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586 条记录 (耗时 0.024 秒)

    Wide band anti-reflection film
    91.
    发明专利
    Wide band anti-reflection film 审中-公开
    宽带防反射膜

    公开(公告)号：JP2007171735A

    公开(公告)日：2007-07-05

    申请号：JP2005371539

    申请日：2005-12-26

    申请人： Epson Toyocom Corp ,  エプソントヨコム株式会社

    发明人： YAMAGUCHI KOJI

    IPC分类号： G02B1/11 ,  B32B7/02 ,  B32B9/00

    CPC分类号： G02B1/115

    摘要： PROBLEM TO BE SOLVED: To provide a wide band anti-reflection film which reduces variation of transmissivity characteristic of the anti-reflection film when optical elements are mass-produced while attaining broadband adaptation of the anti-reflection film. SOLUTION: The wide band anti-reflection film 6 is constituted by laminating seven layers of thin films on a substrate 7. In regard to thin film constituting materials, a first thin film 8 is film-formed of MgF 2 which is known to have strong adhesiveness to the substrate 7. Further in the wide band anti-reflection film 6, a second thin film 9 is film-formed of H 4 (a mixture composed of La and TiO 2 ), a third thin film 10 is film-formed of MgF 2 , a fourth thin film 11 is film-formed of H 4 , a fifth thin film 12 is film-formed of MgF 2 , a sixth thin film 13 is film-formed of H 4 and a seventh thin film 14 is film-formed of MgF 2 in order from a surface of the first thin film 8. COPYRIGHT: (C)2007,JPO&INPIT

    摘要翻译： 要解决的问题：提供一种宽带抗反射膜，当在抵抗抗反射膜的宽带适配的同时，在大量生产光学元件的同时，减小抗反射膜的透射率特性的变化。 解决方案：宽带防反射膜6通过在基板7上层叠7层薄膜而构成。关于薄膜构成材料，第一薄膜8由MgF 2 已知具有与基板7的强粘合性的。此外，在宽带防反射膜6中，第二薄膜9由H 4 的La和TiO 2 ），第三薄膜10由MgF 2 SBB薄膜形成，第四薄膜11由H < / SB>，第五薄膜12由MgF 2 SBB薄膜形成，第六薄膜13由H 4薄膜形成，第七薄膜14是 从第一薄膜8的表面依次形成MgF 2 。版权所有（C）2007，JPO＆INPIT

    The anti-reflection film and related methods
    93.
    发明专利
    The anti-reflection film and related methods 审中-公开

    公开(公告)号：JP2005502077A

    公开(公告)日：2005-01-20

    申请号：JP2003525334

    申请日：2002-08-30

    申请人： フオン・アルデンネ・アンラーゲンテヒニク・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング

    发明人： ダンネンベルク・ラント・ダーヴィト

    IPC分类号： G02B1/11

    CPC分类号： G02B1/116 ,  G02B1/115

    摘要： 【課題】光学薄膜および基板に成膜する方法を規定するものである。
    【解決手段】基板に隣接して、第一の層を成膜する。 この第一の層は、約０．２７λ
    0 から０．３１λ
    0 までの光学的厚さを有し、その際λ
    0 は、可視スペクトルによって境界を規定されたスペクトル領域、または可視スペクトル内のスペクトル領域に対応する基準波長である。 約０．１λ
    0 から０．１２５λ
    0 までの光学的厚さと約２．２から約２．６までの屈折率を有する第二の層を成膜する。 約１．４６から約１．５２までの屈折率を有する第三の層を成膜する。 この光学薄膜は、広帯域反射防止性能を備えており、この薄い第二の層により、この光学薄膜を高能率に製造することが容易となっている。

    Optical antireflection film and process for forming the same
    94.
    发明专利
    Optical antireflection film and process for forming the same 审中-公开

    公开(公告)号：JP2004157497A

    公开(公告)日：2004-06-03

    申请号：JP2003073315

    申请日：2003-03-18

    申请人： Shin Meiwa Ind Co Ltd ,  新明和工業株式会社

    发明人： SHIYOUZUDE JUNJI ,  TOKOMOTO ISAO ,  HORI TAKANOBU ,  KOZUKA TAKESHI

    IPC分类号： C23C14/06 ,  C23C14/08 ,  C23C14/20 ,  C23C14/26 ,  C23C14/30 ,  C23C14/32 ,  G02B1/11

    CPC分类号： G02B1/115

    摘要： PROBLEM TO BE SOLVED: To provide an optical antireflection film with a silicon oxide film which ensures adhesion to a synthetic resin substrate, environmental resistance, wear and chemical resistances and has suitable optical characteristics, and to provide a process for forming the same. SOLUTION: A first SiO film having a refractive index substantially equal to the refractive index of an acrylic resin substrate is formed to a thickness of about 200 nm on the substrate, and a second SiO film having a refractive index assuming a value falling within the range from 1.48 to 1.62 is formed to a thickness of about 200 nm on the first SiO film. Further, in the case of an HLHL type antireflection film for example, a TiO 2 film having a refractive index assuming a value falling within the range from 2.2 to 2.4 is formed as the layer next to the outermost layer with a special ion plating apparatus. COPYRIGHT: (C)2004,JPO

    Antireflection film, and optical device and optical system having same
    97.
    发明专利
    Antireflection film, and optical device and optical system having same 有权

    公开(公告)号：JP2004046079A

    公开(公告)日：2004-02-12

    申请号：JP2003066582

    申请日：2003-03-12

    申请人： Canon Inc ,  キヤノン株式会社

    发明人： KANAZAWA HIDEHIRO ,  ANDO KENJI ,  TERANISHI KOJI

    IPC分类号： B32B7/02 ,  G02B1/11

    CPC分类号： G02B1/115

    摘要： PROBLEM TO BE SOLVED: To solve a problem wherein the function of an optical device is degraded because of lower transmittance since an antireflection film having a designed center wavelength between 180 and 220 nm needs to have a thickness greater than a specified level to maintain an antireflection function. SOLUTION: An antireflection film includes alternately deposited high refractive index layers and low refractive index layers. The antireflection film exhibiting sufficient antireflection characteristics is obtained even if the geometrical thickness thereof is small by taking the refractive indexes and extinction coefficients of the layers into account and considering the extinction coefficient of the antireflection film. An optical device having the antireflection film on a substrate exhibits high transmittance and has excellent optical characteristics. COPYRIGHT: (C)2004,JPO

    Wide-band reflection preventive film with four sputtered layers
    98.
    发明专利
    Wide-band reflection preventive film with four sputtered layers 审中-公开
    宽带反射预防膜与四个溅射层

    公开(公告)号：JPH11271507A

    公开(公告)日：1999-10-08

    申请号：JP37363898

    申请日：1998-12-28

    申请人： Boc Group Inc:The ,  ザ ビーオーシー グループ インコーポレイテッド

    发明人： LAIRD RONALD E ,  CARNIGLIA CHARLES K

    IPC分类号： B32B7/02 ,  C23C14/34 ,  G02B1/11

    CPC分类号： C03C17/3417 ,  C03C2217/734 ,  C03C2217/948 ,  G02B1/115 ,  G02B1/116 ,  Y10T428/24942 ,  Y10T428/24975

    摘要： PROBLEM TO BE SOLVED: To economically obtain the reflection preventive film by serial magnetron sputtering by incorporating a 3rd layer which has a specific refractive index and specific optical thickness. SOLUTION: A 1st layer 26 on the top surface 24 of a substrate 22 has an intermediate or high refractive index which is larger than about 1.9 and preferably has optical thickness which is

    摘要翻译： 要解决的问题：通过并入具有特定折射率和特定光学厚度的第三层，通过串联磁控溅射经济地获得防反射膜。 解决方案：衬底22的顶表面24上的第一层26具有大于约1.9的中间或高折射率，并且优选具有与反射防止层的中心波长一样大的<= 1/4的光学厚度 电影。 第二层28具有小于约1.5的折射率，并且优选地具有与中心波长一样大的<= 1/4的光学厚度。 第三层30的光学厚度可以为中心波长的1/6，1/7或1/8。 第四层32具有低折射率，并且优选地具有约为中心波长的1/4或更大的光学厚度。 层28和32的低折射率材料是具有<= 20％其它材料的二氧化硅。 层30的高折射率材料是TiO 2。

    Method for using optical parts
    100.
    发明专利
    Method for using optical parts 失效
    使用光学部件的方法

    公开(公告)号：JPS61118702A

    公开(公告)日：1986-06-06

    申请号：JP23984284

    申请日：1984-11-14

    申请人： Matsushita Electric Ind Co Ltd

    发明人： MIYATA TAKEO ,  ONO TAKUHIRO ,  IWABUCHI TAKASHI ,  IKEDO TOSHI ,  WATARI MASABUMI

    IPC分类号： G02B1/10 ,  G02B1/11 ,  G02B6/02 ,  G02B6/24 ,  G02B6/34 ,  G02B13/14

    CPC分类号： G02B6/02052 ,  G02B1/115 ,  G02B6/241 ,  G02B6/29368 ,  G02B13/14

    摘要： PURPOSE:To extend the operating life of optical parts and to reduce an overall cost by operating the optical parts coated with the optical film of arsenic triselenide in an inert gas under the irradiation of a laser. CONSTITUTION:An antireflecting film 2 coated to both end of a fiber 1 is constituted of the arsenic triselenide films 3, 5 and a lead fluoride layer 4 and seals the fiber 1 in an armored cable 6 which is shielded from the outdoor air by a window 7 and a condenser lens 8. The laser beam 12 is introduced through the window 7 and the film 2 into the fiber 1 and is emitted from the lens 8 side. The insert gas such as dry gaseous nitrogen is thus sealed into the cable 6 and the antireflecting film of the arsenic triselenide is formed and therefore the operating life of the optical film is considerably extended.

    摘要翻译： 目的：为了延长光学部件的使用寿命，并且通过在激光照射下在惰性气体中操作涂覆有三硒化砷的光学膜的光学部件来降低整体成本。 构成：涂布在纤维1的两端的防反射膜2由三硒化铟膜3,5和氟化铅层4构成，并将纤维1密封在铠装电缆6中，铠装电缆6通过窗户与室外空气隔绝 7和聚光透镜8.激光束12通过窗口7和膜2引入光纤1中并从透镜8侧发射。 因此，将诸如干燥氮气的插入气体密封到电缆6中，形成三硒化砷的抗反射膜，因此光学膜的使用寿命显着延长。