公开(公告)号：EP4491990A1

公开(公告)日：2025-01-15

申请号：EP23803843.4

申请日：2023-05-10

Applicant: LG Chem, Ltd.

Inventor： YOON, Jong Seol ,  RYOO, Chang Seok ,  NHO, Jun Seok

IPC: F27B7/42 ,  F27B7/32 ,  F27B7/33 ,  F27B7/22 ,  G01K1/14 ,  F27B7/08 ,  F27D21/00 ,  F27D19/00

Abstract: A rotary kiln according to the present invention includes: a tube assembly provided with a rotating tube configured to rotate and heat raw material powder while rotating in a horizontally disposed state; and a temperature measuring part provided in the rotating tube, wherein the temperature measuring part includes: a first temperature sensor; a first fixing member configured to fix the first temperature sensor to the rotating tube; and an insulator provided between the first fixing member and the rotating tube to block heat of the rotating tube from being conducted to the first temperature sensor.

公开(公告)号：EP4479361A1

公开(公告)日：2024-12-25

申请号：EP23709028.7

申请日：2023-02-14

Applicant: QuantumScape Battery, Inc.

Inventor： HOLME, Timothy ,  WINTERKORN, Martin ,  TOZIER, Dylan ,  RAMASWAMY, Murugan

IPC: C04B35/486 ,  C04B35/488 ,  C04B35/622 ,  C04B35/626 ,  C04B35/64 ,  C04B35/645 ,  C04B35/65 ,  F27B5/18 ,  F27B9/40 ,  F27B17/00 ,  F27D19/00 ,  F27D21/00 ,  H01M10/0562 ,  H01M50/434

公开(公告)号：EP4421446A3

公开(公告)日：2024-11-27

申请号：EP23210762.3

申请日：2020-06-04

Applicant: Process Metrix, LLC

Inventor： Bonin, Michel

IPC: G01B11/24 ,  F27D21/00 ,  F27D21/02 ,  G01B11/02 ,  G01B11/06 ,  G01B11/30

Abstract: A scanner assembly (10) is configured to be mounted on a scanner manipulator arm (82), to be placed in proximity to an opening in a vessel or inserted into an opening in a vessel, and to measure distances from a scanner emitter/sensor (40) within the scanner assembly (10) to a plurality of points on the surface of the refractory lining to characterize the concave interior of the vessel in a single scan. A scanner manipulator having a manipulator arm attached to the scanner assembly maintains the scanner assembly in measurement positions. A control system controls the position of the scanner assembly, the orientation of the emitter sensor, and the acquisition, storage, processing and presentation of measurements produced by the emitter/sensor. The field of view obtained from the scanner assembly (10) in a single scan exceeds a hemisphere.

公开(公告)号：EP4437302A1

公开(公告)日：2024-10-02

申请号：EP22822078.6

申请日：2022-11-24

Applicant: Paul Wurth S.A.

Inventor： LODI, Giorgio Federico

IPC: G01B5/00 ,  G01B17/02 ,  C21B7/10 ,  F27B3/24 ,  G01N29/07 ,  F27D21/00 ,  G01N29/22 ,  G01N29/265

CPC classification number: G01B17/02 ,  G01B5/0002 ,  C21B7/10 ,  F27D2009/001320130101 ,  F27B3/24 ,  F27D21/0021 ,  C21B7/24

公开(公告)号：EP4390284A1

公开(公告)日：2024-06-26

申请号：EP22216049.1

申请日：2022-12-22

Applicant: Primetals Technologies Austria GmbH

Inventor： Fischer, Paul ,  Weineis, Florian

IPC: F27B1/26 ,  F27B1/28 ,  F27B3/28 ,  F27B14/20 ,  F27D21/00 ,  B08B15/00 ,  F27D19/00 ,  F27D21/02

CPC classification number: B08B15/002 ,  F27D19/00 ,  F27D2019/000620130101 ,  F27D2021/02620130101 ,  F27D21/00 ,  F27B1/26 ,  F27B1/28 ,  F27B14/20 ,  F27B3/28 ,  F27D2019/001520130101

Abstract: Die vorliegende Erfindung betrifft das Gebiet von Absaug- oder Entstaubungsanlagen von metallurgischen Industrieanlagen.
Die Aufgabe der Erfindung ist es ein Verfahren zur Verfügung zu stellen welches sehr rasch auf auftretendes ausschwallendes Rauchgas reagiert, um ausschwallendes Rauchgas zu vermeiden.
Die Aufgabe wird dadurch gelöst, dass die Ausschwallsteuerung (5) das vom Kamerasystem (8) erkannte ausschwallende Rauchgas (15) in seiner Menge bestimmt und eine zusätzlich erforderliche Ausschwall - Absaugmenge ermittelt, wobei die zusätzlich erforderliche Ausschwall - Absaugmenge herangezogen wird um aus einem aktuellen Arbeitspunkt der Absaugeinrichtung einen neuen Arbeitspunkt der Absaugeinrichtung einzustellen, wobei die Ausschwallsteuerung (5) den neue Arbeitspunkt direkt der Absaugeinrichtung (9) übermittelt und die Steuerung der Absaugeinreichung (9) ab der Übermittlung ausschließlich von der Ausschwallsteuerung (5) übernommen wird bis ein vorgegebenes Übergabeevent den Zeitpunkt definiert bei welchem wieder ausschließlich die Absaugsteuerung (6) und / oder Absaugregelung zur Steuerung und / oder Regelung der Absaugeinrichtung (9) verwendet wird.

公开(公告)号：EP3870922B1

公开(公告)日：2024-06-26

申请号：EP18811063.9

申请日：2018-10-22

IPC: F27D21/00 ,  C21B7/06 ,  G01B21/08 ,  F27B1/28 ,  C21B9/06 ,  C21C5/44

CPC classification number: F27B1/28 ,  F27D21/00 ,  F27D21/0021 ,  G01B21/085 ,  C21B7/06 ,  C21B9/06 ,  C21B2300/0420130101 ,  C21C5/44

公开(公告)号：EP4384764A1

公开(公告)日：2024-06-19

申请号：EP22809667.3

申请日：2022-10-21

Applicant: Innomotics GmbH

Inventor： MERK, Stephan ,  YEE, Dianna ,  RANGAPURA SHETTAPPA, Chandrashekara ,  ZENG, Yun

IPC: F27B7/42 ,  C04B7/36 ,  F27D19/00 ,  F27D21/00 ,  G06N3/08

CPC classification number: F27B7/42 ,  F27D19/00 ,  F27D21/00 ,  C04B7/361 ,  G06N3/09 ,  G06N3/0464 ,  G06N3/0985

公开(公告)号：EP4001441B1

公开(公告)日：2024-05-01

申请号：EP21217379.3

申请日：2018-11-12

IPC: C21B7/10 ,  F27D21/00 ,  C21B7/24 ,  F27B3/24 ,  F27B1/28 ,  F27D9/00 ,  G01B7/06

CPC classification number: C21B7/103 ,  F27B3/24 ,  F27D9/00 ,  F27D21/0021 ,  F27D2009/000220130101 ,  F27D2009/001320130101 ,  F27D2009/002420130101 ,  F27D2009/003220130101 ,  F27D2009/004820130101 ,  F27B1/28 ,  C21B7/24 ,  G01B7/10

公开(公告)号：EP4350018A1

公开(公告)日：2024-04-10

申请号：EP22200017.6

申请日：2022-10-06

Applicant: Belenos Clean Power Holding AG

Inventor： PFENNINGER, Reto ,  KRAVCHYK, Kostiantyn ,  DUBEY, Romain Jean-Christophe ,  KOVALENKO, Maksym

IPC: C22B1/16 ,  C22B1/20 ,  F27B17/00 ,  F27D1/00 ,  F27D11/00 ,  F27D11/04 ,  F27D21/00 ,  F27D21/02 ,  F27D99/00

Abstract: The present invention relates to a sintering apparatus comprising a first and a second carbon-comprising thermally conductive substrate arranged at a distance from each other, thereby providing a space for receiving a substrate to be sintered, and provided between a third and a fourth thermally conductive substrate; and heating means for heating the third and/or the fourth thermally conductive substrate at a heating rate of at least 50 °C/s to a temperature between 750 °C and 1400 °C, thereby heating the first and/or the second thermally conductive substrate, respectively, wherein the third and the fourth thermally conductive substrate comprise, independently from one another, one or more metal nitride and/or metal oxide.

公开(公告)号：EP4343250A1

公开(公告)日：2024-03-27

申请号：EP22196718.5

申请日：2022-09-20

Applicant: Datapaq Limited

Inventor： GRIFFITHS, Stewardt

IPC: F27D7/06 ,  F27D21/00 ,  F27B5/04 ,  F27B5/18

Abstract: There is provided a measurement apparatus for a vacuum furnace, comprising a data acquisition device, comprising a sensor interface operable to electrically couple one or more sensors to the data acquisition device, and a thermally conductive layer disposed on a first surface of the data acquisition device and to provide a thermally conductive interface between the first surface of the data acquisition device and a cooled internal surface of the vacuum furnace.