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公开(公告)号：JP2007105721A
公开(公告)日：2007-04-26
申请号：JP2006206196
申请日：2006-07-28
发明人： DEEM JOHN G , COYNE ROBERT M
CPC分类号： H01J37/32871 , C23C4/131 , H01J37/32477 , Y10T428/12472
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for applying a twin wire arc spray composite coating to achieve surface effects on a substrate having predetermined characteristics. SOLUTION: A composite coating is applied on a deposition chamber component substrate using the twin wire arc spray coating apparatus 56. A second top coating layer having the surface roughness greater than the surface roughness of a first adhering coating is formed on the coating surface while regulating coating components, nozzle flow and a substrate composition. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译： 要解决的问题：提供一种用于施加双线电弧喷涂复合涂层以在具有预定特性的基板上实现表面效果的方法和设备。 解决方案：使用双线电弧喷涂设备56将复合涂层施加在沉积室部件基底上。在涂层上形成表面粗糙度大于第一粘附涂层的表面粗糙度的第二顶涂层 表面，同时调节涂层组分，喷嘴流和基底组成。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2005232591A
公开(公告)日：2005-09-02
申请号：JP2004380906
申请日：2004-12-28
发明人： DICKINSON COLIN J , JANSEN FRANK
IPC分类号： H01L21/20 , C23C16/44 , C23C16/455 , C23C16/458 , H01L21/28 , H01L21/285 , H01L21/31 , H01L21/318
CPC分类号： C23C16/45544 , C23C16/45589 , C23C16/4586
摘要： PROBLEM TO BE SOLVED: To provide an apparatus and process capable of executing the process in the cycle time of a high speed by avoiding the undesirable condensation of gaseous precursors in atomic layer deposition which is a method for depositing an extremely thin film on a surface.
SOLUTION: The atomic layer deposition apparatus is equipped with a process reactor chamber including an inlet for receiving the gaseous precursors and at least one outlet connected through outlet piping to an exhaust pump, a first gaseous precursor valve connected to the inlet to receive the first gaseous precursor, a second gaseous precursor valve connected to the inlet to receive the second gaseous precursor, a first bypass conduit connected to the first gaseous precursor valve, and a second bypass conduit connected to the second gaseous precursor valve, wherein the first bypass conduit and the second bypass conduit are separated from the outlet piping, and the method for adequately switching the gaseous precursors, are provided.
COPYRIGHT: (C)2005,JPO&NCIPI摘要翻译： 要解决的问题：提供一种能够通过避免在原子层沉积中气态前体的不希望的冷凝而能够在高速循环时间中执行该过程的装置和方法，其是将非常薄的膜沉积在其上的方法 一个表面。 解决方案：原子层沉积设备装备有工艺反应器室，其包括用于接收气态前体的入口和通过出口管道连接到排气泵的至少一个出口，连接到入口以接收的第一气态前体阀 所述第一气态前体，连接到所述入口以接收所述第二气态前体的第二气态前体阀，连接到所述第一气态前体阀的第一旁路导管和连接到所述第二气态前体阀的第二旁通管，其中所述第一旁路 导管和第二旁路导管与出口管道分离，并且提供了用于充分切换气态前体的方法。 版权所有（C）2005，JPO＆NCIPI
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公开(公告)号：JP2005099008A
公开(公告)日：2005-04-14
申请号：JP2004247882
申请日：2004-08-27
发明人： FORSHEY RANDY G , POZNIAK PETER M
摘要： PROBLEM TO BE SOLVED: To measure low flow rate in liquid flow rate measurement with high sensivity and with accuracy.
SOLUTION: A system for measurement of liquid flow rate comprises a collection vessel 20, coupled to a supply valve 42 and a drain valve 44, a weir 36 for supplying a liquid to the collection vessel 20, one or more load cells 24 and 28 coupled to the collection vessel 20, and a controller 50. The controller 50 computes the mass flow rate, according to a mass signal of the load cells 24 and 28 prior to liquid supply and a mass signal of the load cells 24 and 28 after the liquid supply, and a liquid supply time interval, and/or computes a volume flow rate from a liquid density.
COPYRIGHT: (C)2005,JPO&NCIPI摘要翻译： 要解决的问题：以高灵敏度和准确度测量液体流量测量中的低流量。 解决方案：用于测量液体流速的系统包括联接到供应阀42和排放阀44的收集容器20，用于向收集容器20供应液体的堰36，一个或多个称重传感器24 28和控制器50.控制器50根据液体供应之前的测力传感器24和28的质量信号和称重传感器24和28的质量信号来计算质量流量 在液体供应和液体供应时间间隔之后，和/或从液体密度计算体积流量。 版权所有（C）2005，JPO＆NCIPI
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公开(公告)号：JP2004323110A
公开(公告)日：2004-11-18
申请号：JP2004119933
申请日：2004-04-15
发明人： STEWART PAUL , HENDRICKX PAUL , DAMEN FRANS
CPC分类号： B65B55/025 , B65B3/003
摘要： PROBLEM TO BE SOLVED: To provide a device for filling a pharmaceutical container in a substantially sterilized environment.
SOLUTION: The device includes a sterilized zone 64 which is not substantially contaminated, an upright wall which divides the non-sterilized zone and an enclosing body which defines the sterilized zone by co-operating with the upright wall. The device further comprises a transfer section which receives an empty container outside the sterilized zone, a transport section which is at least partially disposed in the sterilized zone, and a filling device which fills the pharmaceutical in the container in the sterilized zone when the container is moved through the sterilized zone. The filling device comprises at least one dispenser 49 disposed in the sterilized zone and a drive disposed in the non-sterilized zone. The device may further comprise one device which can be moved together with at least one dispenser. The device is formed so as to control the flow of the pharmaceutical from the dispenser and can be moved so as to be disegaged from the container, a filling engagement and such the conditions.
COPYRIGHT: (C)2005,JPO&NCIPI-
5.发明专利
公开(公告)号：JP2004203737A
公开(公告)日：2004-07-22
申请号：JP2003424604
申请日：2003-12-22
发明人： JIANG WEIBIN , PARK SEUNGDOO , TOMCZAK MARK S , ACHARYA DIVYANSHU R , TAMHAUKAR SATISH S , RAMACHANDRAN RAMAKRISHNAN
IPC分类号： C01B3/40 , B01J20060101 , B01J23/63 , C01B20060101 , C01B3/38 , C01B32/40 , C07C2/10 , C01B31/18
CPC分类号： C01B3/386 , C01B2203/0261 , C01B2203/043 , C01B2203/046 , C01B2203/047 , C01B2203/0877 , C01B2203/1023 , C01B2203/1041 , C01B2203/1047 , C01B2203/1052 , C01B2203/1064 , C01B2203/1082 , C01B2203/1241 , C01B2203/1276 , C01B2203/146 , C01B2203/148 , C01B2203/1604 , C01B2203/1609 , Y02P20/52
摘要： PROBLEM TO BE SOLVED: To provide an improved method for producing hydrogen and carbon monoxide at a high conversion rate by partial catalytic oxidation of hydrocarbons. SOLUTION: The method is to produce hydrogen and carbon monoxide by partial oxidation of the hydrocarbons, wherein the partial oxidation is carried out, starting at a low temperature of approximately 10°C or higher, by bringing a reduction metal catalyst comprising transition metals composed of nickel, cobalt, iron, platinum, iridium, rhenium, ruthenium, rhodium, osmium and their combinations carried on or in a ceria-coating zirconia monolith carrier into contact with a mixture of a feed material gas containing the hydrocarbons, a feed material gas containing oxygen, and hydrogen. COPYRIGHT: (C)2004,JPO&NCIPI
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公开(公告)号：JP2004122127A
公开(公告)日：2004-04-22
申请号：JP2003344273
申请日：2003-10-02
发明人： LEITCH KELLY , HARTIGAN GAVIN , DORAZIO ROBERT
CPC分类号： B01D53/04 , B01D53/261 , B01D2256/22 , B01D2257/704 , B01D2259/40001 , B01D2259/40086 , B08B7/0021 , Y10S62/928
摘要： PROBLEM TO BE SOLVED: To provide a method and apparatus for recovering a carbon dioxide which is used for a supercritical extraction.
SOLUTION: This recovery apparatus (1) is constituted to provide a pressurized carbon dioxide, a waste material generated in extraction process and in some cases a process flow (61) including at least one kind of cosolvent from a supercritical extraction process (60), to reduce a pressure of the process flow below the critical pressure, to exhaust a low pressure carbon dioxide steam (66), to form a two-phases mixture by cooling the process flow, to divide into a process liquid (71) including the cosolvent and a process steam phase flow (72). The recovery apparatus is constituted to collect the process liquid, to filtrate the process steam phase flow (72), to remove a particulate material and a residual cosolvent, to form a refined carbon dioxide steam flow (90) by passing the filtrated process steam flow (81) through an absorber (85) and removing impurities of trace amount, and to dry and remove the residual steam.
COPYRIGHT: (C)2004,JPO摘要翻译： 待解决的问题：提供一种用于回收用于超临界萃取的二氧化碳的方法和装置。 解决方案：该回收装置（1）被构造成提供加压二氧化碳，在提取过程中产生的废料，并且在一些情况下构成包括来自超临界萃取方法的至少一种助溶剂的工艺流程（61） 60），以将工艺流程的压力降低到临界压力以下，以排出低压二氧化碳蒸汽（66），以通过冷却工艺流程形成两相混合物，以分成工艺液体（71） 包括助溶剂和过程蒸汽相流（72）。 回收装置被构造成收集处理液体，以过滤蒸汽相流（72），以除去颗粒物质和残余共溶剂，以通过使过滤的蒸汽流通过过滤蒸汽流（90）形成精制二氧化碳蒸汽流 （81）通过吸收器（85）并除去痕量的杂质，并干燥并除去残留蒸汽。 版权所有（C）2004，JPO
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7.发明专利Method and apparatus for using solution based precursors for atomic layer deposition 审中-公开使用基于溶液的前驱体进行原子层沉积的方法和装置
公开(公告)号：JP2012214909A
公开(公告)日：2012-11-08
申请号：JP2012168428
申请日：2012-07-30
发明人： MA CE , WANG QING MIN , HELLY PATRICK J , HOGLE RICHARD
IPC分类号： C23C16/40 , C23C16/18 , H01L21/31 , H01L21/316
CPC分类号： C23C16/45544 , C23C16/448 , C23C16/45525 , Y10T428/8305
摘要： PROBLEM TO BE SOLVED: To provide a novel combination of solution stabilization and delivery technologies with special ALD operational modes that allows the use of low-volatility solid ALD precursors dissolved in solvents.SOLUTION: A wide range of the low volatility solid ALD precursors dissolved in the solvents, such as THF, are used. Unstable solutes may be stabilized in solution and all of the solutions may be delivered at room temperature. After the solutions are vaporized, a vapor phase precursor solution and a reaction solution are alternately pulsedly-supported into a deposition chamber to grow an ALD film of a predetermined thickness.
摘要翻译： 要解决的问题：提供溶液稳定化和输送技术与特殊ALD操作模式的新型组合，允许使用溶解在溶剂中的低挥发性固体ALD前体。 解决方案：使用溶解在溶剂中的各种低挥发性固体ALD前体，如THF。 不稳定的溶质可以在溶液中稳定，并且所有溶液可以在室温下输送。 在溶液蒸发之后，将气相前体溶液和反应溶液交替地脉冲地支撑到沉积室中以生长预定厚度的ALD膜。 版权所有（C）2013，JPO＆INPIT
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公开(公告)号：JP2008074702A
公开(公告)日：2008-04-03
申请号：JP2007243357
申请日：2007-09-20
发明人： DAVYDOV LEV , JIANG WEIBIN , NORMAN JASON , UHLMAN BRUCE
CPC分类号： C01B3/386 , B01J4/002 , C01B2203/0261 , C01B2203/1023 , C01B2203/1276
摘要： PROBLEM TO BE SOLVED: To provide a method and a device for thoroughly mixing reactant gases prior to their feed to a catalytic partial oxidation reactor while avoiding the risk of combustion associated with premixing processes.
SOLUTION: The gas mixing device is typically an eductor such as a venturi-type eductor which will mix the feed gases used in the catalytic partial oxidation process. Two gas mixing devices may be used in sequence.
COPYRIGHT: (C)2008,JPO&INPIT摘要翻译： 要解决的问题：提供一种方法和装置，用于在反应气体进料到催化部分氧化反应器之前将反应气体充分混合，同时避免与预混合过程相关的燃烧风险。
解决方案：气体混合装置通常是喷射器，例如文丘里型喷射器，其将混合在催化部分氧化过程中使用的进料气体。 可以依次使用两个气体混合装置。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2008074700A
公开(公告)日：2008-04-03
申请号：JP2007241803
申请日：2007-09-19
发明人： JIANG WEIBIN , TAMHANKAR SATISH S
CPC分类号： C01B3/48 , B01J23/40 , B01J23/74 , B01J35/04 , C01B3/382 , C01B3/386 , C01B2203/0233 , C01B2203/0261 , C01B2203/0288 , C01B2203/0405 , C01B2203/043 , C01B2203/0495 , C01B2203/0877 , C01B2203/0883 , C01B2203/1023 , C01B2203/1047 , C01B2203/1052 , C01B2203/1058 , C01B2203/1064 , C01B2203/107 , C01B2203/142 , Y02P20/52
摘要： PROBLEM TO BE SOLVED: To provide an improved process of catalytic partial oxidation of hydrocarbons for producing hydrogen and carbon monoxide.
SOLUTION: The process uses a novel catalytic structure apparatus having a first stage reactor including a second layer of a reduced metal catalyst supported on a stable inorganic metal oxide washcoated on a first layer of a precious metal or a transition metal catalyst on a carrier or on the carrier, and a second stage reactor of a shift reactor.
COPYRIGHT: (C)2008,JPO&INPIT摘要翻译： 要解决的问题：提供用于产生氢气和一氧化碳的烃的催化部分氧化的改进方法。 解决方案：该方法使用具有第一阶段反应器的新型催化结构装置，该第一阶段反应器包括负载在第一层贵金属或过渡金属催化剂上的稳定的无机金属氧化物上的还原金属催化剂的第二层 载体或载体上，以及换档反应器的第二级反应器。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2007173785A
公开(公告)日：2007-07-05
申请号：JP2006307392
申请日：2006-11-14
发明人： DAVIS IAN MARTIN , LAUBE DAVID P
IPC分类号： H01L21/304
CPC分类号： B24C5/04 , B24C3/325 , B24C7/0038 , B24C11/005 , H01L21/67051
摘要： PROBLEM TO BE SOLVED: To provide cleaning equipment and a method for removing debrisments effectively from a surface of semiconductor etching chamber.
SOLUTION: The equipment has an atomization head 22 which includes an entrance port 4 of atomized flow object, an entrance port 6 of abrasive slurry, and an exit port 8 of atomized abrasive slurry. However, in an aspect 200, an internal flow-passage includes a convergence-emission nozzles 24, 28 and a throat portion 26 profiled in more streamline. The throat portion 26 in this aspect includes an inlet hole or opening 16 for the abrasive slurry. The abrasive slurry is introduced in the throat portion 26 by a negative pressure generated by a flow of flowing fluid. The abrasive slurry can be pulled out from one or more abrasive slurry containers 20, and the head 22 can be equipped with one or more fluid connections to one or more flowing fluid supply sources 18.
COPYRIGHT: (C)2007,JPO&INPIT摘要翻译： 要解决的问题：提供从半导体蚀刻室的表面有效地去除碎屑的清洁设备和方法。 解决方案：设备具有雾化头22，雾化头22包括雾化流动物体的入口4，磨料浆料的入口6和雾化磨料浆料的出口8。 然而，在一方面200中，内部流动通道包括会聚发射喷嘴24,28和更流线形成的喉部26。 在该方面，喉部26包括用于磨料浆料的入口孔或开口16。 研磨浆料由流动的流体流产生的负压引入到喉部26中。 研磨浆料可以从一个或多个磨料浆料容器20中拉出，并且头部22可配备有一个或多个流体连接到一个或多个流动的流体供应源18.版权所有（C）2007，JPO＆INPIT
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