Electron beam lithography apparatus and device manufacturing method
    3.
    发明专利
    Electron beam lithography apparatus and device manufacturing method 审中-公开
    电子束光刻设备和器件制造方法

    公开(公告)号:JP2012238624A

    公开(公告)日:2012-12-06

    申请号:JP2011104740

    申请日:2011-05-09

    Inventor: ITO JUN

    Abstract: PROBLEM TO BE SOLVED: To provide a technology which is advantageous for shortening the time required for replacing an electrode of an electron gun.SOLUTION: An electron beam lithography apparatus for drawing a pattern on a substrate by electron beams emitted from an electron gun includes: an adjustment chamber for adjusting a standby electrode constituting the electron gun as a standby of an electrode; and a drive mechanism in which the used electrode is detached from the electron gun and the standby electrode adjusted in the adjustment chamber is incorporated into the electron gun. The supply of electric power to the standby electrode is included in adjustment of the standby electrode.

    Abstract translation: 要解决的问题:提供一种有利于缩短更换电子枪电极所需的时间的技术。 解决方案:一种用于通过从电子枪发射的电子束在衬底上绘制图案的电子束光刻设备包括:用于调节构成电子枪的备用电极作为电极的待机的调节室; 以及驱动机构,其中使用的电极与电子枪分离,并且在调节室中调节的待机电极被并入到电子枪中。 备用电极的电力供给包括在备用电极的调整中。 版权所有(C)2013,JPO&INPIT

Patent Agency Ranking