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394 条记录 (耗时 0.016 秒)

    APPARATUS AND METHOD FOR MAINTAINING IMMERSION FLUID IN THE GAP UNDER THE PROJECTION LENS DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE
    1.
    发明公开
    APPARATUS AND METHOD FOR MAINTAINING IMMERSION FLUID IN THE GAP UNDER THE PROJECTION LENS DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE 审中-公开
    浸没式光刻机中晶片交换过程中投影透镜下间隙内浸润液的设备和方法

    公开(公告)号：EP3141953A3

    公开(公告)日：2017-06-07

    申请号：EP16186292.5

    申请日：2004-03-17

    申请人： Nikon Corporation

    发明人： Binnard, Michael

    IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/58 ,  G03F7/20 ,  G03B27/52

    CPC分类号： G03F7/70341 ,  G03B27/52 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70733

    摘要： An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed. The apparatus and method includes an optical assembly (16) configured to project an image onto a work piece (208) and a stage assembly (202) including a work piece table (204) configured to support the work piece (208) adjacent the optical assembly (16). An environmental system (26) is provided to supply and remove an immersion fluid (212) from a gap between the optical assembly (16) and the work piece (208) on the stage assembly (202). After exposure of the work piece (208) is complete, an exchange system (216) removes the work piece (208) and replaces it with a second work piece. An immersion fluid containment system (214) is provided to maintain the immersion liquid (212) in the gap during removal of the first work piece (208) and replacement with the second work piece.

    摘要翻译： 公开了一种用于在光刻机器（10）中更换工件（208）期间将浸没流体（212）保持在邻近投影透镜（16）的间隙中的装置和方法。 该设备和方法包括被配置成将图像投影到工件（208）上的光学组件（16）和包括工件台（204）的工作台组件（202），工件台（204）被配置为支撑与光学器件 组件（16）。 提供环境系统（26）以从台组件（202）上的光学组件（16）和工件（208）之间的间隙供应和移除浸没流体（212）。 在工件（208）的暴露完成之后，交换系统（216）移除工件（208）并用第二工件替换它。 提供浸没流体容纳系统（214）以在移除第一工件（208）和用第二工件替换期间将浸没液体（212）保持在间隙中。

    AN INTERFEROMETER SYSTEM FOR A SEMICONDUCTOR EXPOSURE SYSTEM
    7.
    发明公开
    AN INTERFEROMETER SYSTEM FOR A SEMICONDUCTOR EXPOSURE SYSTEM 审中-公开
    一种半导体曝光系统的干涉仪系统

    公开(公告)号：EP1446698A1

    公开(公告)日：2004-08-18

    申请号：EP02752756.3

    申请日：2002-08-07

    申请人： Nikon Corporation

    发明人： NOVAK, W. Thomas ,  STUMBO, David ,  INOUE, Fuyuhiko

    IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/54 ,  G03B27/32 ,  G03F9/00 ,  G03F5/00 ,  G01B11/02 ,  G01B11/00

    CPC分类号： G03F7/70775 ,  G01B9/02068 ,  G01B9/0207 ,  G01B9/02076

    摘要： An interferometer measuring system comprising two moveable members and a reference member that may have significantly less movement, the group having a number of attached measurement mirrors, interferometers for measuring position and two optical support blocks for the interferometers. The interferometers are used to determine the measured optical path lengths to each of the moveable members and reference member and these positions are used to calculate the misalignment, or error in the relative positions of the moveable members with respect to the reference member. This calculated error is then used to correct the misalignment by moving the appropriate members in the manner directed by the calculation.

    摘要翻译： 本发明涉及一种干涉仪测量系统，该干涉仪测量系统包括两个可移动构件（30,40）和基准构件（22），该基准构件可具有显着较少的移动，该组具有多个附接的测量镜（31,32,33,34） 42,43,44,45,46,47,48）和用于干涉仪的两个光学支撑块（50,60）。 使用干涉仪（41-48）来确定到每个可移动构件（30,40）和参考构件（22）的测量的光路长度，并且这些位置被用于计算不对准或相对位置误差 所述可移动构件（30,40）相对于所述基准构件（22）。 这个计算出来的误差然后被用来通过以计算指导的方式移动适当的成员来纠正错位。

    Exposure system for obtaining a sensitometric control patch with exposure gradient
    8.
    发明公开
    Exposure system for obtaining a sensitometric control patch with exposure gradient 审中-公开
    Belichtungssystem zur Erhaltung eines Sensitometrischen Testmusters mit Belichtungsgradienten

    公开(公告)号：EP1343045A1

    公开(公告)日：2003-09-10

    申请号：EP03356026.9

    申请日：2003-02-17

    申请人： EASTMAN KODAK COMPANY

    发明人： Prigent, Thierry, Kodak Industrie ,  Lemoine, Michel Marie-René C., Kodak Industrie

    IPC分类号： G03B27/52

    CPC分类号： G03B27/72 ,  G03B27/52

    摘要： The present invention is in the photographic field, and is used to measure the sensitometric characteristics of a photographic element (1), like for example a photographic film strip. The present invention relates more particularly to an exposure system (38) enabling the production of a sensitometric control patch with exposure gradient (10), (20), placed on a photographic element (1), and enabling the measurement of the sensitometric characteristics (40) of the photographic element (1).
    The exposure system (38) comprises a light energy source (31) servo connected to a management module of the exposure parameters (35). The exposure system (38) enables the production on the exposed film strip (1) of the unique sensitometric control patch (10), (20), so that this sensitometric control patch includes a gradient of exposure areas (12), (14), (16), (22), (24), (26) enabling all the sensitometric characteristics (40) of said photographic film to be obtained. The sensitometric control patch (10), (20) is produced from the nominal sensitometric characteristics (41) of the film (1), and the instantaneous speed of relative movement of said film in front of the light energy source (31).
    The present invention has its application in the photography field and in particular the motion picture field.

    摘要翻译： 本发明在照相领域中，并且用于测量照相材料（1）的感光特性，例如摄影胶片条。 本发明更具体地涉及一种曝光系统（38），该曝光系统能够产生具有放置在照相元件（1）上的曝光梯度（10），（20）的感光控制贴片，并且能够测量感光特性（ 40）的照相元件（1）。 曝光系统（38）包括连接到曝光参数（35）的管理模块的光能源（31）伺服。 曝光系统（38）使得能够在独特的感光控制贴片（10），（20）的曝光胶片条（1）上进行生产，使得该感光控制贴片包括曝光区域（12），（14）的梯度， ，（16），（22），（24），（26）可以获得所述照相胶片的所有感光特性（40）。 感光度控制贴片（10），（20）由膜（1）的标称感光特性（41）和光能源（31）前面的所述膜的相对运动的瞬时速度产生。 本发明将其应用于摄影领域，特别是电影领域。

    Photofinishing system and method for automated advanced services including image and associated audio data processing
    9.
    发明公开
    Photofinishing system and method for automated advanced services including image and associated audio data processing 审中-公开
    系统和方法，在相片实验室自动化的增值服务，如图像与相关联的声音数据的处理

    公开(公告)号：EP1315041A3

    公开(公告)日：2003-07-09

    申请号：EP02018562.5

    申请日：1999-02-15

    申请人： EASTMAN KODAK COMPANY

    发明人： Bell, Cynthia S. ,  Patton, David L. ,  Rowan, Stephen J. ,  Niskala, Wayne F. ,  Whitfield, Arthur A.

    IPC分类号： G03D15/00 ,  G03B27/46 ,  G03B31/06 ,  G03B27/52

    CPC分类号： G03D15/00

    摘要： A photofinishing system 20 for automatically processing image and associated image data pursuant to customer output requests. The system includes an order manager 22 operative to receive and control processing of the output requests and at least one source of image related data corresponding to the output request. An input interface 30 receives the image related data from the source and converts the data to a digital data stream E. A memory is included for storing the digital data stream E. The system further includes a data parser 36 disposed in communication with the memory to extract selected data streams according to the order manager 22 and to reduce the data into respective image files having respective groups of data fields. An output module 40 is responsive to the order manager 22 and is operative to produce a photofinished output organized with respect to the data fields.

    摘要翻译： 用于自动处理图像和相关联的图像数据输出根据客户请求相片洗印加工系统20。 该系统包括一个订单管理器22可操作以接收和输出请求的控制处理和图像有关的数据对应于输出请求中的至少一个源。 输入接口30接收从源图像相关的数据和将数据转换为数字数据流E.一种存储器包括用于存储数字数据流E.该系统包括数据解析器另外36设置在与所述存储器通信，以 提取选定的数据流gemäß到订单管理器22和将数据减少到具有数据字段的respectivement respectivement组的图像文件。 输出模块40响应于该命令管理器22和可操作以产生相对于所述数据字段组织了photofinished输出。