Abstract:
PROBLEM TO BE SOLVED: To provide an electron emission film capable of obtaining high emission current density at a low electric field. SOLUTION: In an electron emission element having the electron emission film including metal and carbon, the density of the electron emission film excluding the metal is set up to be 1.2 g/cm 3 or more to 1.8 g/cm 3 , and a content of hydrogen in the electron emission film is set up to be 15 to 40 atom% against the whole atoms organizing the electron emission film. Further, a metal density in a range from the surface of the electron emission film to the depth of 10 nanometers is set up to be 0.1 to 40 atom% against the carbon atomic number included in the electron emission film. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation:解决的问题:提供能够在低电场下获得高发射电流密度的电子发射膜。 解决方案:在具有包括金属和碳的电子发射膜的电子发射元件中,除了金属之外的电子发射膜的密度设定为1.2g / cm 3以上,以上至 相对于组织电子发射膜的整个原子,电子发射膜中的氢含量设定为15〜40原子%,为1.8g / cm 3。 此外,从电子发射膜的表面到10纳米的深度的范围内的金属密度相对于包含在电子发射膜中的碳原子数为0.1至40原子%。 版权所有(C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an electron emitting element equipped with an electron emitting film hardly causing a change in characteristics by heat and capable of stable electron emission, an electron source, an image display device, and manufacturing methods thereof. SOLUTION: The electron emitting film of this electron emitting element is a film having a first layer made of a first material, and a plurality of particles made of a second material having electrical resistivity smaller than that of the first material and provided in the first layer. The first material contains oxygen and nitrogen. In details, the first material is oxynitride, oxide doped with nitrogen, or nitride doped with oxygen. The particle diameter of the particle is 1-10 nm. The surface of the electron emitting film is terminated by hydrogen. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a technology of making the expansion of an electronic beam discharged from an electron discharging element in the vicinity of first wiring small, suppressing the electronic beam from being radiated to a spacer arranged on the first wiring, and obtaining a high-definition field electron emission type display. SOLUTION: This electron source has an insulating substrate 14, the first wiring 11 arranged on the insulating substrate 14, second wiring 12 that is arranged on the insulating substrate 14 and crosses the first wiring 11, a cathode electrode equipped with an electron discharging member, and a gate electrode installed on the cathode electrode, and equipped with the electron discharging element 15 arranged on the insulating substrate 14 away from a crossing part of the first wiring 11 and the second wiring 12. The first wiring 11 is arranged on the second wiring 12 via the insulating layer 13, and the gate electrode has a plurality of slit-like openings formed in parallel at intervals, and formed so that an extended line of the orthogonal direction of the openings crosses the first wiring 11. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing field emission-type electron-emitting elements capable of highly effectively emitting electrons at a low voltage as well as showing a sufficient on/off property. SOLUTION: A manufacturing method of electron-emitting elements comprises the processes of: preparing a plurality of conductive particles each of which is coated at least on a part of the surface with an insulation layer having a thickness of not more than 10 nm; and forming a dipole layer on the surface of the insulation layer that covers each of the plurality of conductive particles. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide an electron-emitting element of a field emission type, achieving a small electron beam diameter, a large electron emission area, highly efficient electron emission at a low voltage, and an easy manufacturing process. SOLUTION: The electron-emitting element comprises a layer 2 electrically connected to a cathode electrode 5, and a plurality of particles 3 mainly made of a material having a resistivity lower than that of a material constituting the layer 2, wherein the density of the particles 3 in the layer 2 is not less than 1×10 14 /cm 3 and not more than 5×10 18 /cm 3 . COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To obtain a charge injection spin transistor which induces a charge alignment phase transition by other braking except a magnetic field and which uses the transition for a memory device. SOLUTION: The charge injection spin transistor comprises a perovskite Mn oxide layer 12 having a source electrode 13, a drain electrode 14, and further a structure having a gate electrode 16 on the layer 12 via an insulating layer 15 to induce the charge alignment phase transition. In this transistor, a voltage is applied to the gate electrode 16 to control a carrier (hole) density in the layer 12. Thus, the transition is induced by other braking except the magnetic field, and this can be used for the memory device. COPYRIGHT: (C)2003,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide an electron emission element having an excellent electron emission characteristic.SOLUTION: An electron emission element includes a cathode and a gate irradiated with electrons emitted via an electric field from the cathode, and the gate includes at least a layer including molybdenum and oxygen at a portion irradiated with the electrons emitted via the electric field from the cathode, and the layer has respective peaks in ranges of 397 eV to 401 eV, 414 eV to 418 eV, 534 eV to 538 eV, and 540 eV to 547 eV, which are observed in the spectrum measurement by an electron energy loss spectroscopic process using a transmission electron microscope.
Abstract:
PROBLEM TO BE SOLVED: To provide an electron-emitting device with superior electron emission characteristics, and to provide an image display apparatus. SOLUTION: The electron-emitting device includes an electron-emitting film containing molybdenum. A spectrum obtained by measuring the surface of the electron-emitting film by X-ray photoelectron spectroscopy has a first peak in the range of 229±0.5 eV and a sub peak in the range of 228.1±0.3 eV. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide: methods for manufacturing an electron emission device having sufficient electron-emission characteristics and simple procedure; an electron source; and an image display apparatus. SOLUTION: The method for manufacturing the electron-emission device includes: a step of preparing a substrate with a carbon film; and a step of locally radiating an energy onto part of the carbon film under an atmosphere of carbon hydride or a hydrogen, or both the carbon hydride and the hydrogen. An electron source has a plurality of electron-emission devices, and each of them is manufactured by the method for the electron-emission device. The image display apparatus has the electron source, and a light-emitting member emitting light by electron irradiation thereto. The electron source is manufactured by the method. COPYRIGHT: (C)2009,JPO&INPIT