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    ORGANIC CARBOXYLIC ACIDS MODIFIED WITH ALKOXY GROUP CONTAINING SILANE AND METHOD OF MANUFACTURING THE SAME
    44.
    发明专利
    ORGANIC CARBOXYLIC ACIDS MODIFIED WITH ALKOXY GROUP CONTAINING SILANE AND METHOD OF MANUFACTURING THE SAME 失效

    公开(公告)号：JP2002047347A

    公开(公告)日：2002-02-12

    申请号：JP2000231107

    申请日：2000-07-31

    申请人： ARAKAWA CHEM IND

    发明人： NATSUHARA EISUKE ,  AIDA HIDEKI

    IPC分类号： C08G77/02 ,  C08G59/14

    摘要： PROBLEM TO BE SOLVED: To provide novel finely composed organic/inorganic hybrid materials. SOLUTION: Organic carboxylic acids modified with alkoxy group containing silane are provided by an epoxy ring opening etherification reaction of organic carboxylic acids having from 8 to 25 carbon atoms (1) with a partial condensation product of an alkoxysilane containing glycidyl ether group (2) obtained by a dealkoholization reaction of glycidol (A) with a partial condensation product of an akoxysilane (B). A method of manufacturing the organic carboxylic acids is also provided.

    METHOD FOR PRODUCING NANOPOROUS SILICONE RESIN FROM ALKYLHYDROXYSILOXANE RESIN
    45.
    发明专利
    METHOD FOR PRODUCING NANOPOROUS SILICONE RESIN FROM ALKYLHYDROXYSILOXANE RESIN 失效

    公开(公告)号：JP2001240673A

    公开(公告)日：2001-09-04

    申请号：JP2000377614

    申请日：2000-12-12

    申请人： DOW CORNING

    发明人： ZHONG BIANXIAO

    IPC分类号： B05D3/02 ,  B05D7/24 ,  C08G77/02 ,  C08J9/02 ,  C09D183/04 ,  C09D183/05 ,  H01L21/312 ,  H01L21/316

    摘要： PROBLEM TO BE SOLVED: To provide a method for producing a nanoporous silicone resin useful for forming a low permittivity film for an electric insulation coating on an electronic device. SOLUTION: An alkylhydridosiloxane resin which comprises at least 5% silicon atom substituted with at least one 8-28C alkyl group, at least 45% silicon atom bonded to a hydrogen atom and the residual bond of the silicon atom bonded to an oxygen atom is heated to a sufficient temperature to cure the 8-28C alkyl substituent group and to perform a thermal decomposition so as to form the objective nanoporous silicone resin thereby.

    SOL MATERIAL
    48.
    发明专利
    SOL MATERIAL 失效

    公开(公告)号：JP2000290283A

    公开(公告)日：2000-10-17

    申请号：JP2000043361

    申请日：2000-02-21

    申请人： IND TECH RES INST ,  CHINA PETROCHEMICAL CORP ,  TAIWAN HIRYO KOFUN YUGENKOSHI

    发明人： REI REIHEI ,  CHIN REIBAI ,  O CHOJIN ,  RO SHINKEN

    IPC分类号： C07F7/04 ,  C01B33/145 ,  C01B33/16 ,  C08G77/02 ,  H01L23/14 ,  H01L23/498 ,  H01L23/532

    摘要： PROBLEM TO BE SOLVED: To obtain a sol material preservable at room temperature, capable of prolonging the shelf life and rapidly making a formed dielectric film rapidly gel by adding an additive capable of controlling the particle diameter and simultaneously modifying the surface to a starting raw material in a synthetic process for the sol material. SOLUTION: A starting raw material containing (A) 2-60 pts.wt. of a silicon alkoxide (e.g. tetraethyl orthosilicate), (B) 20-98 pts.wt. of an alcohol (e.g. methanol or ethanol), (C) 0.5-50 pts.wt. of an aqueous medium (e.g. deionized water), (D) 0.0001-10 pts.wt. of a base (e.g. hydroxylamine) and (E) 0.001-30 pts.wt. of at least one kind of additive selected from the group consisting of the formula R'nSi(OCH3)4-n, the formula R'nSi(OC2H5)4-n (R' is H, phenyl, a 1-20C alkyl or the like; n is 0-3) or the like (e.g. methyltriethoxysilane or benzoic acid) is hydrolyzed and condensed to thereby afford the objective sol material.