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    Electron gun
    3.
    发明专利
    Electron gun 有权
    电子枪

    公开(公告)号：JP2003346671A

    公开(公告)日：2003-12-05

    申请号：JP2002152592

    申请日：2002-05-27

    Applicant: Nec Micro Hakan Kk ,  エヌイーシーマイクロ波管株式会社

    Inventor： CHIBA TORU

    IPC: H01J3/02 ,  H01J3/38 ,  H01J23/06

    CPC classification number: H01J3/027 ,  H01J3/028 ,  H01J3/38 ,  H01J23/06

    Abstract: PROBLEM TO BE SOLVED: To provide a pierced electron gun which is made easy to assemble by reducing the number of parts while suppressing increase of consumed power and increase of perveance in a heater. SOLUTION: The electron gun equipped with a Wehnelt electrode for focusing an electron beam has a structure having a negative electrode emitting electrons, a heater cap having a built-in heater giving the negative electrode thermal energy for emitting the electrons, a retainer for fitting a peripheral edge of the negative electrode to the heater cap to provide and fix the negative electrode on to the heater cap, a Wehnelt electrode part formed in a shape that a mean angle of the surface conforms to a piercing angle, and a Wehnelt support, in which at least 3 heater cap supporting members for supporting and fixing the heater cap in such a manner that an electron emitting surface of the negative electrode and an opening provided in the Wehnelt electrode part are located at positions satisfying a prescribed perveance have been integrally formed. COPYRIGHT: (C)2004,JPO

    Abstract translation: 要解决的问题：提供一种穿孔电子枪，其通过减少部件数量而容易组装，同时抑制消耗功率的增加和加热器中的增加。 解决方案：配备有用于聚焦电子束的Wehnelt电极的电子枪具有具有发射电子的负极的结构，具有内置加热器的加热器盖，其给出用于发射电子的负极热能，保持器 用于将负极的周边边缘装配到加热器盖上，以将负极提供并固定到加热器盖上，形成为表面平均角度符合穿透角的形状的Wehnelt电极部分和Wehnelt 支撑件，其中至少3个用于支撑和固定加热器帽的加热器盖支撑构件，使得负极的电子发射表面和设置在Wehnelt电极部分中的开口位于满足规定尺寸的位置 整体形成。 版权所有（C）2004，JPO

    Electron beam lithography apparatus and device manufacturing method
    4.
    发明专利
    Electron beam lithography apparatus and device manufacturing method 审中-公开
    电子束光刻设备和器件制造方法

    公开(公告)号：JP2012238624A

    公开(公告)日：2012-12-06

    申请号：JP2011104740

    申请日：2011-05-09

    Applicant: Canon Inc ,  キヤノン株式会社

    Inventor： ITO JUN

    IPC: H01L21/027 ,  H01J37/067 ,  H01J37/305

    CPC classification number: H01J3/06 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/028 ,  H01J37/067 ,  H01J37/3174 ,  H01J2237/0206 ,  H01J2237/022

    Abstract: PROBLEM TO BE SOLVED: To provide a technology which is advantageous for shortening the time required for replacing an electrode of an electron gun.SOLUTION: An electron beam lithography apparatus for drawing a pattern on a substrate by electron beams emitted from an electron gun includes: an adjustment chamber for adjusting a standby electrode constituting the electron gun as a standby of an electrode; and a drive mechanism in which the used electrode is detached from the electron gun and the standby electrode adjusted in the adjustment chamber is incorporated into the electron gun. The supply of electric power to the standby electrode is included in adjustment of the standby electrode.

    Abstract translation: 要解决的问题：提供一种有利于缩短更换电子枪电极所需的时间的技术。 解决方案：一种用于通过从电子枪发射的电子束在衬底上绘制图案的电子束光刻设备包括：用于调节构成电子枪的备用电极作为电极的待机的调节室; 以及驱动机构，其中使用的电极与电子枪分离，并且在调节室中调节的待机电极被并入到电子枪中。 备用电极的电力供给包括在备用电极的调整中。 版权所有（C）2013，JPO＆INPIT

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