of an OLED device, includes a manifoldincluding side and bottom walls defining a chamber for receiving organic materi al, and an aperture plate disposed between the side walls, the aperture plate ving a plurality of spaced apart apertures for emitting vaporized organic materi al; the aperture plate including conductive material which in response to an ele ctrical current produces heat; means for heating the organic material to a tempe rature which causes its vaporization, and heating the side walls of the manifold and an electrical insulator coupling the aperture plate to the side walls for concentrating heat in the unsupported region of the aperture plate adjacent to t he apertures, whereby the distance between the aperture plate and the substrate can be reduced to provide high coating thickness uniformity on the substrate.
摘要:
The present invention provides heat-developable, photothermographic elements comprising a support bearing at least one photosensitive, image-forming layer comprising: (a) a photosensitive silver halide; (b) a non-photosensitive, reducible silver source; (c) a reducing agent for silver ions; (d) a binder; and (e) a spectrally sensitizing amount of a compound having the central nucleus, represented by formula (I), wherein: Z is S, O, Se or N-R?3; R1 and R2¿ represent an alkyl group of from 1 to 20 carbon atoms other than carboxy-substituted alkyl, preferably an alkyl group of from 1 to 8 carbon atoms, and most preferably an ethyl group; and R3 is H or alkyl group; X and Y are thioalkyl groups of from 1 to 20 carbon atoms; n = 0 to 4; m = 0 to 4; the sum of n plus m equals at least 1; D1 to D7 each independently represents a methine group and adjacent methine groups selected from D?2, D3, D4, D5 and D6¿ may form cyclic groups; p = 0 or 1; and A- is an anion.
摘要翻译:本发明提供了可热显影的光热敏成像元件,它包括载有至少一个感光成像层的载体,该成像层包含:(a)感光卤化银; (b)非光敏可还原银源; (c)银离子的还原剂; (d)粘合剂; (e)光谱增感量的由式(Ⅰ)表示的具有中心核的化合物,其中:Z是S,O,Se或N-R 3; R1和R2'代表除羧基取代的烷基以外的1至20个碳原子的烷基,优选1至8个碳原子的烷基,最优选乙基; 和R3是H或烷基; X和Y是具有1至20个碳原子的硫代烷基; n = 0至4; m = 0至4; n加m的和等于至少1; D 1至D 7各自独立地表示次甲基,并且选自D 2,D 3,D 4,D 5和D 6'的相邻次甲基可以形成环状基团; p = 0或1; A-是阴离子。
摘要:
A high quality direct radiographic film is useful for dental care. The film contains relatively high silver coverage preferably coated on both sides of the support. It also contains sufficient silver halide desensitizer to reduce silver halide sensitivity to X-radiation by at least 0.02log E. The combination of silver and desensitizer coverages provides sufficiently high photographic speed, excellent image quality and increased stability to background radiation sources.
摘要:
A method for making microlens molds and microlens array molds is described which utilizes a spinning half radius diamond cutting member operated in a plunge cut in a technique similar to milling to cut the optical surface into a diamond turnable material. The method can be used to make high sag lens molds with high accuracy. Microlens array molds can be made with a high degree of uniformity and a nearly 100% fill factor.