公开(公告)号：EP0146223A3

公开(公告)日：1986-02-12

申请号：EP84306912

申请日：1984-10-10

申请人： AMPEX CORPORATION

发明人： Rea, William V.

IPC分类号： C23F03/00 ,  C09K03/14

CPC分类号： C23F3/00

摘要： Metal surfaces such as the working surfaces of nickel plated blanks for rigid memory discs are polished in a two- stage process of rough and finish polishing by a combination of mechanial and chemical mechanisms. Each stage involves a plurality of cycles in which the surface is polished using a rotating polishing pad with an aqueous suspension of aluminum oxide containing a lubricant-surfactant and a chlorine-containing oxidizing agent present at the surface- pad interface followed by the addition of an aqueous colloidal aluminum oxide sol to the oxidizing agent-containing suspension at the interface which frees the chlorine in the oxidizing agent to exert a chemical polishing action on the surface.

摘要翻译： 诸如用于刚性记忆盘的镀镍毛坯的工作表面的金属表面通过机械和化学机制的组合进行粗磨和精抛光的两阶段抛光。 每个阶段涉及多个循环，其中使用旋转的抛光垫用含有润滑剂 - 表面活性剂的氧化铝和存在于表面 - 焊盘界面的含氯氧化剂的水性悬浮液来抛光表面，随后加入 水性胶体氧化铝溶胶在界面处的含氧化剂的悬浮液，其释放氧化剂中的氯以在表面上发挥化学抛光作用。