专利检索 ap:("ユニバーシティ・カレッジ・ダブリン,ナショナル・ユニバーシティ・オブ・アイルランド,ダブリン") AND inv:"パトリック・ヘイデン" 第 1 页

1.

发明专利
Euv mirror 有权

公开(公告)号：JP4901874B2

公开(公告)日：2012-03-21

申请号：JP2008538280

申请日：2006-10-23

申请人： ユニバーシティ・カレッジ・ダブリン,ナショナル・ユニバーシティ・オブ・アイルランド,ダブリン

发明人： ジェラード・オサリバン , パトリック・ヘイデン , パドレイグ・ダン , ファーガル・オライリー

IPC分类号： H01L21/027 , G02B5/08 , G21K1/06 , G21K5/08 , H05G2/00

CPC分类号： G03F7/70958 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G21K1/06 , H05G2/003 , H05G2/005

摘要： A system for providing extreme ultraviolet (EUV) radiation comprises a laser source arranged to produce a laser beam having a focus; and a carrier movable relative to the laser source for carrying a surface material, the surface material when carried by the carrier providing a renewable target edge. The focussed beam is arranged to impinge on the target edge to produce an EUV radiation emitting plasma. The system is cooperable with a mirror for harnessing the EUV radiation by reflecting EUV radiation impinging thereon. The mirror comprises a substantially aspheric surface and means for supplying a reflecting liquid to at least partially coat the aspheric surface, the mirror being rotatable to centrifugally confine the liquid to the aspheric surface.

2.

发明专利
High output euv lamp system 有权

公开(公告)号：JP2009515326A

公开(公告)日：2009-04-09

申请号：JP2008538280

申请日：2006-10-23

申请人： ユニバーシティ・カレッジ・ダブリン,ナショナル・ユニバーシティ・オブ・アイルランド,ダブリン

发明人： ジェラード・オサリバン , パトリック・ヘイデン , パドレイグ・ダン , ファーガル・オライリー

IPC分类号： H01L21/027 , G02B5/08 , G21K1/06 , G21K5/08 , H05G2/00

CPC分类号： G03F7/70958 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G21K1/06 , H05G2/003 , H05G2/005

摘要： A system for providing extreme ultraviolet (EUV) radiation comprises a laser source arranged to produce a laser beam having a focus; and a carrier movable relative to the laser source for carrying a surface material, the surface material when carried by the carrier providing a renewable target edge. The focussed beam is arranged to impinge on the target edge to produce an EUV radiation emitting plasma. The system is cooperable with a mirror for harnessing the EUV radiation by reflecting EUV radiation impinging thereon. The mirror comprises a substantially aspheric surface and means for supplying a reflecting liquid to at least partially coat the aspheric surface, the mirror being rotatable to centrifugally confine the liquid to the aspheric surface.