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公开(公告)号：EP4158674B1
公开(公告)日：2024-07-24
申请号：EP21722823.8
申请日：2021-04-29
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公开(公告)号：EP4411782A2
公开(公告)日：2024-08-07
申请号：EP24182655.1
申请日：2021-04-29
发明人： Zeidler, Dirk , Bihr, Ulrich , Adolf, Andreas , Kaufmann, Nicolas , Müller, Ingo , Behnke, Michael
IPC分类号： H01J37/20
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/2028520130101 , H01J2237/2029220130101 , H01J2237/248720130101 , H01J37/20 , H01J2237/3176720130101
摘要： A multi-beam charged-particle beam system comprising: a movable stage configured to hold a sample; an object irradiation unit configured to illuminate a surface of the sample with a plurality of focus spots of a plurality of primary charge particle beamlets; a charged particle beam generator, configured for generating a plurality of primary charged-particle beamlets from a charged-particle source; a stage sensor configured for determining a lateral displacement or a rotation of the stage; an image sensor configured for determining a lateral displacement of a line of sight of the object irradiation unit; and a control unit configured for generating and applying at least an additional voltage signal to a first beam deflector in the object irradiation unit configured for generating during use an additional displacement or rotation of the plurality of primary charged particle beamlets for at least partly compensating the difference between a lateral displacement of the line of sight and the lateral displacement or rotation of the stage.
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