摘要:
Method and apparatus for supplying a gaseous raw material to plural users. A liquid raw material is evaporated by a single evaporation means and supplied to a gaseous raw material takeout portion provided with a plurality of takeout ports. The gas pressure is varied according to amounts of the gaseous raw material taken out of the takeout ports. The pressure variations are regulated by a main pressure-adjusting means mounted downstream of the gaseous raw material takeout portion. Extra gaseous raw material is sent to a gaseous raw material -condensing means, where the material is liquified. Then, the liquified material is fed back to the evaporation means. Thus, a closed circulatory loop circuit is formed. The gas pressure in the gaseous raw material takeout portion is regulated. The gaseous raw material is distributed to plural users at any desired time at their respective flow rates such that supply of the raw material to each individual user is carried out independent of supply to other users.
摘要:
The previous methods of controlling the flow of vapor transported by a carrier gas from a bubbler (10) to a using system have customarily been the thermal-conductivity mass flow meter and the temperature controlled vaporizer bubbler (10). However, such control methods have the disadvantage that fluctuations occur in the vapor mass flow. In accordance with the present invention the flow of vapor transported by a carrier gas from a bubbler (10) to a using system is controlled to provide on uninterrupted uniform mass flow ofthevaporto the using system. Control of the flow of vapor is achieved by controlling the temperature (48) and pressure (50) within the bubbler (10).
摘要:
Methods and apparatuses for vaporizing liquid precursor material for use in a vapor deposition process are disclosed. The method for vaporizing liquid precursor material includes introducing a flow of liquid precursor material into an expansion chamber and directing the flow of liquid precursor material towards a wall of the chamber. The wall of the chamber is heated to a temperature sufficient to vaporize a first portion of the flow of liquid precursor material while a second portion of the flow of liquid precursor material remains in a liquid state and a third portion of the liquid precursor material is formed into gel. The expansion chamber is continuously drained as the flow of liquid precursor material is introduced into the expansion chamber. The chamber is heated to a temperature to produce a sufficient amount of the second portion of the liquid precursor material to flush the gel from the chamber.
摘要:
A method and device (3) for vaporizing a liquid reactant comprises a vaporizing plate (21) having a top surface (21a) defining a liquid flow channel, the channel being laterally delimited by edges (46) having a height greater than a minimum thickness of liquid reactant required to generate vapor under film or nucleate boiling regime; a heating system (51) associated to the vaporizing plate (21) for heating the liquid reactant over a minimum temperature required to generate vapor under nucleate or, preferably, film boiling regime; a cap (23) covering the vaporizing plate to collect the vapor at a predetermined pressure and provided with a vapor exit (24); and a liquid feeder (22) to feed the liquid reactant onto the vaporizing plate (21).
摘要:
A method and device (3) for vaporizing a liquid reactant comprises a vaporizing plate (21) having a top surface (21a) defining a liquid flow channel, the channel being laterally delimited by edges (46) having a height greater than a minimum thickness of liquid reactant required to generate vapor under film or nucleate boiling regime; a heating system (51) associated to the vaporizing plate (21) for heating the liquid reactant over a minimum temperature required to generate vapor under nucleate or, preferably, film boiling regime; a cap (23) covering the vaporizing plate to collect the vapor at a predetermined pressure and provided with a vapor exit (24); and a liquid feeder (22) to feed the liquid reactant onto the vaporizing plate (21).
摘要:
A system for delivering a liquid reactant (2) at high flow rates to an oxidation/flame hydrolysis glass soot deposition site (10). A first liquid only reactant (2) is delivered (7,4) to a vaporization chamber (1) to form a thin film and mixed with oxygen (20) after vaporization. Additional vaporized reactants (30) are thereafter mixed (11) with the vaporized first liquid (1) prior to delivery to an oxidation/flame hydrolysis burner (10) to form a glass soot outer cladding layer on a soot preform. The soot preform is subsequently fused to form a high quality glass blank for drawing into optical fiber.