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    Air gap measuring apparatus
    81.
    发明专利
    Air gap measuring apparatus 审中-公开
    气隙测量装置

    公开(公告)号：JP2012052945A

    公开(公告)日：2012-03-15

    申请号：JP2010196443

    申请日：2010-09-02

    Applicant: Konica Minolta Opto Inc ,  コニカミノルタオプト株式会社

    Inventor： TAKEICHI DAISUKE

    IPC: G01B11/14

    Abstract: PROBLEM TO BE SOLVED: To provide an air gap measuring apparatus capable of quickly searching a measurement point and capable of highly accurately measuring an air gap by improving contrast between an air gap image and transparent member images.SOLUTION: The air gap measuring apparatus for measuring an air gap between a pair of transparent members arranged opposite to each other as a measuring object OBJ includes: a plane emission light source 10 for illuminating the pair of transparent members by diffusion light from a direction intersecting with the thickness direction of the air gap; a diaphragm member 20 formed between the face emission light source 10 and the transparent members and having a variable aperture shape; an imaging unit 30 for capturing transmission images of the transparent members and the air gap; a coaxial epi-illumination light source 50; and so on. Coaxial epi-illumination light based on the coaxial epi-illumination light source 50 and an image forming optical system 31 of the imaging unit 30 is spot light having a non-illumination part on the center part.

    Abstract translation: 要解决的问题：提供一种气隙测量装置，其能够通过改善气隙图像和透明构件图像之间的对比度来快速搜索测量点并能够高精度地测量气隙。 解决方案：用于测量彼此相对布置的一对透明构件之间的气隙的气隙测量装置作为测量对象OBJ包括：平面发射光源10，用于通过来自 与气隙的厚度方向相交的方向; 形成在面部发射光源10和透明构件之间且具有可变孔径形状的光阑构件20; 用于捕获透明构件和气隙的透射图像的成像单元30; 同轴外照明光源50; 等等。 基于同轴外延照明光源50和成像单元30的成像光学系统31的同轴外照明光是在中心部分具有非照明部分的聚光灯。 版权所有（C）2012，JPO＆INPIT

    Two-beam assembly and operation method of chromatic point sensor apparatus
    82.
    发明专利
    Two-beam assembly and operation method of chromatic point sensor apparatus 有权
    双光束装配和色点传感器装置的操作方法

    公开(公告)号：JP2012047743A

    公开(公告)日：2012-03-08

    申请号：JP2011184050

    申请日：2011-08-25

    Applicant: Mitsutoyo Corp ,  株式会社ミツトヨ

    Inventor： CASEY EDWARD MTMAN ,  XIE YONG

    IPC: G01C3/06 ,  G01B11/00 ,  G01B11/02 ,  G01B11/14 ,  G01B11/24

    CPC classification number: G01B11/026 ,  G01B11/14

    Abstract: PROBLEM TO BE SOLVED: To provide an operation method of a chromatic point sensor apparatus (CPS apparatus) capable of synchronously measuring two surface areas.SOLUTION: A first measuring beam and a second measuring beam of the sensor apparatus using a one-beam CPS optical pen to which a two-beam assembly is attached are respectively positioned on a first surface area and a second surface area. Two reflected light beams are passed through a confocal opening part of the two-beam CPS. At least one measurement set including first measurement and second measurement respectively caused by the first measuring beam and the second measuring beam is executed. In order to execute the measurement set on various positions, the CPS apparatus is moved at least in the first surface area. Respective measurement results are determined by extremely high resolution (e.g. at least 10 nm resolution). The sensor apparatus and the operation method can be applied to measurement requiring high resolution and accuracy without using an interferometer or other expensive and complicated components.

    Abstract translation: 解决的问题：提供能够同步测量两个表面积的色点传感器装置（CPS装置）的操作方法。 解决方案：使用安装有双梁组件的单梁CPS光笔的传感器装置的第一测量光束和第二测量光束分别位于第一表面区域和第二表面区域上。 两个反射光束通过双光束CPS的共焦开口部分。 执行由第一测量光束和第二测量光束分别引起的包括第一测量和第二测量的至少一个测量组。 为了执行在各种位置上的测量，CPS装置至少在第一表面区域移动。 相应的测量结果由极高分辨率（例如至少10nm分辨率）确定。 传感器装置和操作方法可以应用于需要高分辨率和精度的测量，而不需要使用干涉仪或其他昂贵且复杂的部件。 版权所有（C）2012，JPO＆INPIT

    Solder printing inspection device and solder print system
    85.
    发明专利
    Solder printing inspection device and solder print system 有权
    焊接打印检测设备和焊接打印系统

    公开(公告)号：JP2011180058A

    公开(公告)日：2011-09-15

    申请号：JP2010046318

    申请日：2010-03-03

    Applicant: Ckd Corp ,  シーケーディ株式会社

    Inventor： NIIYAMA TAKAYUKI

    IPC: G01B11/14 ,  B41F15/08 ,  B41F15/12 ,  G01N21/956 ,  H05K3/34

    CPC classification number: G06K9/00 ,  H04N7/18

    Abstract: PROBLEM TO BE SOLVED: To provide a solder printing inspection device and a solder printing system, suppressing a degradation in productivity in making solder printing.
    SOLUTION: The solder printing inspection device detects a solder bridge 3b that connects two lands 2a and 2b, based on the image data photographed with a CCD camera to calculate a distance L1 between the two lands 2a and 2b in contact with the solder bridge 3b as a bridge distance. Then, the distance L1 is determined whether it is within a tolerable range. If the distance L1 is determined to be beyond the tolerable range, a predetermined serious defect treatment is performed.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供焊接印刷检查装置和焊料印刷系统，抑制在制造焊料印刷时的生产率的劣化。 解决方案：焊锡印刷检查装置基于用CCD照相机拍摄的图像数据来检测连接两个焊盘2a和2b的焊料桥3b，以计算与焊料接触的两个焊盘2a和2b之间的距离L1 桥3b作为桥梁距离。 然后，确定距离L1是否在容许范围内。 如果距离L1被确定为超过可容许范围，则执行预定的严重缺陷处理。 版权所有（C）2011，JPO＆INPIT

    Method of evaluating shape error of diffraction grating
    86.
    发明专利
    Method of evaluating shape error of diffraction grating 审中-公开
    评估衍射形状错误的方法

    公开(公告)号：JP2011145151A

    公开(公告)日：2011-07-28

    申请号：JP2010005817

    申请日：2010-01-14

    Applicant: Tohoku Univ ,  国立大学法人東北大学

    Inventor： KIMURA AKIHIDE ,  KO ISAMU

    IPC: G01B11/14

    Abstract: PROBLEM TO BE SOLVED: To solve a problem concerning cost and evaluation time of the conventional technology by measuring the diffraction light wavefront from the entire surface of diffraction grating and applying arithmetic processing to the obtained wavefront information.
    SOLUTION: Lights are applied to the entire surface of mono-axis diffraction grating 10 or bi-axis diffraction grating, and the respective wavefront information of plus first-order diffracted light and minus first-order diffracted light is evaluated by a shape measuring interferometer such as Fizeau type interferometer 11 or the like. The diffraction grating is relatively inclined to the shape measuring interferometer so that the plus first-order diffracted light or minus first-order diffracted light from the diffraction grating and reference light from a reference optical flat 12 provided inside the Fizeau type interferometer 12 may be overlapped. The Fizeau type interferometer 12 can measure the wavefront from the entire surface of the diffracted light at the same time and in a short time. The obtained wavefront of the plus first-order diffracted light or minus first-order diffracted light is subtracted to find out the variation of pitch over the entire surface of the diffraction grating.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 解决方案：通过从衍射光栅的整个表面测量衍射光波前并对所获得的波前信息进行运算处理，解决了传统技术的成本和评估时间的问题。 解决方案：将光施加到单轴衍射光栅10或双轴衍射光栅的整个表面，并且加一级衍射光和负一级衍射光的相应波前信息由形状 测量干涉仪如Fizeau型干涉仪11等。 衍射光栅相对于形状测量干涉仪相对倾斜，使得来自衍射光栅的正一级衍射光或负一级衍射光和设置在Fizeau型干涉仪12内部的参考光学平面12的参考光可以重叠 。 菲索型干涉仪12可以在同一时间和短时间内从衍射光的整个表面测量波前。 减去所获得的正一级衍射光或负一级衍射光的波前，以找出在衍射光栅的整个表面上的间距的变化。 版权所有（C）2011，JPO＆INPIT

    Gap/step measuring instrument, method of gap/step measurement, and program therefor
    87.
    发明专利
    Gap/step measuring instrument, method of gap/step measurement, and program therefor 有权
    GAP / STEP测量仪器，GAP / STEP测量方法及其程序

    公开(公告)号：JP2011112374A

    公开(公告)日：2011-06-09

    申请号：JP2009266343

    申请日：2009-11-24

    Applicant: Kanto Auto Works Ltd ,  Toyota Central R&D Labs Inc ,  株式会社豊田中央研究所 ,  関東自動車工業株式会社

    Inventor： HORIE YOHEI ,  YAMAGISHI YASUNORI ,  HIROSE MASAHIDE ,  SAKATANI TAIDO ,  WATANABE KEIICHI ,  TSUKADA TOSHIHIKO

    IPC: G01B11/14 ,  G01B11/02

    Abstract: PROBLEM TO BE SOLVED: To easily perform high accuracy measurement without the need for putting measurement attitudes in an accurately facing positions, in a gap/step measuring instrument for finding the size of a measuring object.
    SOLUTION: This gap/step measuring instrument includes: a slit light irradiation means 4 for irradiating surfaces of two workpieces W1 and W2 that form the measuring object G with slit light L1; an imaging means 6 for acquiring a first plane image including the measuring object in a state that it is irradiated at least with slit light and a second plane image including ends of the pair of workpieces that form the measuring object; and a control means 10 for calculating the size of the measuring object. The control means extracts the center line LC of the slit light with which the surface of the workpiece is irradiated from the first plane image, severally extracting edge lines of the ends of the pair of workpieces from the second plane image, and calculating the size of the measuring object based on intersections P1 and P2 of the center line of the slit light and the edge line of the ends of the pair of workpieces.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：为了容易地执行高精度测量，而不需要将测量态度放在准确的面对位置，在用于找到测量对象的尺寸的间隙/步进测量仪器中。 该间隙/台阶测量装置包括：用狭缝光L1照射形成测量对象G的两个工件W1和W2的表面的狭缝光照射装置4; 成像装置6，用于在至少用狭缝光照射的状态下获取包括测量对象的第一平面图像;以及第二平面图像，其包括形成测量对象的一对工件的端部; 以及用于计算测量对象的尺寸的控制装置10。 控制装置从第一平面图像中提取与工件表面照射的狭缝光的中心线LC，从第二平面图像中分别提取一对工件的端部的边缘线，并计算尺寸 所述测量对象基于所述狭缝光的中心线的交点P1和P2以及所述一对工件的端部的边缘线。 版权所有（C）2011，JPO＆INPIT

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