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    COSMETIC BASE AND COSMETIC COMPRISING PHOSPHORYLCHOLINE-LIKE GROUP-CONTAINING COMPOUND
    7.
    发明公开
    COSMETIC BASE AND COSMETIC COMPRISING PHOSPHORYLCHOLINE-LIKE GROUP-CONTAINING COMPOUND 审中-公开

    公开(公告)号：EP4316458A1

    公开(公告)日：2024-02-07

    申请号：EP22780119.8

    申请日：2022-03-16

    申请人： NOF Corporation

    发明人： HARA, Yusuke ,  SEKIGUCHI, Koji ,  SASAKI, Katsuyuki ,  KOIE, Nobuyoshi

    IPC分类号： A61K8/55 ,  A61Q1/00

    摘要： A cosmetic base according to the present invention contains a phosphorylcholine-like group-containing compound represented by Formula (1):

    in which each of R 1 and R 2 indicates a hydrocarbon group having 12 to 22 carbon atoms independently and R 3 indicates CH 3 or (CH 2 CH 2 O) n -H, in which n is an integer of 1 to 30, and either one of R 1 and R 2 is an unsaturated hydrocarbon group having 18 carbon atoms.
    According to the present invention, a novel compound having a phosphorylcholine-like group in its molecule and a cosmetic containing the compound can be provided, the compound being excellent in solubility in oily components and, when blended with cosmetics, retaining emulsion stability at high temperature, providing a crush-feeling of oil drops during applying, and also having a favorable feeling without stiff film-feeling.