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    Processing equipment
    13.
    发明专利
    Processing equipment 有权

    公开(公告)号：JP4200665B2

    公开(公告)日：2008-12-24

    申请号：JP2001136829

    申请日：2001-05-08

    Applicant: 株式会社日立製作所

    Inventor： 英巳 小池 ,  広康 志知 ,  馨 梅村 ,  宗行 福田 ,  昌和 菅谷

    IPC: G01N1/28 ,  G01N23/04 ,  G01N1/04 ,  G02B21/32 ,  H01J37/20 ,  H01L21/687

    CPC classification number: H01J37/20 ,  H01J2237/208 ,  H01J2237/3174 ,  H01J2237/31745 ,  H01L21/68707

    Abstract: There are disclosed a method for fabricating (processing) a micro-sample used for the observation, analysis, and measurement by, for example, a transmission electron microscope (TEM), and an equipment for specimen fabrication (processing) used for carrying out the method. With the method for specimen fabrication (processing) of the present invention, a micro-sample to be separated and extracted from a specimen substrate is sandwiched and held between a plurality of branch beams formed at the tip of a beam. The beam holding the micro-sample is transferred onto a sample holder, and the micro-sample is mounted (firmly held) on the sample holder. After mounting the micro-sample on the sample holder, the beam is detached and separated from the mounted micro-sample. By adopting such a method for separating, extracting, and mounting the micro-sample, it is possible to separate and extract the minute micro-sample from a desired region on the specimen substrate with precision and stability, and to fabricate a specimen for high reliability observation, analysis, and measurement entailing less contamination, in a shorter time and with efficiency.

    Sample processing equipment
    17.
    发明专利
    Sample processing equipment 有权

    公开(公告)号：JP5024468B2

    公开(公告)日：2012-09-12

    申请号：JP2011066959

    申请日：2011-03-25

    Applicant: 株式会社日立製作所

    Inventor： 英巳 小池 ,  広康 志知 ,  馨 梅村 ,  宗行 福田 ,  昌和 菅谷

    IPC: G01N1/28 ,  B25J7/00 ,  B81B3/00 ,  H01J37/20

    Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and method for surely and stably separating, removing, and storing a minute test piece without contaminating the minute test piece and an area around the minute test piece. SOLUTION: A test piece including an area to be observed is separated from a sample substrate by ion beam sputtering. A beam member is used to remove the test piece from the sample substrate. After the test piece is moved onto a mounting table on which the test piece is mounted, the test piece is stored by separating the beam member and the test piece from each other. The beam member serves to push in a sample for retention and pull out the sample for separation. The beam member has a tip that is narrower than a root of the beam member, and the tip is in a divided shape. The beam member is composed of a rod-like member for holding the test piece by force of elastic deformation in a site, obtained by the shape, in which the test piece is held. COPYRIGHT: (C)2011,JPO&INPIT

    Sample processing equipment and sample processing method
    18.
    发明专利
    Sample processing equipment and sample processing method 有权

    公开(公告)号：JP4747952B2

    公开(公告)日：2011-08-17

    申请号：JP2006150872

    申请日：2006-05-31

    Applicant: 株式会社日立製作所

    Inventor： 英巳 小池 ,  広康 志知 ,  馨 梅村 ,  宗行 福田 ,  昌和 菅谷

    IPC: G01N1/28 ,  G01N1/32 ,  G01N23/04 ,  H01J37/20

    CPC classification number: H01J2237/208

    Abstract: PROBLEM TO BE SOLVED: To provide a device and method for certainly and stably separating, extracting, and storing a micro sample piece without contaminating the micro sample piece and/or its peripheral region. SOLUTION: This beam member is formed of a rod-like member that is used for separating the sample piece including a region to be observed from a sample substrate by an ion beam spatter method, pressing and holding the sample, and pulling out and separating it, has a tip that is thinner than the root and has a split shape, and holds the sample piece with a force due to elastic deformation of a part for holding the sample piece obtained by the shape. Using the beam member, the sample piece is extracted from the sample substrate, is moved to a mounting stand for mounting it, and then stores the sample piece by separating the sample piece from the beam member. COPYRIGHT: (C)2007,JPO&INPIT

    Laser length measuring meter, an exposure apparatus, and an electron beam lithography system
    20.
    发明专利
    Laser length measuring meter, an exposure apparatus, and an electron beam lithography system 有权

    公开(公告)号：JP3616342B2

    公开(公告)日：2005-02-02

    申请号：JP2001086869

    申请日：2001-03-26

    Applicant: 株式会社日立製作所

    Inventor： 史雄 一色 ,  純男 保坂 ,  正作 山岡 ,  昌和 菅谷 ,  達人 鈴木

    IPC: G01B9/02 ,  G01B11/00 ,  G03F7/20 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provice a laser length measuring device in which a length measuring displacement is within an absolute accuracy of ±2 to ±1 nm. SOLUTION: A fluctuation-shaped error component which appears so as to correspond to the wavelength cycle of a laser beam is sensed when a stage is moved, and the error component is subtracted so as to increase an accuracy. Concretely, when a continuously moving object is used as an object to be measured so as to measure a distance a vibration component which appears at a cycle agreeing with the wavelength of the laser beam is regarded as a measurement error due to an interference effect, it is stored, and it is corrected so as to increase an accuracy, As a method used for its correction, comparativelt simple sine waves are added and subtracted, and the error of an absolute position of about ±2 mm is reduced to within ±1 nm so as to increase an accuracy. That is to say, the laser length measuring device is provided with a length measuring mechanism using a laser interference and a correction means which adds and subtracts a correction value with reference to the length measuring output value of the length measuring mechanism. The correction means uses a cyclic correction value whose cycle corresponds to the wavelength cycle of the laser beam.

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