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公开(公告)号:EP4416101A1
公开(公告)日:2024-08-21
申请号:EP22754780.9
申请日:2022-08-03
发明人: DRAGULIN, DAN
CPC分类号: C01B3/0026 , C01B3/0031 , C01B6/04 , C01B6/06 , C01B6/24 , Y02E60/32
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公开(公告)号:EP4132700B1
公开(公告)日:2024-07-03
申请号:EP21717823.5
申请日:2021-04-07
IPC分类号: B01J19/00 , B01J19/18 , B01J8/10 , B01J8/22 , B01J19/08 , B01J10/00 , B01J14/00 , B01J19/12 , B01D9/00
CPC分类号: B01J19/0066 , B01J19/18 , B01J2219/0077920130101 , B01J19/1812 , B01J8/10 , B01J8/222 , B01J19/08 , B01J10/007 , B01J14/005 , B01J19/085 , B01J19/123 , B01D9/00 , B01F23/2342 , B01F27/11252 , B01F27/1155 , B01F27/73 , B01F31/445 , B01F31/449
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公开(公告)号:EP4340984A2
公开(公告)日:2024-03-27
申请号:EP22805703.0
申请日:2022-05-17
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公开(公告)号:EP4308507A1
公开(公告)日:2024-01-24
申请号:EP22770118.2
申请日:2022-03-14
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公开(公告)号:EP3341112B1
公开(公告)日:2023-11-08
申请号:EP16840049.7
申请日:2016-08-24
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公开(公告)号:EP4252902A1
公开(公告)日:2023-10-04
申请号:EP21898330.2
申请日:2021-10-06
发明人: LEE, Deuk Yeon , LEE, Chang Young , LEE, Ja Eun , HAN, Yeon Bi
摘要: A powder treatment plasma device according to the present invention maximizes processing capacity for performing processing all at once, by stacking a plurality of flat and porous filter electrodes, and thus improves processing efficiency. In addition, since vibration is applied to the filter electrodes by using a vibration generator while causing powder to be adsorbed on surfaces of the filter electrodes by using an adsorption means, the powder can be evenly dispersed on the surfaces of the filter electrodes and mixed, and thus the powder can be evenly surface-treated.
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