Abstract:
PROBLEM TO BE SOLVED: To economically produce a polycrystalline rod of silicon of high purity with a low ratio of coarse face.SOLUTION: This device for depositing polycrystalline silicon includes a reactor chamber having a reactor wall, at least 20 of filament rods, and a gas intake port for a reaction gas in the reactor chamber, and further three of another adjacent filament rods, with 150-450 mm of interval, excepting the filament rods in the vicinity of the reactor wall, and 1 to 3 of adjacent intake ports, exist therein in each filament rod. The problem is solved by the device for depositing the polycrystalline silicon.
Abstract:
PROBLEM TO BE SOLVED: To provide a method for producing an organopolysiloxane, which does not have drawbacks described in Background Art in Description.SOLUTION: The method includes: a first step of reacting a mixture composed of tetrachlorosilane, 1.0 to 7.0 mol of a monohydric alcohol and 0 to 2 mol of water; a second step of mixing the reaction mixture obtained in the first step, an organic solvent insoluble in water and having a density of
Abstract:
PROBLEM TO BE SOLVED: To intercept the feed of electric power to a reactor at an early stage by detecting the current leakage or the arc destroying a sealing part, and to maintain the operating time of the reactor until the following decomposition and washing as long as possible even if there are electroconductive contaminants.SOLUTION: The interception of feed of the electric energy is triggered by monitoring the insulation failure of an electric energy network and falling bellow a predetermined insulation resistance, and the switching threshold value intercepting the feed of the electric energy is evaluated in consideration of at least one parameter of the group comprising the geometric shape and materials of the sealing part, a feeding voltage, and the greatest electric energy which is triggered by a greatest possible creep current flowing in the sealing part and which can be input to the sealing part just before the interception.
Abstract:
PROBLEM TO BE SOLVED: To refine contaminated chlorosilane extremely inexpensively, and to concentrate impurities existing in that case into a maximally small carrying-out amount and to carry it out.SOLUTION: In the refining method by distillation of chlorosilane having processes for preparing a boron-containing mixture comprising chlorosilane containing TCS, DCS and STC, and for refining the mixture comprising chlorosilane by distillation in a plurality of distillation columns, a boron compound having a low boiling point is split from a distillation column by a column top flow containing DCS having a heightened boron concentration, and a boron compound having a high boiling point is split from a distillation column by a column bottom flow having a heightened boron concentration containing a substance having a high boiling point.
Abstract:
PROBLEM TO BE SOLVED: To provide an organopolysiloxane material including an inorganic reinforcing filler, a carbon black and a catalyst activatable with heat.SOLUTION: The organopolysiloxane material (O) curable to a vulcanizate having a specific relative permittivity εand having a specific initiating temperature includes (A) a compound having a specific amount of an aliphatic carbon-carbon multiple bond, (B) an organopolysiloxane having a hydrogen atom bound with a specific amount of Si, or (C) an organopolysiloxane having a SiC bound group having a specific amount of an aliphatic carbon-carbon multiple bond and a Si bound hydrogen atom instead of (A) and (B), (D) an inorganic reinforcing filler having a specific amount of a specific BET (Brunauer, Emmett and Teller method) surface area, (E) carbon black having a specific amount of a specific BET surface area and a specific OAN (oil-adsorption number), and (F) a specific catalyst activatable with a specific amount of heat.
Abstract:
PROBLEM TO BE SOLVED: To provide a method for pyrolyzing a high boiling point residue in direct synthesis based on Mueller-Rochow in a silane, using hydrogen chloride.SOLUTION: The high boiling point residue in the direct synthesis based on Mueller-Rochow in a silane is pyrolyzed in a fluidized bed with particles containing silicon dioxide and not containing aluminum, using hydrogen chloride.
Abstract:
PROBLEM TO BE SOLVED: To avoid high temperature of a thin rod, contamination due to handling of a cleaned thin rod from intermediate storage to deposition, and insufficient cleaning action of the surface of the attached thin rod, and to improve the prior art.SOLUTION: In a method for producing a polycrystalline silicon rod by deposition of silicon on at least one thin rod in a reactor, before the silicon deposition, hydrogen halide is introduced into the reactor containing at least the one thin rod at a temperature of the thin rod of 400-1,000°C, and is irradiated with UV light, and as a result, halogen and hydrogen radicals are produced and the produced volatile halides and hydrides are removed from the reactor.
Abstract:
PROBLEM TO BE SOLVED: To provide a process for synthesizing 1,3,5-triethyl-2,4,6-trihydrido-2,4,6-triethylamino-1,3,5-triaza-2,4,6-trisilacyclohexane.SOLUTION: Trichlorosilane is reacted with ethylamine in a solvent in the process for synthesizing the 1,3,5-triethyl-2,4,6-trihydrido-2,4,6-triethylamino-1,3,5-triaza-2,4,6-trisilacyclohexane.
Abstract:
PROBLEM TO BE SOLVED: To provide an easy method for manufacturing a large-diameter silicon rod, whereby cracks and chipping off are reduced at bridge- and electrode-side rod ends, thereby increasing crack-free rod length after cutting off the rod ends.SOLUTION: The method for producing the polycrystalline silicon rod by deposition from a gas phase on a core rod comprises: attaching at least one disk above the electrode and/or below the bridge of a rod pair, wherein the at least one disk comprises a material having a lower electrical resistivity than that of polycrystalline silicon under deposition conditions.
Abstract:
PROBLEM TO BE SOLVED: To provide an electrode whose fall probability is remarkably reduced as compared with an electrode having a conventional structure.SOLUTION: In the electrode composed of carbon and having at least two different zones having specific thermal conductivity, an outer zone (A) forms the base of the electrode and carries one or more inner zones, and the innermost zone (B) projects from the zone (A) at the top and has lower specific thermal conductivity than that of the zone (A).