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    Charged particle beam lens
    1.
    发明专利
    Charged particle beam lens 审中-公开
    充电颗粒光束镜头

    公开(公告)号：JP2013239314A

    公开(公告)日：2013-11-28

    申请号：JP2012111035

    申请日：2012-05-14

    Applicant: Canon Inc ,  キヤノン株式会社

    Inventor： SHIOZAWA TAKASHI

    IPC: H01J37/12 ,  H01L21/027

    CPC classification number: H01J37/10 ,  H01J3/18 ,  H01J37/12 ,  H01J2237/038 ,  H01J2237/31774

    Abstract: PROBLEM TO BE SOLVED: To provide a charged particle beam lens capable of suppressing electric field concentration caused by increase in resistance and connection failures at an interface between an anode and cathode and a high-resistance film or an interface between a conductive film and the high-resistance film, and of suppressing generation of discharge.SOLUTION: A charged particle beam lens comprises a plate-like anode 1, a plate-like cathode 2, and an insulator 3 arranged between the anode 1 and the cathode 2. The insulator 3, the anode 1, and the cathode 2 have a beam passing part 5 through which a charged beam passes. A high-resistance film 4 is formed on an inner lateral face forming the beam passing part 5 of the insulator 3 or on the outermost surface of the insulator 3. The anode 1 and the cathode 2 are electrically connected via the high-resistance film 4. The anode 1 and the high-resistance film 4, and the cathode 2 and the high-resistance film 4 respectively contain the same metal or semiconductor element, and have different resistance values.

    Abstract translation: 要解决的问题：提供一种能够抑制由阳极和阴极与高电阻膜之间的界面处的电阻和连接故障增加引起的电场浓度或导电膜与高电极之间的界面的带电粒子束透镜 电阻膜，并抑制放电的产生。解决方案：带电粒子束透镜包括板状阳极1，板状阴极2和布置在阳极1和阴极2之间的绝缘体3.绝缘体3 阳极1和阴极2具有光束通过部分5，带电束通过该光束通过部分5。 在形成绝缘体3的光束通过部分5的内侧面或绝缘体3的最外表面上形成高电阻膜4.阳极1和阴极2通过高电阻膜4电连接 阳极1和高电阻膜4以及阴极2和高电阻膜4分别含有相同的金属或半导体元件，并具有不同的电阻值。

    Electrostatic lens array, multiple charged particle optical system and focus adjusting method
    3.
    发明专利
    Electrostatic lens array, multiple charged particle optical system and focus adjusting method 审中-公开
    静电透镜阵列，多重充电颗粒光学系统和焦点调整方法

    公开(公告)号：JP2014007013A

    公开(公告)日：2014-01-16

    申请号：JP2012140610

    申请日：2012-06-22

    Applicant: Canon Inc ,  キヤノン株式会社

    Inventor： OHASHI YASUO

    IPC: H01J37/12

    CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/027 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/1205 ,  H01J2237/28

    Abstract: PROBLEM TO BE SOLVED: To provide an electrostatic lens array whose focus can be easily adjusted as a whole even when electrodes constituting the electrostatic lens array are dispersed in thickness.SOLUTION: An electrostatic lens array has plural electrode substrates arranged to be spaced from one another, each of the electrode substrates having plural openings through which a charged particle beam passes. The electrostatic lens array is configured to be adjustable in parallelism so that an outer peripheral profile line formed by any face other than the upper face of the electrode substrate of the uppermost face and the lower face of the electrode substrate of the lowermost face out of the plural electrode substrates has a portion which protrudes with respect to the outer peripheral profile line of the upper face of the electrode substrate of the uppermost face or the lower face of the electrode substrate of the lowermost face when viewed from a direction substantially vertical to the surfaces of the plural electrodes, and the face having the protruding portion is made parallel to a substrate face irradiated with a charged particle beam passing from the opening of the uppermost face of the electrode substrate of the electrostatic lens array through the opening of the lowermost face of the electrode substrate of the electrostatic lens array by regulating the position of the protruding portion with a position regulating member.

    Abstract translation: 要解决的问题：提供一种静电透镜阵列，其即使在构成静电透镜阵列的电极的厚度分散的情况下也可以整体上调整焦点。解决方案：静电透镜阵列具有彼此间隔开的多个电极基板 每个电极基板具有带电粒子束通过的多个开口。 静电透镜阵列被构造成可并联调节，使得由除了最上面的电极基板的上表面和最下面的电极基板的下表面之外的任何面形成的外周轮廓线不在 多个电极基板具有从基本上垂直于表面的方向观察时相对于最下面的电极基板的电极基板的上表面的外周轮廓线或电极基板的下表面突出的部分 并且具有突出部分的面平行于照射了从静电透镜阵列的电极基板的最上表面的开口穿过的带电粒子束的基板面，通过开口的最下面的开口 静电透镜阵列的电极基板通过调节突出孔的位置 与位置调节构件。

    Electrode of charged particle beam electrostatic lens and manufacturing method of the same, charged particle beam electrostatic lens, and charged particle beam exposure device
    5.
    发明专利
    Electrode of charged particle beam electrostatic lens and manufacturing method of the same, charged particle beam electrostatic lens, and charged particle beam exposure device 审中-公开
    充电颗粒光束静电透镜的电极及其制造方法，充电颗粒光束静电透镜和充电颗粒光束曝光装置

    公开(公告)号：JP2013239667A

    公开(公告)日：2013-11-28

    申请号：JP2012113097

    申请日：2012-05-17

    Applicant: Canon Inc ,  キヤノン株式会社

    Inventor： YAMADA NOBUTSUGU

    IPC: H01L21/027 ,  H01J9/14 ,  H01J37/305

    CPC classification number: H01J1/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J1/46 ,  H01J3/027 ,  H01J3/18 ,  H01J9/02 ,  H01J9/14 ,  H01J37/12 ,  H01J37/317 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/1205

    Abstract: PROBLEM TO BE SOLVED: To provide a charged particle beam electrostatic lens and the like which can exclude notching by a dry etching to be accurately processed.SOLUTION: An electrode of a charged particle beam electrostatic lens is an electrode with a laminated structure formed by laminating a plurality of conductive substrates. The electrode with the laminated structure at least comprises: a first conductive substrate 12 including a first through hole; and a second conductive substrate 11 including a second through hole. The first conductive substrate uses a conductive substrate which is thinner than the second conductive substrate, and includes the first through hole of which diameter is smaller than that of the second through hole. The second conductive substrate uses a conductive substrate which is lower in resistivity and thicker than the first conductive substrate, and the hole arranged on the conductive substrate, of which diameter is larger than the first through hole, is filled with plating and then the conductive substrate is thinned, thereby realizing the second through hole of which diameter is larger than the first through hole. The first through hole and the second through hole are positioned to laminate the first and second conductive substrates, and therefore the electrode 10 is formed with the laminated structure.

    Abstract translation: 要解决的问题：提供一种可以通过干法蚀刻排除凹口的带电粒子束静电透镜等，以进行精确加工。解决方案：带电粒子束静电透镜的电极是具有叠层结构的电极， 多个导电基板。 具有层叠结构的电极至少包括：包括第一通孔的第一导电基板12; 以及包括第二通孔的第二导电基板11。 所述第一导电性基板使用比所述第二导电性基板更薄的导电性基板，所述导电性基板的直径小于所述第二导通孔的直径。 第二导电基板使用电阻率较低且比第一导电基板厚的导电基板，并且布置在直径大于第一通孔的导电基板上的孔填充有电镀，然后导电基板 变薄，从而实现直径大于第一通孔的第二通孔。 第一通孔和第二通孔被定位成层叠第一和第二导电基板，因此电极10形成有层压结构。

    Electrostatic lens
    6.
    发明专利
    Electrostatic lens 审中-公开
    静电镜

    公开(公告)号：JP2013084638A

    公开(公告)日：2013-05-09

    申请号：JP2011221424

    申请日：2011-10-05

    Applicant: Canon Inc ,  キヤノン株式会社

    Inventor： MITSUMICHI KAZUHIRO

    IPC: H01L21/027 ,  G03F7/20 ,  H01J37/12

    CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/1205

    Abstract: PROBLEM TO BE SOLVED: To provide an electrostatic lens having an electrode protection film that allows suppression of axis deviation of a charged particle line in the electrostatic lens, or allows achievement and retention of a highly precise positioned state of a component member.SOLUTION: An electrostatic lens comprises: a plurality of electrodes 1 each having a through hole 3; and an insulating spacer 2 disposed between the electrodes and defines a distance between the electrodes. The insulating spacer 2 is integrated with the electrodes 1 opposed to each other by allowing both surfaces of the insulating spacer 2 to be respectively joined to the electrodes. An electrode protection film 4 is disposed on both surfaces of each of the electrodes 1. The electrode protection film 4 exists on an inner wall of the through hole 3 and on the surfaces of the electrode 1 in a region around the through hole 3 continuously connected from the inner wall to end parts of the electrode 1. The electrode protection film 4 does not exist at the interface between the electrode 1 and the insulating spacer 2.

    Abstract translation: 要解决的问题：提供一种具有电极保护膜的静电透镜，其能够抑制静电透镜中带电粒子线的轴偏移，或者允许实现并保持组件的高精度定位状态。 解决方案：静电透镜包括：多个电极1，每个电极具有通孔3; 以及设置在电极之间并且限定电极之间的距离的绝缘间隔件2。 绝缘间隔物2通过使绝缘间隔物2的两面分别与电极接合而与彼此相对的电极1一体化。 电极保护膜4设置在每个电极1的两个表面上。电极保护膜4存在于通孔3的内壁上，并且在通孔3周围的区域中，电极1的表面连续地连接 电极保护膜4不存在于电极1和绝缘垫片2之间的界面处。（C）2013，JPO＆INPIT

    Electrostatic lens unit
    8.
    发明专利
    Electrostatic lens unit 审中-公开
    静电镜头单元

    公开(公告)号：JP2014057022A

    公开(公告)日：2014-03-27

    申请号：JP2012202398

    申请日：2012-09-14

    Applicant: Canon Inc ,  キヤノン株式会社

    Inventor： SHIOZAWA TAKASHI ,  UTSUMI KAZUNARI ,  YAMANAKA TOSHIRO

    IPC: H01L21/027 ,  G03F7/20 ,  H01J37/12

    CPC classification number: H01J3/18 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/1207 ,  H01J2237/31754 ,  H01J2237/31774

    Abstract: PROBLEM TO BE SOLVED: To provide an electrostatic lens unit capable of suppressing the amount of deformation of a charged particle beam lens caused by being heated by a charged particle beam that returns to the charged particle beam lens by being reflected by a resist.SOLUTION: In an electrostatic lens unit in which an electrostatic lens formed by arranging a plurality of electrodes 1 each having a through-hole 5 through which a charged beam passes by separating with interval defining members 2 is fixed to a fixing member 3, a position at which the electrostatic lens is fixed to the fixing member is positioned on a side where the charged beam is emitted than a thickness center in an optical axis direction of the electrostatic lens, and part of a surface on a side where the charged beam enters the electrostatic lens is connected to the fixing member 3 through a support member 4.

    Abstract translation: 要解决的问题：提供一种静电透镜单元，其能够抑制由被抗蚀剂反射回到带电粒子束透镜的带电粒子束加热引起的带电粒子束透镜的变形量。解决方案： 在静电透镜单元中，其中通过布置多个电极1而形成的静电透镜被固定到固定构件3，静电透镜通过布置多个电极1而形成，该多个电极1具有带有间隔限定构件2的带电光束通过的通孔5， 固定在固定部件上的静电透镜被定位在与静电透镜的光轴方向的厚度中心相比发射的被充电光束的一侧，并且被充电光束进入静电透镜的一侧的一部分表面 通过支撑部件4与固定部件3连接。

    Electrostatic type charged particle beam lens and charged particle beam device
    9.
    发明专利
    Electrostatic type charged particle beam lens and charged particle beam device 审中-公开
    静电型充电颗粒光束和充电颗粒光束装置

    公开(公告)号：JP2013168396A

    公开(公告)日：2013-08-29

    申请号：JP2012029107

    申请日：2012-02-14

    Applicant: Canon Inc ,  キヤノン株式会社

    Inventor： SHIMAZU AKIRA

    IPC: H01L21/027 ,  H01J37/12 ,  H01J37/18

    CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/022 ,  H01J2237/1205 ,  H01J2237/18

    Abstract: PROBLEM TO BE SOLVED: To provide a cleaning processing method of deposit inside a lens.SOLUTION: In an electrostatic charged particle beam lens having a plurality of lens electrodes, the charged particle beam lens includes a first electrode and a second electrode to be arranged by being separated from each other by an interval regulation member in an optical axis direction and has a gap surrounded by the first electrode 1a, the second electrode 1b, and the interval regulation member. The first electrode and the second electrode have a first through hole 2 through which charged particle beams pass, and at least the second electrode has a second through hole 3 through which the charged particle beams do not pass. The charged particle beam lens has a structure in which the first through hole and the second through hole are connected to the gap, respectively, and is constituted so that the total amount of exhaust conductance of the first electrode becomes smaller than the total amount of exhaust conductance to communicate to the outside of the lens electrodes through the through hole provided to the second electrode from the gap.

    Abstract translation: 要解决的问题：提供一种在透镜内沉积的清洁处理方法。解决方案：在具有多个透镜电极的静电带电粒子束透镜中，带电粒子束透镜包括第一电极和第二电极， 通过间隔调节构件在光轴方向上彼此分离，并且具有由第一电极1a，第二电极1b和间隔调节构件包围的间隙。 第一电极和第二电极具有带电粒子束通过的第一通孔2，并且至少第二电极具有带电粒子束不通过的第二通孔3。 带电粒子束透镜分别具有第一通孔和第二通孔连接到间隙的结构，并且构成为使得第一电极的排气电导的总量变得小于排气总量 电导通过从间隙提供给第二电极的通孔与透镜电极的外部通信。

    Charged particle beam lens and exposure apparatus using the same
    10.
    发明专利
    Charged particle beam lens and exposure apparatus using the same 审中-公开
    充电颗粒光束和曝光装置使用它

    公开(公告)号：JP2012195097A

    公开(公告)日：2012-10-11

    申请号：JP2011056814

    申请日：2011-03-15

    Applicant: Canon Inc ,  キヤノン株式会社

    Inventor： KATO TAKAHISA ,  SETOMOTO YUTAKA

    IPC: H01J37/12 ,  H01J37/153 ,  H01J37/305 ,  H01L21/027

    CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J37/3177 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/1207

    Abstract: PROBLEM TO BE SOLVED: To solve such a problem that an electrostatic type charged particle beam lens is sensitive in astigmatism to the symmetry of an opening shape, and likely to be broken in a manufacturing process.SOLUTION: The electrostatic type charged particle beam lens includes a flat plate having a first surface with an optical axis direction as a normal line and a second surface opposite to the first surface, and has an electrode having a through-hole penetrating through from the first surface to the second surface. An opening surface on the surface perpendicular to the normal line of the through-hole is formed to have an opening cross-section. When the diameter of circle obtained by regression analysis of the opening cross-section is regarded as a representative diameter, the representative diameter of the opening cross-section in a first region on the first surface side and the representative diameter of the opening cross-section in a second region on the second surface side are respectively larger than that in a third region which is a region inside the electrode sandwiched between the first surface and the second surface.

    Abstract translation: 解决的问题为了解决静电型带电粒子束透镜在散光中敏感到开口形状的对称性并且在制造过程中可能被破坏的问题。 ＆lt; P＆gt;解决方案：静电型带电粒子束透镜包括具有作为法线的光轴方向的第一表面和与第一表面相对的第二表面的平板，并且具有通孔穿透的电极 从第一表面到第二表面。 在垂直于通孔的法线的表面上的开口表面形成为具有开口横截面。 当通过开口横截面的回归分析获得的圆的直径被认为是代表性的直径时，第一表面侧的第一区域中的开口横截面的代表直径和开口横截面的代表性直径 在第二表面侧的第二区域分别大于夹在第一表面和第二表面之间的电极内的区域的第二区域。 版权所有（C）2013，JPO＆INPIT

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