公开(公告)号：EP3764160B1

公开(公告)日：2024-10-23

申请号：EP19763403.3

申请日：2019-03-04

发明人： KAWASHIMA, Yuki ,  OZAKI, Shuhei ,  TACHIBANA, Masamitsu ,  WATANABE, Takeo ,  HARADA, Tetsuo

IPC分类号： G03F1/62 ,  G03F7/20 ,  C01B32/184 ,  C01B32/205 ,  G03F1/64

公开(公告)号：EP3221748B1

公开(公告)日：2024-01-03

申请号：EP15794923.1

申请日：2015-11-16

发明人： VAN DER MEULEN, Frits ,  JANSEN, Maarten Mathijs Marinus ,  AZEREDO LIMA, Jorge Manuel ,  BROUNS, Derk Servatius Gertruda ,  BRUIJN, Marc ,  DEKKERS, Jeroen ,  JANSSEN, Paul ,  KRAMER, Ronald Harm Gunther ,  KRUIZINGA, Matthias ,  LANSBERGEN, Robert Gabriël Maria ,  LEENDERS, Martinus Hendrikus Antonius ,  LOOPSTRA, Erik Roelof ,  VAN DEN BOSCH, Gerrit ,  VAN LOO, Jérôme François Sylvain Virgile ,  VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien ,  DE KLERK, Angelo Cesar Peter ,  DINGS, Jacobus Maria ,  JANSSEN, Maurice Leonardus Johannes ,  KERSTENS, Roland Jacobus Johannes ,  KESTERS, Martinus Jozef Maria ,  LOOS, Michel ,  MIDDEL, Geert ,  REIJNDERS, Silvester Matheus ,  THEUERZEIT, Frank Johannes Christiaan ,  VAN LIEVENOOGEN, Anne Johannes Wilhelmus

IPC分类号： G03F1/62 ,  G03F7/20 ,  G03F1/00 ,  G03F1/64

公开(公告)号：EP3644121B1

公开(公告)日：2023-11-29

申请号：EP19203986.5

申请日：2019-10-18

发明人： HAMADA, Yuichi

IPC分类号： G03F1/64 ,  G03F1/62 ,  G03F1/82 ,  G03F7/20

公开(公告)号：EP4152094A1

公开(公告)日：2023-03-22

申请号：EP21805081.3

申请日：2021-05-12

申请人： SHIN-ETSU CHEMICAL CO., LTD.

发明人： YANASE, Yu

IPC分类号： G03F1/64

摘要： The present invention provides: a pellicle frame for EUV exposure characterized in that the pellicle frame is provided with at least one ventilation part, and a filter having a porous membrane coated with a resin is attached inside the ventilation part; a pellicle characterized in that a pellicle film is stretched on the pellicle frame; a pellicle-attached exposure original plate for EUV exposure characterized in that the pellicle is attached to the exposure original plate; a method for manufacturing a semiconductor; a method for manufacturing a liquid crystal display plate; and an exposure method. The pellicle frame of the present invention is sufficiently resistant to hydrogen radicals during EUV exposure.

公开(公告)号：EP2927746B1

公开(公告)日：2021-09-08

申请号：EP15156223.8

申请日：2015-02-24

发明人： Horikoshi, Jun

IPC分类号： G03F1/62 ,  G03F1/00 ,  G03F1/22 ,  G03F1/64 ,  G03F7/20

公开(公告)号：EP3845934A1

公开(公告)日：2021-07-07

申请号：EP19853661.7

申请日：2019-08-23

申请人： Nippon Light Metal Co., Ltd.

发明人： IIZUKA Akira ,  OSHIMA, Takeshi ,  NAKANO, Koichi

IPC分类号： G02B5/00 ,  G03F1/64

摘要： The present invention provides a lightweight optical member that can be produced at a relatively low cost, wherein distortion due to temperature rise is suppressed, and the appearance color is sufficiently blackened or darkened, and a method for efficiently producing the optical member. The optical member of the present invention comprises: a base member made of titanium or a titanium alloy, and a carbon-doped titanium oxide layer formed on the surface of the base member. The carbon content in the carbon-doped titanium oxide layer is preferably 0.1 to 15 at%.

公开(公告)号：EP3818413A1

公开(公告)日：2021-05-12

申请号：EP19727038.2

申请日：2019-06-03

申请人： ASML Netherlands B.V.

发明人： PETERS, Martin, Dieter, Nico ,  DE FOLTER, Marcellus, Antonius

IPC分类号： G03F1/62 ,  B25J15/02 ,  B65G47/86 ,  G03F1/64 ,  G03F1/68 ,  G03F7/20

公开(公告)号：EP2267527B1

公开(公告)日：2021-05-12

申请号：EP10166975.2

申请日：2010-06-23

发明人： Shirasaki, Toru ,  Mushell, David ,  Chakravorty, Kishore ,  Ng, Grace

IPC分类号： G03F1/64

公开(公告)号：EP3779594A1

公开(公告)日：2021-02-17

申请号：EP19776729.6

申请日：2019-03-15

申请人： Mitsui Chemicals, Inc.

发明人： ISHIKAWA, Akira ,  OKUBO, Atsushi ,  ONO, Yosuke ,  KOHMURA Kazuo

IPC分类号： G03F1/64 ,  G03F7/20

摘要： Provided is a supporting frame in which a vent hole detachably arranging a filter and to which a pellicle film for extreme ultraviolet lithography can be attached. A support frame according to an embodiment of the present invention is a support frame for arranging a pellicle film, the support frame has a through hole being made from a hole extending along a first direction, the first direction being almost parallel to a surface direction of the pellicle film, and a hole extending along a second direction, the second direction not being parallel to the first direction; and the support frame includes a filter, the filter arranged at an inside of the through hole or at an end of the through hole, and the filter is arranged apart from the pellicle film.

公开(公告)号：EP3764161A1

公开(公告)日：2021-01-13

申请号：EP19764632.6

申请日：2019-03-01

申请人： Mitsui Chemicals, Inc.

发明人： ONO, Yosuke ,  KOHMURA, Kazuo ,  OKUBO, Atsushi ,  TANEICHI, Daiki ,  ISHIKAWA, Hisako ,  BIYAJIMA, Tsuneaki

IPC分类号： G03F1/64 ,  G03F1/22 ,  G03F1/62 ,  G03F7/20

摘要： To provide a pellicle in which outgas from an adhesive layer is suppressed. The pellicle (100) comprises a pellicle film (101), a support frame (103) for supporting the pellicle film, a protrusion part (105) arranged in the support frame, a first adhesive layer (107) arranged on the protrusion part; and an inorganic material layer arranged at a position closer to the pellicle film than the first adhesive layer. The inorganic material layer may include a first inorganic material layer (109) arranged at a first side surface (121) of the first adhesive layer, the first side surface of the first adhesive layer intersecting the pellicle film, and arranged at a position closer to the pellicle film.