摘要:
A photosensitive photoresist material which is effective for use as an ion etch barrier layer after patterning. The photoresist composition includes the reaction product of a compound having the general formula R 1 -COO-(CH 2 ) n -O-R 2 and a silylating agent.
摘要:
A photoimageable composition of the negative acting type which includes a binder polymer which contains carboxyl groups is provided with a metal chelate in which the coordination number of the metal is 2 or higher. When the photoimageable composition is coated as a layer on a dry film, the metal chelate reacts with the carboxyl groups of the polymer, releasing a metal ion which bridges carboxyl groups of two or more polymer molecules. This bridging reduces cold flow of the photoimageable composition layer of the dry film.
摘要:
An electron beam recording film comprising a support bearing, in order, (A) a sputtered layer of indium-tin oxide, and (B) a gelatino silver halide emulsion layer, e.g. silver iodobromide, crosslinked with 2 to 10% by weight based on the weight of gelatin in the emulsion layer of a Cr⁺³-containing compound, e.g. chrome alum or chromic chloride. Optional other layers can be present in the film, e.g. a crosslinked gelatin overcoat, a subbing layer on the support or a titanium oxide layer on the indium-tin oxide layer.
摘要:
Silver halide photographic elements comprising a support on which there is spread a plurality of photosensitive layers of gelatin incorporating silver halides and containing coupling agents, and further being associated with auxiliary gelatin layers tend to suffer from brittleness. An improved element comprises, spread over said support and under said plurality of photosensitive layers, a layer of gelatin in which there is dispersed a fragility reducing quantity of droplets of a water-immiscible high boiling organic solvent, and an adhesion promoting quantity of a vinyl addition polymer latex.
摘要:
A silver halide light-sensitive material comprises a support, a hardening layer and a light-sensitive layer in order. The light-sensitive layer contains silver halide and a hydrophilic polymer. The hardening layer or the light-sensitive layer contains a reducing agent. The hardening layer contains a mixture of a polymer (A) and a polymer (B). The mixture contains the polymer (A) in an amount of 5 to 70 wt.% and the polymer (B) in an amount of 30 to 95 wt.%. The polymer (A) comprises repeating units of (A1) in an amount of not less than 95 mol %. The polymer (B) comprises repeating units of (B1) in an amount of 10 to 90 mol % and repeating units of (B2) in an amount of 10 to 90 mol %.
摘要:
A photosensitive photoresist material which is effective for use as an ion etch barrier layer after patterning. The photoresist composition includes the reaction product of a compound having the general formula R 1 -COO-(CH 2 ) n -O-R 2 and a silylating agent.
摘要:
Photographic elements having at least one light-sensitive layer and at least one layer having polymeric matte particles surrounded by a layer of colloidal organic particles.
摘要:
Durch Photopolymerisation vernetzbares, in wäßrigen Medien lösliches oder dispergierbares Gemisch auf der Grundlage von Hydroxyl- und/oder Amidgruppen enthaltenden Polymerisaten als Bindemittel, hiermit verträglichen photopolymerisierbaren Monomeren und Initiatoren der Photopolymerisation, welches, bezogen auf seine Gasamtmenge, 0,1 bis 10 Gew.% eines Aldehyds der allgemeinen Formel I enthält, R- -CHO (I) worin R ein Wasserstoffatom, eine Hydroxylgruppe oder einen C₁-C₆-Alkyl-, C₁-C₆-Alkoxi-, C₆-C₁₀-Aryl- oder einen C₆-C₁₀-Aryloxirest bedeutet, sowie mehrschichtige, mit wäßrigen Medien entwickelbare, lichtempfindliche Aufzeichnungsmaterialien, welche mindestens eine Schicht aus einem solchen Gemisch enthalten.
摘要:
Durch Photopolymerisation vernetzbares, in wäßrigen Medien lösliches oder dispergierbares Gemisch auf der Grundlage von Hydroxyl- und/oder Amidgruppen enthaltenden Polymerisaten als Bindemittel, hiermit verträglichen photopolymerisierbaren Monomeren und Initiatoren der Photopolymerisation, welches, bezogen auf seine Gasamtmenge, 0,1 bis 10 Gew.% eines Aldehyds der allgemeinen Formel I enthält,
R- -CHO (I) worin R ein Wasserstoffatom, eine Hydroxylgruppe oder einen C₁-C₆-Alkyl-, C₁-C₆-Alkoxi-, C₆-C₁₀-Aryl- oder einen C₆-C₁₀-Aryloxirest bedeutet, sowie mehrschichtige, mit wäßrigen Medien entwickelbare, lichtempfindliche Aufzeichnungsmaterialien, welche mindestens eine Schicht aus einem solchen Gemisch enthalten.